HOEY; Gee Sun

Patent Applications and Registrations

Patent applications and USPTO patent grants for HOEY; Gee Sun.The latest application filed is for "substrate handling systems".

Company Profile

3.10.9

HOEY; Gee Sun - Fremont CA
Hoey; Gee Sun - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Substrate Handling Systems App 20220013394 - HOEY; Gee Sun ; et al.	2022-01-13
Spray bar design for uniform liquid flow distribution on a substrate Grant 10,751,738 - Rangarajan , et al. A	2020-08-25
Linear vacuum robot with Z motion and articulated arm Grant 10,204,810 - Hoey , et al. Feb	2019-02-12
Spray Bar Design For Uniform Liquid Flow Distribution On A Substrate App 20180185857 - RANGARAJAN; Jagan ; et al.	2018-07-05
Linear vacuum robot with z motion and articulated arm Grant 9,691,649 - Hoey , et al. June 27, 2	2017-06-27
Linear Vacuum Robot With Z Motion And Articulated Arm App 20130230370 - HOEY; Gee Sun ; et al.	2013-09-05
Linear vacuum robot with Z motion and articulated arm Grant 8,419,341 - Hoey , et al. April 16, 2	2013-04-16
Linear Vacuum Robot With Z Motion And Articulated Arm App 20120076626 - Hoey; Gee Sun ; et al.	2012-03-29
Linear Vacuum Robot With Z Motion And Articulated Arm App 20100329827 - HOEY; Gee Sun ; et al.	2010-12-30
Platen with peripheral frame for supporting a web of polishing material in a chemical mechanical planarization system Grant 6,951,511 - Gurusamy , et al. October 4, 2	2005-10-04
Platen with lateral web tensioner Grant 6,612,914 - Gurusamy , et al. September 2, 2	2003-09-02
Platen with peripheral frame for supporting a web of polishing material in a chemical mechanical planarization system App 20030060134 - Gurusamy, Jayakumar ; et al.	2003-03-27
Method and apparatus for providing and controlling delivery of a web of polishing material Grant 6,482,072 - Gurusamy , et al. November 19, 2	2002-11-19
Platen with lateral web tensioner App 20020127959 - Gurusamy, Jayakumar ; et al.	2002-09-12
Using a purge gas in a chemical mechanical polishing apparatus with an incrementally advanceable polishing sheet Grant 6,419,559 - Gurusamy , et al. July 16, 2	2002-07-16
Using A Purge Gas In A Chemical Mechanical Polishing Apparatus With An Incrementally Advanceable Polishing Sheet App 20020045406 - Gurusamy, Jayakumar ; et al.	2002-04-18
Conditioner for polishing pads App 20020016136 - Birang, Manoocher ; et al.	2002-02-07

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