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Patent applications and USPTO patent grants for Hoang; John.The latest application filed is for "conformal damage-free encapsulation of chalcogenide materials".
Patent | Date |
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Conformal Damage-free Encapsulation Of Chalcogenide Materials App 20220115592 - Sims; James Samuel ;   et al. | 2022-04-14 |
Film Stack Simplification For High Aspect Ratio Patterning And Vertical Scaling App 20220051938 - Wu; Hui-Jung ;   et al. | 2022-02-17 |
Conformal damage-free encapsulation of chalcogenide materials Grant 11,239,420 - Sims , et al. February 1, 2 | 2022-02-01 |
Automated Robotic System And Method For Sanitization And Disinfection App 20220001061 - Hoang; Sherylinn ;   et al. | 2022-01-06 |
Self-aligned Vertical Integration Of Three-terminal Memory Devices App 20210391355 - LILL; Thorsten ;   et al. | 2021-12-16 |
Cobalt etch back Grant 10,784,086 - Yang , et al. Sept | 2020-09-22 |
Conformal Damage-free Encapsulation Of Chalcogenide Materials App 20200066987 - Sims; James Samuel ;   et al. | 2020-02-27 |
Liner and barrier applications for subtractive metal integration Grant 10,199,235 - Wu , et al. Fe | 2019-02-05 |
Liner And Barrier Applications For Subtractive Metal Integration App 20180211846 - Wu; Hui-Jung ;   et al. | 2018-07-26 |
Cobalt Etch Back App 20180102236 - Yang; Jialing ;   et al. | 2018-04-12 |
Liner and barrier applications for subtractive metal integration Grant 9,899,234 - Wu , et al. February 20, 2 | 2018-02-20 |
Cobalt etch back Grant 9,870,899 - Yang , et al. January 16, 2 | 2018-01-16 |
Method of planarizing an upper surface of a semiconductor substrate in a plasma etch chamber Grant 9,589,853 - Titus , et al. March 7, 2 | 2017-03-07 |
Method to etch copper barrier film Grant 9,570,320 - Shen , et al. February 14, 2 | 2017-02-14 |
Cobalt Etch Back App 20160314985 - Yang; Jialing ;   et al. | 2016-10-27 |
Novel Method To Etch Copper Barrier Film App 20160104630 - SHEN; Meihua ;   et al. | 2016-04-14 |
Liner And Barrier Applications For Subtractive Metal Integration App 20150380272 - Wu; Hui-Jung ;   et al. | 2015-12-31 |
Method Of Planarizing An Upper Surface Of A Semiconductor Substrate In A Plasma Etch Chamber App 20150249016 - Titus; Monica ;   et al. | 2015-09-03 |
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