Ho; Jonathan Jung-Ching
Patent Applications and Registrations
Patent applications and USPTO patent grants for Ho; Jonathan Jung-Ching.The latest application filed is for "double exposure semiconductor process for improved process margin".
- Ho; Jonathan Jung-Ching - Fremont CA US
| Patent | Date |
|---|---|
| Interconnect structure Grant 8,384,164 - Ho February 26, 2 | 2013-02-26 |
| Double exposure semiconductor process for improved process margin Grant 7,951,722 - Ho May 31, 2 | 2011-05-31 |
| Method of fabricating CMOS devices using fluid-based dielectric materials Grant 7,737,020 - Ho , et al. June 15, 2 | 2010-06-15 |
| Method and apparatus for compensating an integrated circuit layout for mechanical stress effects Grant 7,673,270 - Wang , et al. March 2, 2 | 2010-03-02 |
| Double exposure semiconductor process for improved process margin App 20090042389 - Ho; Jonathan Jung-Ching | 2009-02-12 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 