loadpatents
name:-0.010543823242188
name:-0.0090031623840332
name:-0.0029327869415283
HO; Chok W. Patent Filings

HO; Chok W.

Patent Applications and Registrations

Patent applications and USPTO patent grants for HO; Chok W..The latest application filed is for "forming metal cap layer over through-glass-vias (tgvs)".

Company Profile
0.5.5
  • HO; Chok W. - Milpitas CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
FORMING METAL CAP LAYER OVER THROUGH-GLASS-VIAS (TGVs)
App 20180254239 - SUKUMARAN; Vijay ;   et al.
2018-09-06
Use of ammonia for etching organic low-k dielectrics
Grant 7,105,454 - Ho , et al. September 12, 2
2006-09-12
Use of ammonia for etching organic low-k dielectrics
Grant 6,893,969 - Ho , et al. May 17, 2
2005-05-17
Use of ammonia for etching organic low-k dielectrics
App 20050003676 - Ho, Chok W. ;   et al.
2005-01-06
Post-etch photoresist strip with O2 and NH3 for organosilicate glass low-K dielectric etch applications
Grant 6,777,344 - Annapragada , et al. August 17, 2
2004-08-17
Use of hydrocarbon addition for the elimination of micromasking during etching of organic low-k dielectrics
Grant 6,620,733 - Ho September 16, 2
2003-09-16
Ultra-high oxide to photoresist selective etch of high-aspect-ratio openings in a low-pressure, high-density plasma
Grant 6,486,070 - Ho , et al. November 26, 2
2002-11-26
Use of ammonia for etching organic low-k dielectrics
App 20020108929 - Ho, Chok W. ;   et al.
2002-08-15
Use of hydrocarbon addition for the elimination of micromasking during etching
App 20020110992 - Ho, Chok W.
2002-08-15
Post-etch photoresist strip with O2 and NH3 for organosilicate glass low-K dielectric etch applications
App 20020111041 - Annapragada, Rao V. ;   et al.
2002-08-15

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