Ho; BangChing

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ho; BangChing.The latest application filed is for "composition for forming release layer, and release layer".

Company Profile

2.12.16

Ho; BangChing - Kaohsiung TW
HO; BangChing - Kaohsiung City TW
Ho; Bangching - Toyama N/A JP
Ho; BangChing - Toyama-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition for forming release layer, and release layer Grant 11,130,855 - Shindo , et al. September 28, 2	2021-09-28
Composition For Forming Release Layer, And Release Layer App 20200239679 - SHINDO; Kazuya ; et al.	2020-07-30
Composition for forming resist underlayer film with reduced outgassing Grant 10,437,150 - Sakamoto , et al. O	2019-10-08
Polymer-containing developer Grant 9,753,369 - Sakamoto , et al. September 5, 2	2017-09-05
Silicon-containing EUV resist underlayer film-forming composition including additive Grant 9,627,217 - Shigaki , et al. April 18, 2	2017-04-18
Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the same Grant 9,494,864 - Ohnishi , et al. November 15, 2	2016-11-15
Resist underlayer film-forming composition for EUV lithography containing condensation polymer Grant 9,240,327 - Sakamoto , et al. January 19, 2	2016-01-19
Resist Overlayer Film Forming Composition For Lithography And Method For Manufacturing Semiconductor Device Using The Same App 20150248057 - Ohnishi; Ryuji ; et al.	2015-09-03
Composition for forming resist underlayer film for EUV lithography Grant 9,005,873 - Sakamoto , et al. April 14, 2	2015-04-14
Silicon-containing Euv Resist Underlayer Film-forming Composition Including Additive App 20150079792 - Shigaki; Shuhei ; et al.	2015-03-19
Resist Underlayer Film-forming Composition For Euv Lithography Containing Condensation Polymer App 20140170567 - Sakamoto; Rikimaru ; et al.	2014-06-19
Resist underlayer film forming composition, and method for forming resist pattern using the same Grant 8,722,840 - Sakamoto , et al. May 13, 2	2014-05-13
Composition For Forming Resist Underlayer Film For Euv Lithography App 20140099791 - SAKAMOTO; Rikimaru ; et al.	2014-04-10
Polymer-containing Developer App 20140038415 - Sakamoto; Rikimaru ; et al.	2014-02-06
Resist Underlayer Film Forming Composition, And Method For Forming Resist Pattern Using The Same App 20130230809 - Sakamoto; Rikimaru ; et al.	2013-09-05
Composition For Forming Resist Overlayer Film For Euv Lithography App 20130209940 - Sakamoto; Rikimaru ; et al.	2013-08-15
Composition For Formation Of Resist Underlayer Film App 20120251955 - Sakamoto; Rikimaru ; et al.	2012-10-04
Composition For Forming Resist Underlayer Film For Euv Lithography App 20120040291 - Sakamoto; Rikimaru ; et al.	2012-02-16
Composition For Forming Resist Underlayer Film With Reduced Outgassing App 20110230058 - Sakamoto; Rikimaru ; et al.	2011-09-22
Coating Composition And Pattern Forming Method App 20110117746 - Maruyama; Daisuke ; et al.	2011-05-19

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