HISHIDA; Aritaka

Patent Applications and Registrations

Patent applications and USPTO patent grants for HISHIDA; Aritaka.The latest application filed is for "polymer, semiconductor composition comprising polymer, and method for manufacturing film using semiconductor composition".

Company Profile

3.7.10

HISHIDA; Aritaka - Kakegawa-shi JP
Hishida; Aritaka - Shizouka JP
HISHIDA; Aritaka - Shizuoka JP
Hishida; Aritaka - Kakegawa N/A JP
Hishida; Aritaka - Bedminster NJ

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Polymer, Semiconductor Composition Comprising Polymer, And Method For Manufacturing Film Using Semiconductor Composition App 20220119568 - HITOKAWA; Hiroshi ; et al.	2022-04-21
Positive working photosensitive material Grant 10,976,662 - Liu , et al. April 13, 2	2021-04-13
Negative-working Ultra Thick Film Photoresist App 20200393758 - HISHIDA; Aritaka ; et al.	2020-12-17
Positive Working Photosensitive Material App 20190064662 - LIU; Weihong ; et al.	2019-02-28
Positive working photosensitive material Grant 8,841,062 - Liu , et al. September 23, 2	2014-09-23
Positive Working Photosensitive Material App 20140154624 - LIU; Weihong ; et al.	2014-06-05
Positive-working photoimageable bottom antireflective coating Grant 8,039,202 - Sui , et al. October 18, 2	2011-10-18
Positive-working photoimageable bottom antireflective coating Grant 7,824,837 - Wu , et al. November 2, 2	2010-11-02
Antireflective compositions for photoresists Grant 7,691,556 - Wu , et al. April 6, 2	2010-04-06
Positive -Working Photoimageable Bottom Antireflective Coating App 20080090184 - Sui; Yu ; et al.	2008-04-17
Positive-Working Photoimageable Bottom Antireflective Coating App 20080038666 - Wu; Hengpeng ; et al.	2008-02-14
Antireflective compositions for photoresists App 20060057501 - Wu; Hengpeng ; et al.	2006-03-16
Antireflective compositions for photoresists App 20060058468 - Wu; Hengpeng ; et al.	2006-03-16
Positive-working photoimageable bottom antireflective coating App 20050214674 - Sui, Yu ; et al.	2005-09-29
Radiation-sensitive composition of chemical amplification type Grant 6,358,665 - Pawlowski , et al. March 19, 2	2002-03-19

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