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Patent applications and USPTO patent grants for HISHIDA; Aritaka.The latest application filed is for "polymer, semiconductor composition comprising polymer, and method for manufacturing film using semiconductor composition".
Patent | Date |
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Polymer, Semiconductor Composition Comprising Polymer, And Method For Manufacturing Film Using Semiconductor Composition App 20220119568 - HITOKAWA; Hiroshi ;   et al. | 2022-04-21 |
Positive working photosensitive material Grant 10,976,662 - Liu , et al. April 13, 2 | 2021-04-13 |
Negative-working Ultra Thick Film Photoresist App 20200393758 - HISHIDA; Aritaka ;   et al. | 2020-12-17 |
Positive Working Photosensitive Material App 20190064662 - LIU; Weihong ;   et al. | 2019-02-28 |
Positive working photosensitive material Grant 8,841,062 - Liu , et al. September 23, 2 | 2014-09-23 |
Positive Working Photosensitive Material App 20140154624 - LIU; Weihong ;   et al. | 2014-06-05 |
Positive-working photoimageable bottom antireflective coating Grant 8,039,202 - Sui , et al. October 18, 2 | 2011-10-18 |
Positive-working photoimageable bottom antireflective coating Grant 7,824,837 - Wu , et al. November 2, 2 | 2010-11-02 |
Antireflective compositions for photoresists Grant 7,691,556 - Wu , et al. April 6, 2 | 2010-04-06 |
Positive -Working Photoimageable Bottom Antireflective Coating App 20080090184 - Sui; Yu ;   et al. | 2008-04-17 |
Positive-Working Photoimageable Bottom Antireflective Coating App 20080038666 - Wu; Hengpeng ;   et al. | 2008-02-14 |
Antireflective compositions for photoresists App 20060057501 - Wu; Hengpeng ;   et al. | 2006-03-16 |
Antireflective compositions for photoresists App 20060058468 - Wu; Hengpeng ;   et al. | 2006-03-16 |
Positive-working photoimageable bottom antireflective coating App 20050214674 - Sui, Yu ;   et al. | 2005-09-29 |
Radiation-sensitive composition of chemical amplification type Grant 6,358,665 - Pawlowski , et al. March 19, 2 | 2002-03-19 |
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