Hisano; Akira

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hisano; Akira.The latest application filed is for "sintered compact magnesium oxide target for sputtering, and method for producing same".

Company Profile

0.10.9

Hisano; Akira - Ibaraki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Sintered Compact Magnesium Oxide Target For Sputtering, And Method For Producing Same App 20180251889 - Hisano; Akira ; et al.	2018-09-06
Sintered compact magnesium oxide target for sputtering, and method for producing same Grant 10,066,290 - Hisano , et al. September 4, 2	2018-09-04
Sintered compact magnesium oxide target for sputtering, and method for producing same Grant 9,988,709 - Hisano , et al. June 5, 2	2018-06-05
Sputtering target and process for producing same Grant 9,034,154 - Nakamura , et al. May 19, 2	2015-05-19
Sintered Compact Magnesium Oxide Target for Sputtering, and Method for Producing Same App 20140284212 - Hisano; Akira ; et al.	2014-09-25
Sputtering target with few surface defects, and surface processing method thereof Grant 8,663,402 - Nakamura , et al. March 4, 2	2014-03-04
Sputtering Target and Process for Producing Same App 20110162971 - Nakamura; Yuichiro ; et al.	2011-07-07
Sputtering Target with Few Surface Defects, and Surface Processing Method Thereof App 20110132757 - Nakamura; Yuichiro ; et al.	2011-06-09
Co-Cr-Pt-B alloy sputtering target Grant 7,927,434 - Nakamura , et al. April 19, 2	2011-04-19
Sputtering target with few surface defects, and surface processing method thereof Grant 7,909,949 - Nakamura , et al. March 22, 2	2011-03-22
AlRu sputtering target and manufacturing method thereof Grant 7,767,139 - Hisano August 3, 2	2010-08-03
High-purity Ru powder, sputtering target obtained by sintering the same, thin film obtained by sputtering the target and process for producing high-purity Ru powder Grant 7,578,965 - Shindo , et al. August 25, 2	2009-08-25
High- Purity Ru Powder, Sputtering Target Obtained by Sintering the Same, Thin Film Obtained by Sputtering the Target and Process for Producing High-Purity Ru Powder App 20070240992 - Shindo; Yuichiro ; et al.	2007-10-18
Co-cr-pt-b alloy sputtering target App 20070187236 - Nakamura; Yuichiro ; et al.	2007-08-16
AlRu Sputtering Target and Manufacturing Method thereof App 20070175753 - Hisano; Akira	2007-08-02
Sputtering target with few surface defects, and surface processing method thereof App 20070125645 - Nakamura; Yuichiro ; et al.	2007-06-07
Airu spattering target and method for preparation thereof App 20040144204 - Hisano, Akira	2004-07-29

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