HIRUKAWA; Shigeru

Patent Applications and Registrations

Patent applications and USPTO patent grants for HIRUKAWA; Shigeru.The latest application filed is for "exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas".

Company Profile

0.74.73

HIRUKAWA; Shigeru - Kita-ku JP
HIRUKAWA; Shigeru - Tokyo JP
HIRUKAWA; Shigeru - Tokoyo JP
Hirukawa; Shigeru - Kashiwa JP
Hirukawa, Shigeru - Kashiwa-shi JP
Hirukawa; Shigeru - Chiba JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Exposure Method And Apparatus, And Method For Fabricating Device With Light Amount Distribution Having Light Larger In Four Areas App 20190137886 - KUDO; Takehito ; et al.	2019-05-09
Exposure Method, Exposure Apparatus, And Method For Producing Device App 20190011840 - HIRUKAWA; Shigeru	2019-01-10
Exposure Apparatus, Exposure Method, Method For Producing Device, And Optical Part App 20180364581 - NAGASAKA; Hiroyuki ; et al.	2018-12-20
Exposure Apparatus, Exposure Method, And Method For Producing Device App 20180348653 - KOBAYASHI; Naoyuki ; et al.	2018-12-06
Exposure apparatus, exposure method, method for producing device, and optical part Grant 10,088,760 - Nagasaka , et al. October 2, 2	2018-10-02
Exposure method, exposure apparatus, and method for producing device Grant 10,082,739 - Hirukawa September 25, 2	2018-09-25
Exposure apparatus, exposure method, and method for producing device Grant 10,048,602 - Kobayashi , et al. August 14, 2	2018-08-14
Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator Grant 9,885,959 - Kudo , et al. February 6, 2	2018-02-06
Exposure method, substrate stage, exposure apparatus, and device manufacturing method Grant 9,846,371 - Owa , et al. December 19, 2	2017-12-19
Exposure Method, Substrate Stage, Exposure Apparatus, And Device Manufacturing Method App 20170329234 - OWA; Soichi ; et al.	2017-11-16
Exposure Method And Apparatus, And Method For Fabricating Device With Light Amount Distribution Having Light Larger In Four Areas App 20170248853 - KUDO; Takehito ; et al.	2017-08-31
Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction Grant 9,678,437 - Kudo , et al. June 13, 2	2017-06-13
Exposure Method And Apparatus, And Method For Fabricating Device With Light Amount Distribution Having Light Larger In Four Areas App 20170146913 - KUDO; Takehito ; et al.	2017-05-25
Exposure Method, Exposure Apparatus, And Method For Producing Device App 20170003599 - HIRUKAWA; Shigeru	2017-01-05
Exposure method, exposure apparatus, and method for producing device Grant 9,488,920 - Hirukawa November 8, 2	2016-11-08
Exposure Apparatus, Exposure Method, And Method For Producing Device App 20160252828 - KOBAYASHI; Naoyuki ; et al.	2016-09-01
Exposure apparatus, exposure method, and method for producing device Grant 9,316,921 - Kobayashi , et al. April 19, 2	2016-04-19
Exposure method, substrate stage, exposure apparatus, and device manufacturing method Grant 9,268,237 - Owa , et al. February 23, 2	2016-02-23
Exposure apparatus, exposure method, method for producing device, and optical part Grant 9,182,685 - Nagasaka , et al. November 10, 2	2015-11-10
Exposure Method, Substrate Stage, Exposure Apparatus, And Device Manufacturing Method App 20150301457 - OWA; Soichi ; et al.	2015-10-22
Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas Grant 9,164,393 - Kudo , et al. October 20, 2	2015-10-20
Exposure Apparatus, Exposure Method, Method For Producing Device, And Optical Part App 20150286151 - NAGASAKA; Hiroyuki ; et al.	2015-10-08
Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas Grant 9,146,474 - Kudo , et al. September 29, 2	2015-09-29
Exposure method, substrate stage, exposure apparatus, and device manufacturing method Grant 9,019,467 - Owa , et al. April 28, 2	2015-04-28
Exposure apparatus, exposure method, method for producing device, and optical part Grant 9,019,469 - Nagasaka , et al. April 28, 2	2015-04-28
Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device Grant 8,810,767 - Nagasaka , et al. August 19, 2	2014-08-19
Exposure method, exposure apparatus, and method for producing device Grant 8,711,324 - Hirukawa April 29, 2	2014-04-29
Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device Grant 8,698,998 - Nagasaka , et al. April 15, 2	2014-04-15
Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas Grant 8,675,177 - Kudo , et al. March 18, 2	2014-03-18
Exposure Apparatus, Exposure Method, And Method For Producing Device App 20140055763 - KOBAYASHI; Naoyuki ; et al.	2014-02-27
Exposure Apparatus, Exposure Method, Method For Producing Device, And Optical Part App 20140022523 - NAGASAKA; Hiroyuki ; et al.	2014-01-23
Exposure apparatus, exposure method, and method for producing device Grant 8,605,252 - Kobayashi , et al. December 10, 2	2013-12-10
Exposure Method And Apparatus, And Method For Fabricating Device With Light Amount Distribution Having Light Larger In Four Areas App 20130308114 - KUDO; Takehito ; et al.	2013-11-21
Exposure Method And Apparatus, And Method For Fabricating Device With Light Amount Distribution Having Light Larger In Four Areas App 20130308113 - KUDO; Takehito ; et al.	2013-11-21
Exposure Method, Exposure Apparatus, And Method For Producing Device App 20130182232 - HIRUKAWA; Shigeru	2013-07-18
Exposure Method, Substrate Stage, Exposure Apparatus, And Device Manufacturing Method App 20130141703 - OWA; Soichi ; et al.	2013-06-06
Exposure Method, Substrate Stage, Exposure Apparatus, And Device Manufacturing Method App 20130141701 - OWA; Soichi ; et al.	2013-06-06
Pattern forming method and device production method Grant 8,435,723 - Shibazaki , et al. May 7, 2	2013-05-07
Exposure method, exposure apparatus, and method for producing device Grant 8,421,992 - Hirukawa April 16, 2	2013-04-16
Pattern formation method, pattern formation apparatus, exposure method, exposure apparatus, and device manufacturing method Grant 8,405,816 - Hirukawa , et al. March 26, 2	2013-03-26
Exposure method, substrate stage, exposure apparatus, and device manufacturing method Grant 8,384,880 - Owa , et al. February 26, 2	2013-02-26
Focus test mask, focus measurement method, exposure method and exposure apparatus Grant 8,343,693 - Hirukawa , et al. January 1, 2	2013-01-01
Exposure apparatus and device manufacturing method Grant 8,294,876 - Hirukawa October 23, 2	2012-10-23
Exposure Apparatus, Exposure Method, And Method For Producing Device App 20120224154 - KOBAYASHI; Naoyuki ; et al.	2012-09-06
Exposure method, exposure apparatus, and method for producing device Grant 8,233,133 - Hirukawa July 31, 2	2012-07-31
Exposure apparatus, exposure method, and method for producing device Grant 8,208,119 - Kobayashi , et al. June 26, 2	2012-06-26
Exposure method, substrate stage, exposure apparatus, and device manufacturing method Grant 8,208,117 - Owa , et al. June 26, 2	2012-06-26
Pattern Forming Method And Apparatus, Exposure Method And Apparatus, And Device Manufacturing Method And Device App 20120057141 - OWA; Soichi ; et al.	2012-03-08
Exposure apparatus and device manufacturing method App 20110279794 - Hirukawa; Shigeru ; et al.	2011-11-17
Exposure apparatus, exposure method, method for producing device, and optical part Grant 8,054,447 - Nagasaka , et al. November 8, 2	2011-11-08
Exposure method, substrate stage, exposure apparatus, and device manufacturing method Grant 8,040,491 - Owa , et al. October 18, 2	2011-10-18
Optical Properties Measurement Method, Exposure Method And Device Manufacturing Method App 20110242520 - KOSUGI; Junichi ; et al.	2011-10-06
Focus Test Mask, Focus Measurement Method, Exposure Method And Exposure Apparatus App 20110212389 - HIRUKAWA; Shigeru ; et al.	2011-09-01
Exposure apparatus and device manufacturing method Grant 8,004,650 - Hirukawa August 23, 2	2011-08-23
Exposure apparatus and device manufacturing method Grant 7,911,582 - Hirukawa , et al. March 22, 2	2011-03-22
Exposure apparatus and device manufacturing method App 20110051106 - Hirukawa; Shigeru ; et al.	2011-03-03
Exposure Method, And Device Manufacturing Method App 20100296074 - MORITA; Yasuhiro ; et al.	2010-11-25
Exposure apparatus and method for producing device Grant 7,817,244 - Nei , et al. October 19, 2	2010-10-19
Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device App 20100134772 - Nagasaka; Hiroyuki ; et al.	2010-06-03
Substrate processing method, photomask manufacturing method, photomask, and device manufacturing method Grant 7,713,889 - Hirukawa May 11, 2	2010-05-11
Pattern Forming Method And Apparatus, Exposure Method And Apparatus, And Device Manufacturing Method And Device App 20100099049 - OWA; Soichi ; et al.	2010-04-22
Pattern forming method and device production method App 20100068660 - Shibazaki; Yuichi ; et al.	2010-03-18
Exposure apparatus and device manufacturing method Grant 7,639,343 - Hirukawa December 29, 2	2009-12-29
Exposure apparatus and device manufacturing method Grant 7,589,821 - Hirukawa September 15, 2	2009-09-15
Exposure apparatus, method for cleaning member thereof , maintenance method for exposure apparatus, maintenance device, and method for producing device App 20090225286 - Nagasaka; Hiroyuki ; et al.	2009-09-10
Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device App 20090218653 - Nagasaka; Hiroyuki ; et al.	2009-09-03
Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas App 20090185156 - Kudo; Takehito ; et al.	2009-07-23
Pattern Formation Method, Pattern Formation Apparatus, Exposure Method, Exposure Apparatus, And Device Manufacturing Method App 20090135399 - HIRUKAWA; Shigeru ; et al.	2009-05-28
Exposure method, exposure apparatus, and method for producing device App 20090104568 - Hirukawa; Shigeru	2009-04-23
Exposure apparatus and device manufacturing method Grant 7,505,111 - Hirukawa , et al. March 17, 2	2009-03-17
Exposure method, exposure apparatus, and method for producing device Grant 7,483,117 - Hirukawa January 27, 2	2009-01-27
Exposure method, substrate stage, exposure apparatus, and device manufacturing method Grant 7,483,119 - Owa , et al. January 27, 2	2009-01-27
Exposure apparatus and device manufacturing method App 20090015807 - Hirukawa; Shigeru ; et al.	2009-01-15
Exposure method, substrate stage, exposure apparatus, and device manufacturing method App 20090015816 - Owa; Soichi ; et al.	2009-01-15
Exposure method, substrate stage, exposure apparatus, and device manufacturing method App 20090015808 - Owa; Soichi ; et al.	2009-01-15
Exposure method, exposure apparatus, and method for producing device App 20080309896 - Hirukawa; Shigeru	2008-12-18
Exposure method and apparatus, and method for fabricating device Grant 7,446,858 - Kudo , et al. November 4, 2	2008-11-04
Exposure apparatus and device manufacturing method Grant 7,446,851 - Hirukawa November 4, 2	2008-11-04
Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device App 20080252865 - Nagasaka; Hiroyuki ; et al.	2008-10-16
Exposure apparatus and device manufacturing method Grant 7,436,486 - Hirukawa October 14, 2	2008-10-14
Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium Grant 7,405,803 - Shimizu , et al. July 29, 2	2008-07-29
Exposure apparatus and device manufacturing method App 20080151203 - Hirukawa; Shigeru ; et al.	2008-06-26
Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium Grant 7,391,497 - Shimizu , et al. June 24, 2	2008-06-24
Exposure method, substrate stage, exposure apparatus, and device manufacturing method App 20080117394 - Owa; Soichi ; et al.	2008-05-22
Exposure Apparatus, Exposure Method, and Method for Producing Device App 20080106707 - Kobayashi; Naoyuki ; et al.	2008-05-08
Exposure method and apparatus, and method for fabricating device App 20080068572 - Kudo; Takehito ; et al.	2008-03-20
Exposure apparatus and device manufacturing method App 20070263196 - Hirukawa; Shigeru ; et al.	2007-11-15
Exposure apparatus, method for cleaning memeber thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device App 20070258072 - Nagasaka; Hiroyuki ; et al.	2007-11-08
Exposure apparatus and device manufacturing method App 20070258064 - Hirukawa; Shigeru	2007-11-08
Exposure Apparatus, Exposure Method, Method for Producing Device, and Optical Part App 20070242242 - Nagasaka; Hiroyuki ; et al.	2007-10-18
Image Forming State Adjusting System, Exposure Method And Exposure Apparatus, And Program And Information Storage Medium App 20070188727 - Shimizu; Yasuo ; et al.	2007-08-16
Image Forming State Adjusting System, Exposure Method And Exposure Apparatus, And Program And Information Storage Medium App 20070188726 - Shimizu; Yasuo ; et al.	2007-08-16
Exposure apparatus and method for producing device Grant 7,242,455 - Nei , et al. July 10, 2	2007-07-10
Substrate processing method, photomask manufacturing method, photomask, and device manufacturing method App 20070134940 - Hirukawa; Shigeru	2007-06-14
Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium Grant 7,230,682 - Shimizu , et al. June 12, 2	2007-06-12
Exposure apparatus and device manufacturing method App 20070115447 - Hirukawa; Shigeru ; et al.	2007-05-24
Exposure apparatus and device manufacturing method App 20070115448 - Hirukawa; Shigeru ; et al.	2007-05-24
Exposure apparatus, exposure method, method for producing device, and optical part App 20070115450 - Nagasaka; Hiroyuki ; et al.	2007-05-24
Exposure apparatus and method for producing device App 20070035711 - Nei; Masahiro ; et al.	2007-02-15
Exposure apparatus and method for producing device App 20060250596 - Nei; Masahiro ; et al.	2006-11-09
Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method App 20060227306 - Hirukawa; Shigeru ; et al.	2006-10-12
Exposure method, substrate stage, exposure apparatus, and device manufacturing method App 20060227312 - Owa; Soichi ; et al.	2006-10-12
Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method Grant 7,102,731 - Hirukawa , et al. September 5, 2	2006-09-05
Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method Grant 7,088,426 - Hirukawa , et al. August 8, 2	2006-08-08
Exposure apparatus and device manufacturing method App 20060164615 - Hirukawa; Shigeru	2006-07-27
Exposure apparatus and method for producing device App 20060152699 - Nei; Masahiro ; et al.	2006-07-13
Exposure method, substrate stage, exposure apparatus, and device manufacturing method App 20060139614 - Owa; Soichi ; et al.	2006-06-29
Exposure apparatus and device manufacturing method App 20060132738 - Hirukawa; Shigeru	2006-06-22
Exposure apparatus and device manufacturing method App 20060119820 - Hirukawa; Shigeru	2006-06-08
Projection Optical System Adjustment Method, Prediction Method, Evaluation Method, Adjustment Method, Exposure Method And Exposure Apparatus, Program, And Device Manufacturing Method App 20060119823 - Hirukawa; Shigeru ; et al.	2006-06-08
Exposure method, exposure apparatus, and method for producing device App 20060098179 - Hirukawa; Shigeru	2006-05-11
Exposure method, exposure apparatus, and method for producing device App 20060082744 - Hirukawa; Shigeru	2006-04-20
Exposure method and apparatus, and method for fabricating device App 20060072095 - Kudo; Takehito ; et al.	2006-04-06
Pattern decision method and system, mask manufacturing method, image-forming performance adjusting method, exposure method and apparatus, program, and information recording medium App 20060068301 - Hirukawa; Shigeru	2006-03-30
Exposure apparatus and device manufacturing method App 20050259234 - Hirukawa, Shigeru ; et al.	2005-11-24
Exposure apparatus and method for producing device App 20050219489 - Nei, Masahiro ; et al.	2005-10-06
Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium App 20050206850 - Shimizu, Yasuo ; et al.	2005-09-22
Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method App 20050024612 - Hirukawa, Shigeru ; et al.	2005-02-03
Illumination optical apparatus, exposure apparatus and method of exposure App 20040174512 - Toyoda, Mitsunori ; et al.	2004-09-09
Projection exposure apparatus and method employing rectilinear aperture stops for use with periodic mask patterns Grant 6,661,498 - Hirukawa December 9, 2	2003-12-09
Exposure method and exposure apparatus App 20030103196 - Hirukawa, Shigeru	2003-06-05
Illumination optical apparatus, exposure apparatus and method of exposure App 20030038931 - Toyoda, Mitsunori ; et al.	2003-02-27
Photo mask and exposure method using same Grant 6,284,416 - Shiraishi , et al. September 4, 2	2001-09-04
Projection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patterns Grant 6,118,516 - Irie , et al. September 12, 2	2000-09-12
Alignment method Grant 5,808,910 - Irie , et al. September 15, 1	1998-09-15
Projection-exposing apparatus with deflecting grating member Grant 5,703,675 - Hirukawa , et al. December 30, 1	1997-12-30
Imaging characteristic and asymetric abrerration measurement of projection optical system Grant 5,615,006 - Hirukawa , et al. March 25, 1	1997-03-25
Projection exposure apparatus Grant 5,552,856 - Shiraishi , et al. September 3, 1	1996-09-03
Alignment method and alignment apparatus with a statistic calculation using a plurality of weighted coordinate positions Grant 5,525,808 - Irie , et al. June 11, 1	1996-06-11
EGA alignment method using a plurality of weighting coefficients Grant 5,493,402 - Hirukawa February 20, 1	1996-02-20
Exposure condition measurement method Grant 5,434,026 - Takatsu , et al. July 18, 1	1995-07-18
Method of measuring the best focus position having a plurality of measuring mark images and a plurality of focus positions Grant 5,408,083 - Hirukawa , et al. April 18, 1	1995-04-18
Distortion inspecting method for projection optical system Grant 5,402,224 - Hirukawa , et al. March 28, 1	1995-03-28
Projection exposure apparatus Grant 4,931,830 - Suwa , et al. June 5, 1	1990-06-05
Method of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precision Grant 4,908,656 - Suwa , et al. March 13, 1	1990-03-13