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name:-0.02006196975708
name:-0.0028259754180908
HIROTSU; Shin Patent Filings

HIROTSU; Shin

Patent Applications and Registrations

Patent applications and USPTO patent grants for HIROTSU; Shin.The latest application filed is for "plasma processing method and plasma processing apparatus".

Company Profile
1.6.9
  • HIROTSU; Shin - Kurokawa-gun JP
  • HIROTSU; Shin - Miyagi JP
  • Hirotsu; Shin - Nirasaki JP
  • Hirotsu; Shin - Nirasaki-Shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Plasma Processing Method And Plasma Processing Apparatus
App 20200381215 - KOSHIMIZU; Chishio ;   et al.
2020-12-03
Plasma Processing Apparatus And Control Method
App 20200273670 - KOSHIMIZU; Chishio ;   et al.
2020-08-27
Plasma processing apparatus and control method
Grant 10,672,589 - Koshimizu , et al.
2020-06-02
Plasma Processing Apparatus And Control Method
App 20200118794 - KOSHIMIZU; Chishio ;   et al.
2020-04-16
Method for etching etching target layer
Grant 9,418,863 - Hirotsu , et al. August 16, 2
2016-08-16
Method for etching insulation film
Grant 9,312,105 - Takahashi , et al. April 12, 2
2016-04-12
Method For Etching Insulation Film
App 20150371830 - TAKAHASHI; Akira ;   et al.
2015-12-24
Method For Etching Etching Target Layer
App 20150332932 - HIROTSU; Shin ;   et al.
2015-11-19
Method for manufacturing semiconductor device and storage medium
Grant 8,097,534 - Ogawa , et al. January 17, 2
2012-01-17
Plasma etching method and computer readable storage medium
Grant 7,943,523 - Hirotsu , et al. May 17, 2
2011-05-17
Method for manufacturing semiconductor device and storage medium
App 20090047794 - Ogawa; Shuhei ;   et al.
2009-02-19
Plasma etching method, plasma etching apparatus, control program and computer storage medium with enhanced selectivity
Grant 7,465,670 - Hirotsu , et al. December 16, 2
2008-12-16
Plasma Etching Method And Computer Readable Storage Medium
App 20080045031 - HIROTSU; Shin ;   et al.
2008-02-21
Method of manufacturing semiconductor device and plasma processing apparatus
App 20080020584 - Hirotsu; Shin ;   et al.
2008-01-24
Plasma etching method, plasma etching apparatus, control program and computer storage medium
App 20060213866 - Hirotsu; Shin ;   et al.
2006-09-28

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