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Patent applications and USPTO patent grants for HIROTSU; Shin.The latest application filed is for "plasma processing method and plasma processing apparatus".
Patent | Date |
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Plasma Processing Method And Plasma Processing Apparatus App 20200381215 - KOSHIMIZU; Chishio ;   et al. | 2020-12-03 |
Plasma Processing Apparatus And Control Method App 20200273670 - KOSHIMIZU; Chishio ;   et al. | 2020-08-27 |
Plasma processing apparatus and control method Grant 10,672,589 - Koshimizu , et al. | 2020-06-02 |
Plasma Processing Apparatus And Control Method App 20200118794 - KOSHIMIZU; Chishio ;   et al. | 2020-04-16 |
Method for etching etching target layer Grant 9,418,863 - Hirotsu , et al. August 16, 2 | 2016-08-16 |
Method for etching insulation film Grant 9,312,105 - Takahashi , et al. April 12, 2 | 2016-04-12 |
Method For Etching Insulation Film App 20150371830 - TAKAHASHI; Akira ;   et al. | 2015-12-24 |
Method For Etching Etching Target Layer App 20150332932 - HIROTSU; Shin ;   et al. | 2015-11-19 |
Method for manufacturing semiconductor device and storage medium Grant 8,097,534 - Ogawa , et al. January 17, 2 | 2012-01-17 |
Plasma etching method and computer readable storage medium Grant 7,943,523 - Hirotsu , et al. May 17, 2 | 2011-05-17 |
Method for manufacturing semiconductor device and storage medium App 20090047794 - Ogawa; Shuhei ;   et al. | 2009-02-19 |
Plasma etching method, plasma etching apparatus, control program and computer storage medium with enhanced selectivity Grant 7,465,670 - Hirotsu , et al. December 16, 2 | 2008-12-16 |
Plasma Etching Method And Computer Readable Storage Medium App 20080045031 - HIROTSU; Shin ;   et al. | 2008-02-21 |
Method of manufacturing semiconductor device and plasma processing apparatus App 20080020584 - Hirotsu; Shin ;   et al. | 2008-01-24 |
Plasma etching method, plasma etching apparatus, control program and computer storage medium App 20060213866 - Hirotsu; Shin ;   et al. | 2006-09-28 |
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