Hiroshima; Masahito

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hiroshima; Masahito.The latest application filed is for "imprint apparatus and imprint method".

Company Profile

0.8.11

Hiroshima; Masahito - Tokyo JP
HIROSHIMA; Masahito - Chuo-ku JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Imprint apparatus and imprint method Grant 10,131,135 - Matsuoka , et al. November 20, 2	2018-11-20
Imprint Apparatus And Imprint Method App 20170021607 - MATSUOKA; Yasuo ; et al.	2017-01-26
Phase Shift Mask And Method For Manufacturing The Same, And Method For Manufacturing Integrated Circuit App 20120058421 - HIROSHIMA; Masahito	2012-03-08
Phase shift mask and method for manufacturing the same, and method for manufacturing integrated circuit Grant 8,124,303 - Hiroshima February 28, 2	2012-02-28
Apparatus including defect correcting system which repeats a correcting of a reticle pattern defect and a correcting method using the apparatus Grant 8,090,188 - Hiroshima January 3, 2	2012-01-03
Fine resist pattern forming method and nanoimprint mold structure Grant 7,922,960 - Hiroshima April 12, 2	2011-04-12
Semiconductor device and manufacturing method thereof Grant 7,776,495 - Hiroshima , et al. August 17, 2	2010-08-17
Phase Shift Mask And Method For Manufacturing The Same, And Method For Manufacturing Integrated Circuit App 20100159369 - HIROSHIMA; Masahito	2010-06-24
Variable shaped electron beam lithography system and method for manufacturing substrate Grant 7,714,308 - Hiroshima May 11, 2	2010-05-11
Method of manufacturing phase shift photomask App 20090092906 - Hiroshima; Masahito	2009-04-09
Fine resist pattern forming method and nanoimprint mold structure App 20090001634 - Hiroshima; Masahito	2009-01-01
Method of manufacturing semiconductor device Grant 7,438,998 - Hiroshima October 21, 2	2008-10-21
Variable shaped electron beam lithography system and method for manufacturing substrate App 20080054196 - Hiroshima; Masahito	2008-03-06
Apparatus for correcting defects in a reticle pattern and correcting method for the same App 20080050010 - Hiroshima; Masahito	2008-02-28
Semiconductor device and manufacturing method thereof App 20070172746 - Hiroshima; Masahito ; et al.	2007-07-26
Semiconductor device and manufacturing method thereof Grant 7,208,788 - Hiroshima , et al. April 24, 2	2007-04-24
Semiconductor device and manufacturing method thereof App 20050116272 - Hiroshima, Masahito ; et al.	2005-06-02
Method of manufacturing semiconductor device App 20050084806 - Hiroshima, Masahito	2005-04-21
Method of manufacturing semiconductor device App 20050074679 - Hiroshima, Masahito	2005-04-07

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