loadpatents
Patent applications and USPTO patent grants for Hirose; Keizo.The latest application filed is for "joining device and joining system".
Patent | Date |
---|---|
Joining device and joining system Grant 9,960,069 - Sugihara , et al. May 1, 2 | 2018-05-01 |
Joining Device And Joining System App 20140208556 - SUGIHARA; Shintaro ;   et al. | 2014-07-31 |
Joining Device And Joining System App 20140208557 - SUGIHARA; Shintaro ;   et al. | 2014-07-31 |
Joining Method, Joining Device And Joining System App 20130327463 - Kitahara; Shigenori ;   et al. | 2013-12-12 |
Plasma Processing Apparatus App 20130112666 - KOSHIISHI; Akira ;   et al. | 2013-05-09 |
Plasma processing apparatus Grant 8,080,126 - Koshiishi , et al. December 20, 2 | 2011-12-20 |
Plasma Processing Apparatus App 20100326601 - Koshiishi; Akira ;   et al. | 2010-12-30 |
Apparatus for plasma processing Grant 7,537,672 - Koshiishi , et al. May 26, 2 | 2009-05-26 |
Plasma Processing Apparatus App 20080308041 - KOSHIISHI; Akira ;   et al. | 2008-12-18 |
Aperture Mask, Manufacturing Method Thereof, Charge Beam Lithography Apparatus, And Charge Beam Lithography Method App 20080305408 - HIROSE; Keizo | 2008-12-11 |
Substrate processing apparatus and substrate processing method Grant 7,364,626 - Hirose , et al. April 29, 2 | 2008-04-29 |
Method of manufacturing trench structure for device App 20070148985 - Mizutani; Nobutaka ;   et al. | 2007-06-28 |
Method of manufacturing trench structure for device Grant 7,176,142 - Mizutani , et al. February 13, 2 | 2007-02-13 |
Substrate cleaning tool and substrate cleaning apparatus Grant 7,010,826 - Hirose , et al. March 14, 2 | 2006-03-14 |
Plasma processing apparatus App 20050061445 - Koshiishi, Akira ;   et al. | 2005-03-24 |
Method of manufacturing trench structure for device App 20040002214 - Mizutani, Nobutaka ;   et al. | 2004-01-01 |
Substrate processing apparatus and substrate processing method App 20030079764 - Hirose, Keizo ;   et al. | 2003-05-01 |
Plasma treatment method and apparatus Grant 6,544,380 - Tomoyasu , et al. April 8, 2 | 2003-04-08 |
Substrate washing method Grant 6,432,212 - Hirose , et al. August 13, 2 | 2002-08-13 |
Plasma treatment method and apparatus App 20020088547 - Tomoyasu, Masayuki ;   et al. | 2002-07-11 |
Scrubbing apparatus Grant 6,385,805 - Konishi , et al. May 14, 2 | 2002-05-14 |
Substrate cleaning tool and substrate cleaning apparatus App 20020035763 - Hirose, Keizo ;   et al. | 2002-03-28 |
Method of forming resist film Grant 6,300,043 - Konishi , et al. October 9, 2 | 2001-10-09 |
Plasma treatment method and apparatus App 20010013504 - Imafuku, Kosuke ;   et al. | 2001-08-16 |
Scrubbing Apparatus App 20010010103 - KONISHI, NOBUO ;   et al. | 2001-08-02 |
Plasma treatment method and apparatus Grant 6,264,788 - Tomoyasu , et al. July 24, 2 | 2001-07-24 |
Process solution supplying apparatus Grant 6,165,270 - Konishi , et al. December 26, 2 | 2000-12-26 |
Plasma treatment method utilizing an amplitude-modulated high frequency power Grant 6,106,737 - Tomoyasu , et al. August 22, 2 | 2000-08-22 |
Plasma processing apparatus Grant 6,074,518 - Imafuku , et al. June 13, 2 | 2000-06-13 |
Apparatus and method for forming liquid film Grant 6,012,858 - Konishi , et al. January 11, 2 | 2000-01-11 |
Plasma processing apparatus Grant 5,919,332 - Koshiishi , et al. July 6, 1 | 1999-07-06 |
Plasma treatment apparatus and method Grant 5,698,062 - Sakamoto , et al. December 16, 1 | 1997-12-16 |
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