loadpatents
name:-0.020857095718384
name:-0.021604061126709
name:-0.00049901008605957
Hirose; Keizo Patent Filings

Hirose; Keizo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hirose; Keizo.The latest application filed is for "joining device and joining system".

Company Profile
0.17.16
  • Hirose; Keizo - Koshi JP
  • HIROSE; Keizo - Koshi City JP
  • Hirose; Keizo - Koshi-shi JP
  • HIROSE; Keizo - Nirasaki-shi JP
  • Hirose; Keizo - Nirasaki JP
  • HIROSE; Keizo - Sagamihara-Shi JP
  • Hirose; Keizo - Nirasaki-city JP
  • Hirose; Keizo - Kofu JP
  • Hirose, Keizo - Kofu-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Joining device and joining system
Grant 9,960,069 - Sugihara , et al. May 1, 2
2018-05-01
Joining Device And Joining System
App 20140208556 - SUGIHARA; Shintaro ;   et al.
2014-07-31
Joining Device And Joining System
App 20140208557 - SUGIHARA; Shintaro ;   et al.
2014-07-31
Joining Method, Joining Device And Joining System
App 20130327463 - Kitahara; Shigenori ;   et al.
2013-12-12
Plasma Processing Apparatus
App 20130112666 - KOSHIISHI; Akira ;   et al.
2013-05-09
Plasma processing apparatus
Grant 8,080,126 - Koshiishi , et al. December 20, 2
2011-12-20
Plasma Processing Apparatus
App 20100326601 - Koshiishi; Akira ;   et al.
2010-12-30
Apparatus for plasma processing
Grant 7,537,672 - Koshiishi , et al. May 26, 2
2009-05-26
Plasma Processing Apparatus
App 20080308041 - KOSHIISHI; Akira ;   et al.
2008-12-18
Aperture Mask, Manufacturing Method Thereof, Charge Beam Lithography Apparatus, And Charge Beam Lithography Method
App 20080305408 - HIROSE; Keizo
2008-12-11
Substrate processing apparatus and substrate processing method
Grant 7,364,626 - Hirose , et al. April 29, 2
2008-04-29
Method of manufacturing trench structure for device
App 20070148985 - Mizutani; Nobutaka ;   et al.
2007-06-28
Method of manufacturing trench structure for device
Grant 7,176,142 - Mizutani , et al. February 13, 2
2007-02-13
Substrate cleaning tool and substrate cleaning apparatus
Grant 7,010,826 - Hirose , et al. March 14, 2
2006-03-14
Plasma processing apparatus
App 20050061445 - Koshiishi, Akira ;   et al.
2005-03-24
Method of manufacturing trench structure for device
App 20040002214 - Mizutani, Nobutaka ;   et al.
2004-01-01
Substrate processing apparatus and substrate processing method
App 20030079764 - Hirose, Keizo ;   et al.
2003-05-01
Plasma treatment method and apparatus
Grant 6,544,380 - Tomoyasu , et al. April 8, 2
2003-04-08
Substrate washing method
Grant 6,432,212 - Hirose , et al. August 13, 2
2002-08-13
Plasma treatment method and apparatus
App 20020088547 - Tomoyasu, Masayuki ;   et al.
2002-07-11
Scrubbing apparatus
Grant 6,385,805 - Konishi , et al. May 14, 2
2002-05-14
Substrate cleaning tool and substrate cleaning apparatus
App 20020035763 - Hirose, Keizo ;   et al.
2002-03-28
Method of forming resist film
Grant 6,300,043 - Konishi , et al. October 9, 2
2001-10-09
Plasma treatment method and apparatus
App 20010013504 - Imafuku, Kosuke ;   et al.
2001-08-16
Scrubbing Apparatus
App 20010010103 - KONISHI, NOBUO ;   et al.
2001-08-02
Plasma treatment method and apparatus
Grant 6,264,788 - Tomoyasu , et al. July 24, 2
2001-07-24
Process solution supplying apparatus
Grant 6,165,270 - Konishi , et al. December 26, 2
2000-12-26
Plasma treatment method utilizing an amplitude-modulated high frequency power
Grant 6,106,737 - Tomoyasu , et al. August 22, 2
2000-08-22
Plasma processing apparatus
Grant 6,074,518 - Imafuku , et al. June 13, 2
2000-06-13
Apparatus and method for forming liquid film
Grant 6,012,858 - Konishi , et al. January 11, 2
2000-01-11
Plasma processing apparatus
Grant 5,919,332 - Koshiishi , et al. July 6, 1
1999-07-06
Plasma treatment apparatus and method
Grant 5,698,062 - Sakamoto , et al. December 16, 1
1997-12-16

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