Patent | Date |
---|
Composition for antireflection film formation and method for resist pattern formation using the composition Grant 8,455,182 - Sawano , et al. June 4, 2 | 2013-06-04 |
Compound, positive resist composition and resist pattern forming method Grant 8,389,197 - Hirosaki , et al. March 5, 2 | 2013-03-05 |
Anti-reflection film forming material, and method for forming resist pattern using the same Grant 8,216,775 - Shirai , et al. July 10, 2 | 2012-07-10 |
Positive resist composition and resist pattern forming method Grant 8,206,887 - Hirosaki , et al. June 26, 2 | 2012-06-26 |
Composition for formation of anti-reflection film, and method for formation of resist pattern using the same Grant 8,158,328 - Sawano , et al. April 17, 2 | 2012-04-17 |
Positive resist composition and resist pattern forming method Grant 8,062,825 - Ando , et al. November 22, 2 | 2011-11-22 |
Negative resist composition and method of forming resist pattern Grant 7,981,588 - Hirosaki , et al. July 19, 2 | 2011-07-19 |
Positive resist composition and method of forming resist pattern Grant 7,871,753 - Matsumiya , et al. January 18, 2 | 2011-01-18 |
Composition For Antireflection Film Formation And Method For Resist Pattern Formation Using The Composition App 20100104987 - Sawano; Atsushi ;   et al. | 2010-04-29 |
Composition For Antireflection Film Formation And Method Of Forming Resist Pattern With The Same App 20100104978 - Sawano; Atsushi ;   et al. | 2010-04-29 |
Negative Resist Composition And Method Of Forming Resist Pattern App 20090269693 - Hirosaki; Takako ;   et al. | 2009-10-29 |
Anti-reflection film forming material, and method for forming resist pattern using the same App 20090253077 - Shirai; Yuriko ;   et al. | 2009-10-08 |
Positive Resist Composition And Method Of Forming Resist Pattern App 20090162786 - Matsumiya; Tasuku ;   et al. | 2009-06-25 |
Compound, Positive Resist Composition And Resist Pattern Forming Method App 20090117488 - Hirosaki; Takako ;   et al. | 2009-05-07 |
Positive Resist Composition And Resist Pattern Forming Method App 20090092921 - Hirosaki; Takako ;   et al. | 2009-04-09 |
Positive Resist Composition And Resist Pattern Forming Method App 20090075177 - Ando; Tomoyuki ;   et al. | 2009-03-19 |
Positive Resist Composition And Resist Pattern Forming Method App 20090047600 - Hirosaki; Takako ;   et al. | 2009-02-19 |
Resist Composition For Supercritical Development App 20070196764 - HIROSAKI; Takako ;   et al. | 2007-08-23 |
Photoresist composition and method of forming resist pattern App 20070190447 - Ogata; Toshiyuki ;   et al. | 2007-08-16 |
Negative photoresist composition App 20060281023 - Hirosaki; Takako ;   et al. | 2006-12-14 |
Multilayered body for photolithographic patterning Grant 7,033,731 - Tachikawa , et al. April 25, 2 | 2006-04-25 |
Negative-working photoresist composition Grant 6,864,036 - Tachikawa , et al. March 8, 2 | 2005-03-08 |
Multilayered body for photolithographic patterning App 20050008972 - Tachikawa, Toshikazu ;   et al. | 2005-01-13 |
Photoresist pattern and forming method thereof App 20040023133 - Shimbori, Hiroshi ;   et al. | 2004-02-05 |
Multilayered body for photolithographic patterning App 20020146645 - Tachikawa, Toshikazu ;   et al. | 2002-10-10 |
Negative-working photoresist composition Grant 6,406,829 - Tachikawa , et al. June 18, 2 | 2002-06-18 |
Negative-working photoresist composition App 20020061467 - Tachikawa, Toshikazu ;   et al. | 2002-05-23 |
Undercoating composition for photolithographic resist App 20010049072 - Hirosaki, Takako ;   et al. | 2001-12-06 |
Undercoating composition for photolithographic resist App 20010018163 - Hirosaki, Takako ;   et al. | 2001-08-30 |
Method for the formation of a planarizing coating film on substrate surface App 20010003068 - Iguchi, Etsuko ;   et al. | 2001-06-07 |