loadpatents
name:-0.021559953689575
name:-0.01258111000061
name:-0.0023372173309326
Hirosaki; Takako Patent Filings

Hirosaki; Takako

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hirosaki; Takako.The latest application filed is for "composition for antireflection film formation and method of forming resist pattern with the same".

Company Profile
0.13.19
  • Hirosaki; Takako - Kanagawa JP
  • Hirosaki; Takako - Kawasaki N/A JP
  • Hirosaki; Takako - Kanagawa-ken JP
  • Hirosaki; Takako - Kawasaki-shi JP
  • Hirosaki; Takako - Hiratsuka JP
  • Hirosaki, Takako - Hiratsuka-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Composition for antireflection film formation and method for resist pattern formation using the composition
Grant 8,455,182 - Sawano , et al. June 4, 2
2013-06-04
Compound, positive resist composition and resist pattern forming method
Grant 8,389,197 - Hirosaki , et al. March 5, 2
2013-03-05
Anti-reflection film forming material, and method for forming resist pattern using the same
Grant 8,216,775 - Shirai , et al. July 10, 2
2012-07-10
Positive resist composition and resist pattern forming method
Grant 8,206,887 - Hirosaki , et al. June 26, 2
2012-06-26
Composition for formation of anti-reflection film, and method for formation of resist pattern using the same
Grant 8,158,328 - Sawano , et al. April 17, 2
2012-04-17
Positive resist composition and resist pattern forming method
Grant 8,062,825 - Ando , et al. November 22, 2
2011-11-22
Negative resist composition and method of forming resist pattern
Grant 7,981,588 - Hirosaki , et al. July 19, 2
2011-07-19
Positive resist composition and method of forming resist pattern
Grant 7,871,753 - Matsumiya , et al. January 18, 2
2011-01-18
Composition For Antireflection Film Formation And Method For Resist Pattern Formation Using The Composition
App 20100104987 - Sawano; Atsushi ;   et al.
2010-04-29
Composition For Antireflection Film Formation And Method Of Forming Resist Pattern With The Same
App 20100104978 - Sawano; Atsushi ;   et al.
2010-04-29
Negative Resist Composition And Method Of Forming Resist Pattern
App 20090269693 - Hirosaki; Takako ;   et al.
2009-10-29
Anti-reflection film forming material, and method for forming resist pattern using the same
App 20090253077 - Shirai; Yuriko ;   et al.
2009-10-08
Positive Resist Composition And Method Of Forming Resist Pattern
App 20090162786 - Matsumiya; Tasuku ;   et al.
2009-06-25
Compound, Positive Resist Composition And Resist Pattern Forming Method
App 20090117488 - Hirosaki; Takako ;   et al.
2009-05-07
Positive Resist Composition And Resist Pattern Forming Method
App 20090092921 - Hirosaki; Takako ;   et al.
2009-04-09
Positive Resist Composition And Resist Pattern Forming Method
App 20090075177 - Ando; Tomoyuki ;   et al.
2009-03-19
Positive Resist Composition And Resist Pattern Forming Method
App 20090047600 - Hirosaki; Takako ;   et al.
2009-02-19
Resist Composition For Supercritical Development
App 20070196764 - HIROSAKI; Takako ;   et al.
2007-08-23
Photoresist composition and method of forming resist pattern
App 20070190447 - Ogata; Toshiyuki ;   et al.
2007-08-16
Negative photoresist composition
App 20060281023 - Hirosaki; Takako ;   et al.
2006-12-14
Multilayered body for photolithographic patterning
Grant 7,033,731 - Tachikawa , et al. April 25, 2
2006-04-25
Negative-working photoresist composition
Grant 6,864,036 - Tachikawa , et al. March 8, 2
2005-03-08
Multilayered body for photolithographic patterning
App 20050008972 - Tachikawa, Toshikazu ;   et al.
2005-01-13
Photoresist pattern and forming method thereof
App 20040023133 - Shimbori, Hiroshi ;   et al.
2004-02-05
Multilayered body for photolithographic patterning
App 20020146645 - Tachikawa, Toshikazu ;   et al.
2002-10-10
Negative-working photoresist composition
Grant 6,406,829 - Tachikawa , et al. June 18, 2
2002-06-18
Negative-working photoresist composition
App 20020061467 - Tachikawa, Toshikazu ;   et al.
2002-05-23
Undercoating composition for photolithographic resist
App 20010049072 - Hirosaki, Takako ;   et al.
2001-12-06
Undercoating composition for photolithographic resist
App 20010018163 - Hirosaki, Takako ;   et al.
2001-08-30
Method for the formation of a planarizing coating film on substrate surface
App 20010003068 - Iguchi, Etsuko ;   et al.
2001-06-07

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed