Hiraoka; Hiroyuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hiraoka; Hiroyuki.The latest application filed is for "carbon nanotubes and method of manufacturing same, electron emission source, and display".

Company Profile

0.11.2

Hiraoka; Hiroyuki - Kawasaki JP
Hiraoka; Hiroyuki - Kawasaki-shi JP
Hiraoka; Hiroyuki - Kyoto JP
Hiraoka; Hiroyuki - Saratoga CA
Hiraoka; Hiroyuki - Los Gatos CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Carbon nanotubes and method of manufacturing same, electron emission source, and display Grant 7,511,206 - Hiraoka , et al. March 31, 2	2009-03-31
Carbon nanotubes and method of manufacturing same, electron emission source, and display App 20060054491 - Hiraoka; Hiroyuki ; et al.	2006-03-16
Carbon nanotubes and method of manufacturing same, electron emission source, and display App 20030108478 - Hiraoka, Hiroyuki ; et al.	2003-06-12
Liquid crystal alignment layer, production method for the same, and liquid crystal display device comprising the same Grant 6,312,769 - Hiraoka , et al. November 6, 2	2001-11-06
Spray silylation of photoresist images Grant 4,999,280 - Hiraoka March 12, 1	1991-03-12
Microlithographic resist containing poly(1,1-dialkylsilazane) Grant 4,770,974 - Hiraoka September 13, 1	1988-09-13
Process for enhancing the resistance of a resist image to reactive ion etching and to thermal flow Grant 4,690,838 - Hiraoka , et al. September 1, 1	1987-09-01
Dry process for forming positive tone micro patterns Grant 4,507,331 - Hiraoka March 26, 1	1985-03-26
Process for making an imaged oxygen-reactive ion etch barrier Grant 4,464,460 - Hiraoka , et al. August 7, 1	1984-08-07
Deposition of polymer films by means of ion beams Grant 4,460,436 - Hiraoka July 17, 1	1984-07-17
Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light Grant 4,389,482 - Bargon , et al. June 21, 1	1983-06-21
Electro-lithography method Grant 4,119,688 - Hiraoka October 10, 1	1978-10-10
Positive resists containing dimethylglutarimide units Grant 3,964,908 - Bargon , et al. June 22, 1	1976-06-22

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