HIRANO; Taichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for HIRANO; Taichi.The latest application filed is for "control method and plasma processing apparatus".

Company Profile

2.18.22

HIRANO; Taichi - Miyagi JP
Hirano; Taichi - Kurokawa-gun JP
Hirano; Taichi - Kanagawa JP
Hirano; Taichi - Tokyo JP
Hirano; Taichi - Yamanashi JP
Hirano; Taichi - Nirasaki JP
Hirano; Taichi - Nirasaki-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Control Method And Plasma Processing Apparatus App 20220216036 - KOSHIMIZU; Chishio ; et al.	2022-07-07
Control Method And Plasma Processing Apparatus App 20210327681 - KOSHIMIZU; Chishio ; et al.	2021-10-21
Control Method And Plasma Processing Apparatus App 20200411286 - KOSHIMIZU; Chishio ; et al.	2020-12-31
Power supply system Grant 10,755,894 - Hirano , et al. A	2020-08-25
Plasma processing apparatus and probe apparatus Grant 10,229,819 - Hirano , et al.	2019-03-12
Plasma processing apparatus Grant 10,115,567 - Hirano , et al. October 30, 2	2018-10-30
Power supply system, plasma processing apparatus and power supply control method Grant 10,056,230 - Hirano , et al. August 21, 2	2018-08-21
Power Supply System App 20180226226 - Hirano; Taichi ; et al.	2018-08-09
Power supply system, plasma etching apparatus, and plasma etching method Grant 9,922,802 - Hirano , et al. March 20, 2	2018-03-20
Connector system capable of mitigating signal deterioration Grant 9,893,475 - Toba , et al. February 13, 2	2018-02-13
Wire connection device, camera head and endoscopic device Grant 9,833,127 - Tomatsu , et al. December 5, 2	2017-12-05
Connector, data transmitting apparatus, data receiving apparatus, and data transmitting and receiving system Grant 9,698,539 - Toba , et al. July 4, 2	2017-07-04
Power Supply System, Plasma Processing Apparatus And Power Supply Control Method App 20160284514 - Hirano; Taichi ; et al.	2016-09-29
Connector, Data Transmitting Apparatus, Data Receiving Apparatus, And Data Transmitting And Receiving System App 20160087377 - TOBA; Kazuaki ; et al.	2016-03-24
Plasma Processing Apparatus App 20160079037 - Hirano; Taichi ; et al.	2016-03-17
Connector, cable, transmission device, reception device, and manufacturing method of connector Grant 9,209,570 - Toba , et al. December 8, 2	2015-12-08
Connector, Data Receiving Apparatus, Data Transmitting Apparatus, And Data Transmitting And Receiving System App 20150333456 - TOBA; KAZUAKI ; et al.	2015-11-19
Wire Connection Device, Camera Head And Endoscopic Device App 20150250378 - TOMATSU; Kei ; et al.	2015-09-10
Plasma Processing Apparatus And Probe Apparatus App 20150114563 - Hirano; Taichi ; et al.	2015-04-30
Chamber cleaning method Grant 8,999,068 - Honda , et al. April 7, 2	2015-04-07
Power Supply System, Plasma Etching Apparatus, And Plasma Etching Method App 20150000842 - Hirano; Taichi ; et al.	2015-01-01
Connector, Cable, Transmission Device, Reception Device, And Method Of Manufacturing Connector App 20130243106 - Toba; Kazuaki ; et al.	2013-09-19
Plasma processing method and apparatus Grant 8,512,510 - Koshiishi , et al. August 20, 2	2013-08-20
Plasma processing apparatus and impedance adjustment method Grant 8,193,097 - Hirano June 5, 2	2012-06-05
Substrate processing method and substrate processing apparatus Grant 8,178,444 - Koshimizu , et al. May 15, 2	2012-05-15
Plasma Processing Method And Apparatus App 20110214813 - Koshiishi; Akira ; et al.	2011-09-08
Chamber Cleaning Method App 20110048453 - Honda; Masanobu ; et al.	2011-03-03
Plasma Processing Method And Apparatus App 20100043974 - Koshiishi; Akira ; et al.	2010-02-25
Plasma Processing Apparatus And Impedance Adjustment Method App 20090223926 - Hirano; Taichi	2009-09-10
Substrate Processing Method And Substrate Processing Apparatus App 20090197423 - KOSHIMIZU; Chishio ; et al.	2009-08-06
Plasma processing apparatus and method Grant 7,506,610 - Koshiishi , et al. March 24, 2	2009-03-24
Plasma processing apparatus and method, and electrode plate for plasma processing apparatus Grant 7,494,561 - Koshiishi , et al. February 24, 2	2009-02-24
Plasma processing apparatus and impedance adjustment method App 20060021580 - Hirano; Taichi	2006-02-02
Plasma processing method and apparatus App 20060000803 - Koshiishi; Akira ; et al.	2006-01-05
Plasma processing apparatus and method, and electrode plate for plasma processing apparatus App 20050269292 - Koshiishi, Akira ; et al.	2005-12-08
Plasma processing apparatus and method App 20050257743 - Koshiishi, Akira ; et al.	2005-11-24

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