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name:-0.0034289360046387
name:-0.0043370723724365
name:-0.00081205368041992
Hirakawa; Eiji Patent Filings

Hirakawa; Eiji

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hirakawa; Eiji.The latest application filed is for "plasma processing apparatus for powder and plasma processing method for powder".

Company Profile
0.3.2
  • Hirakawa; Eiji - Higashiizumo JP
  • Hirakawa; Eiji - Yonago JP
  • Hirakawa; Eiji - Shimane JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Plasma processing apparatus for powder and plasma processing method for powder
Grant 7,381,363 - Uesaka , et al. June 3, 2
2008-06-03
Method of manufacturing a sintered body
Grant 7,135,141 - Han , et al. November 14, 2
2006-11-14
Plasma processing apparatus for powder and plasma processing method for powder
App 20050183542 - Uesaka, Shujiroh ;   et al.
2005-08-25
Method of manufacturing a sintered body
App 20040191108 - Han, Gang ;   et al.
2004-09-30
Low resistive tantalum thin film structure and method for forming the same
Grant 6,110,598 - Maeda , et al. August 29, 2
2000-08-29

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