Hiraga; Toshitaka

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hiraga; Toshitaka.The latest application filed is for "aqueous fluoride compositions for cleaning semiconductor devices".

Company Profile

0.5.7

Hiraga; Toshitaka - Kanagawa JP
Hiraga; Toshitaka - Setagaya-ku JP
Hiraga, Toshitaka - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method to remove resist, etch residue, and copper oxide from substrates having copper and low-k dielectric material Grant 7,718,590 - Suzuki , et al. May 18, 2	2010-05-18
Aqueous fluoride compositions for cleaning semiconductor devices App 20090099051 - Aoyama; Tetsuo ; et al.	2009-04-16
Aqueous fluoride compositions for cleaning semiconductor devices Grant 7,399,365 - Aoyama , et al. July 15, 2	2008-07-15
Separation-material composition for photo-resist and manufacturing method of semiconductor device App 20080076260 - Muramatsu; Masafumi ; et al.	2008-03-27
Separation-material composition for photo-resist and manufacturing method of semiconductor device Grant 7,341,827 - Muramatsu , et al. March 11, 2	2008-03-11
Cleaning composition for removing resists and method of manufacturing semiconductor device Grant 7,250,391 - Kanno , et al. July 31, 2	2007-07-31
Method to remove resist, etch residue, and copper oxide from substrates having copper and low-k dielectric material App 20060199749 - Suzuki; Tomoko ; et al.	2006-09-07
Resist stripping composition and method of producing semiconductor device using the same Grant 7,087,563 - Iwamoto , et al. August 8, 2	2006-08-08
Aqueous fluoride compositions for cleaning semiconductor devices App 20050014667 - Aoyama, Tetsuo ; et al.	2005-01-20
Cleaning composition for removing resists and method of manufacturing semiconductor device App 20040106531 - Kanno, Itaru ; et al.	2004-06-03
Composition for releasing a resist and method for manufacturing semiconductor device using the same App 20040081924 - Iwamoto, Hayato ; et al.	2004-04-29
Separation-material composition for photo-resist and manufacturing method of semiconductor device App 20040038154 - Muramatsu, Masafumi ; et al.	2004-02-26

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