Hirae; Sadao
Patent Applications and Registrations
Patent applications and USPTO patent grants for Hirae; Sadao.The latest application filed is for "substrate treatment method and substrate treatment apparatus".
- Hirae; Sadao - Kyoto JP
- Hirae; Sadao - Kyoto-shi
- Hirae, Sadao - Fushimi-ku JP
| Patent | Date |
|---|---|
| Substrate treatment method and substrate treatment apparatus Grant 7,600,522 - Sato , et al. October 13, 2 | 2009-10-13 |
| Substrate Treatment Method And Substrate Treatment Apparatus App 20090165828 - Sato; Masanobu ; et al. | 2009-07-02 |
| Substrate processing apparatus Grant 7,479,205 - Okuda , et al. January 20, 2 | 2009-01-20 |
| Substrate processing apparatus Grant 7,428,907 - Okuda , et al. September 30, 2 | 2008-09-30 |
| Substrate processing apparatus Grant 7,267,130 - Okuda , et al. September 11, 2 | 2007-09-11 |
| Substrate processing apparatus and substrate processing method App 20060191556 - Nakazawa; Yoshiyuki ; et al. | 2006-08-31 |
| Substrate treating method and apparatus App 20050229946 - Hirae, Sadao ; et al. | 2005-10-20 |
| Substrate processing apparatus Grant 6,951,221 - Okuda , et al. October 4, 2 | 2005-10-04 |
| Substrate cleaning apparatus Grant 6,901,938 - Sato , et al. June 7, 2 | 2005-06-07 |
| Substrate treatment method and sustrate treatment apparatus App 20040235308 - Sato, Masanobu ; et al. | 2004-11-25 |
| Substrate processing apparatus App 20040206378 - Okuda, Seiichiro ; et al. | 2004-10-21 |
| Substrate processing apparatus App 20040206452 - Okuda, Seiichiro ; et al. | 2004-10-21 |
| Substrate processing apparatus App 20040206379 - Okuda, Seiichiro ; et al. | 2004-10-21 |
| Substrate processing apparatus App 20040200513 - Okuda, Seiichiro ; et al. | 2004-10-14 |
| Substrate cleaning apparatus App 20040089328 - Sato, Masanobu ; et al. | 2004-05-13 |
| Cleaning nozzle and substrate cleaning apparatus Grant 6,729,561 - Hirae , et al. May 4, 2 | 2004-05-04 |
| Substrate cleaning apparatus Grant 6,705,331 - Sato , et al. March 16, 2 | 2004-03-16 |
| Substrate cleaning apparatus and substrate cleaning method App 20040003829 - Hirae, Sadao | 2004-01-08 |
| Substrate processing apparatus and substrate cleaning method App 20030178047 - Hirae, Sadao | 2003-09-25 |
| Substrate cleaning apparatus Grant 6,598,805 - Sakai , et al. July 29, 2 | 2003-07-29 |
| Substrate cleaning apparatus App 20020179732 - Sakai, Takamasa ; et al. | 2002-12-05 |
| Substrate cleaning apparatus App 20020059947 - Sato, Masanobu ; et al. | 2002-05-23 |
| Substrate processing apparatus App 20020035762 - Okuda, Seiichiro ; et al. | 2002-03-28 |
| Cleaning nozzle and substrate cleaning apparatus App 20020020763 - Hirae, Sadao ; et al. | 2002-02-21 |
| Substrate treating method and apparatus App 20010001392 - Hirae, Sadao ; et al. | 2001-05-24 |
| Method and apparatus for measuring insulation film thickness of semiconductor wafer Grant 5,568,252 - Kusuda , et al. October 22, 1 | 1996-10-22 |
| Method of and apparatus for evaluating crystal rate in silicon thin film Grant 5,314,831 - Hirae , et al. May 24, 1 | 1994-05-24 |
| Optical gap measuring device using frustrated internal reflection Grant 5,239,183 - Kouno , et al. August 24, 1 | 1993-08-24 |
| Gap measuring device and method using frustrated internal reflection Grant 5,225,690 - Sakai , et al. July 6, 1 | 1993-07-06 |
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