loadpatents
Patent applications and USPTO patent grants for Hinata; Shintaro.The latest application filed is for "sputtering target".
Patent | Date |
---|---|
Sputtering Target App 20210269911 - Tham; Kim Kong ;   et al. | 2021-09-02 |
Sputtering target Grant 11,072,851 - Tham , et al. July 27, 2 | 2021-07-27 |
Sputtering target for magnetic recording media Grant 10,971,181 - Tham , et al. April 6, 2 | 2021-04-06 |
Sputtering target and process for production thereof Grant 10,636,633 - Tham , et al. | 2020-04-28 |
Sputtering Target For Magnetic Recording Media App 20200105297 - THAM; Kim Kong ;   et al. | 2020-04-02 |
Magnetic recording medium and magnetic storage apparatus Grant 10,283,154 - Hinata , et al. | 2019-05-07 |
Sputtering Target App 20180355473 - THAM; Kim Kong ;   et al. | 2018-12-13 |
Magnetic Recording Medium And Magnetic Storage Apparatus App 20180358041 - HINATA; Shintaro ;   et al. | 2018-12-13 |
Sputtering Target And Process For Production Thereof App 20170194131 - THAM; Kim Kong ;   et al. | 2017-07-06 |
Magnetic Recording Medium, Method For Manufacturing Magnetic Recording Medium, And Magnetic Recording And Reproducing Device App 20140104997 - SHIBATA; Hisato ;   et al. | 2014-04-17 |
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