Higashiki; Tatsuhiko

Patent Applications and Registrations

Patent applications and USPTO patent grants for Higashiki; Tatsuhiko.The latest application filed is for "semiconductor memory device and method for manufacturing same".

Company Profile

0.22.32

Higashiki; Tatsuhiko - Fujisawa JP
Higashiki; Tatsuhiko - Kanagawa JP
Higashiki; Tatsuhiko - Fujisawa-Shi JP
Higashiki; Tatsuhiko - Tokyo JP
Higashiki, Tatsuhiko - Fujiswa-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Semiconductor memory device and method for manufacturing same Grant 9,922,991 - Kamigaki , et al. March 20, 2	2018-03-20
Pattern inspection apparatus and pattern inspection method Grant 9,894,271 - Yoshikawa , et al. February 13, 2	2018-02-13
Semiconductor Memory Device And Method For Manufacturing Same App 20170271363 - Kamigaki; Tetsuya ; et al.	2017-09-21
Pattern Inspection Apparatus And Pattern Inspection Method App 20160275365 - Yoshikawa; Ryoji ; et al.	2016-09-22
Lithography Original Checking Device, Lithography Original Checking Method, And Pattern Data Creating Method App 20140232032 - Yoshikawa; Ryoji ; et al.	2014-08-21
Template manufacturing method, semiconductor device manufacturing method and template Grant 8,609,014 - Azuma , et al. December 17, 2	2013-12-17
Liquid immersion optical tool, method for cleaning liquid immersion optical tool, liquid immersion exposure method and method for manufacturing semiconductor device Grant 8,174,669 - Higashiki , et al. May 8, 2	2012-05-08
Mask pattern correcting method Grant 8,122,385 - Fukuhara , et al. February 21, 2	2012-02-21
Template Manufacturing Method, Semiconductor Device Manufacturing Method And Template App 20120009799 - AZUMA; Tsukasa ; et al.	2012-01-12
Semiconductor Device Manufacturing Method To Form Resist Pattern, And Substrate Processing Apparatus App 20110229826 - KAWAMURA; Daisuke ; et al.	2011-09-22
Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program Grant 7,985,958 - Nakasugi , et al. July 26, 2	2011-07-26
Semiconductor device manufacturing method to form resist pattern Grant 7,968,272 - Kawamura , et al. June 28, 2	2011-06-28
Apparatus and method for inspecting sample surface Grant 7,952,071 - Noji , et al. May 31, 2	2011-05-31
Wafer Exposing Method, Euv Exposing Apparatus, And Eb Exposing Apparatus App 20090305165 - INANAMI; Ryoichi ; et al.	2009-12-10
Exposure processing system, exposure processing method and method for manufacturing a semiconductor device Grant 7,630,052 - Kono , et al. December 8, 2	2009-12-08
Liquid Immersion Optical Tool, Method for Cleaning Liquid Immersion Optical Tool, Liquid Immersion Exposure Method and Method for Manufacturing Semiconductor Device App 20090284718 - Higashiki; Tatsuhiko ; et al.	2009-11-19
Exposure Method, Photo Mask, And Reticle Stage App 20090148782 - Kono; Takuya ; et al.	2009-06-11
Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device Grant 7,546,178 - Kouno , et al. June 9, 2	2009-06-09
Optical Element And Optical Apparatus App 20090141378 - TAWARAYAMA; Kazuo ; et al.	2009-06-04
Apparatus And Method For Inspecting Sample Surface App 20090026368 - Noji; Nobuharu ; et al.	2009-01-29
Exposure apparatus, exposure method and optical proximity correction method App 20090004581 - Fukuhara; Kazuya ; et al.	2009-01-01
Mask Pattern Correcting Method App 20080301621 - FUKUHARA; Kazuya ; et al.	2008-12-04
Exposure Apparatus, Exposure Method And Lithography System App 20080204685 - KONO; Takuya ; et al.	2008-08-28
Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device App 20070288113 - Kouno; Takuya ; et al.	2007-12-13
Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device Grant 7,269,470 - Kouno , et al. September 11, 2	2007-09-11
Semiconductor device manufacturing method to form resist pattern, and substrate processing apparatus App 20070128554 - Kawamura; Daisuke ; et al.	2007-06-07
Immersion exposure apparatus and method of manufacturing semiconductor device App 20070096764 - Kono; Takuya ; et al.	2007-05-03
Liquid immersion optical tool, method for cleaning liquid immersion optical tool, liquid immersion exposure method and method for manufacturing semiconductor device App 20070039637 - Higashiki; Tatsuhiko ; et al.	2007-02-22
Photomask designing method, pattern predicting method and computer program product Grant 7,139,998 - Fukuhara , et al. November 21, 2	2006-11-21
Design system of alignment marks for semiconductor manufacture Grant 7,100,146 - Sato , et al. August 29, 2	2006-08-29
Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program App 20060151721 - Nakasugi; Tetsuro ; et al.	2006-07-13
Displacement correction apparatus, exposure system, exposure method and a computer program product Grant 7,046,334 - Kono , et al. May 16, 2	2006-05-16
Method for manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device Grant 7,018,932 - Ito , et al. March 28, 2	2006-03-28
Liquid immersion optical tool, method for cleaning liquid immersion optical tool, and method for manufacturing semiconductor device App 20060050351 - Higashiki; Tatsuhiko	2006-03-09
Exposure system and method for manufacturing semiconductor device App 20060001846 - Kono; Takuya ; et al.	2006-01-05
Exposure processing system, exposure processing method and method for manufacturing a semiconductor device App 20050170262 - Kono, Takuya ; et al.	2005-08-04
Exposure method and method of manufacturing semiconductor device Grant 6,872,508 - Komine , et al. March 29, 2	2005-03-29
Exposing method Grant 6,842,230 - Takakuwa , et al. January 11, 2	2005-01-11
Displacement correction apparatus, exposure system, exposure method and a computer program product App 20040227916 - Kono, Takuya ; et al.	2004-11-18
Exposure method and apparatus Grant 6,813,001 - Fujisawa , et al. November 2, 2	2004-11-02
Design system of alignment marks for semiconductor manufacture App 20040207856 - Sato, Takashi ; et al.	2004-10-21
Manufacturing system in electronic devices App 20040168632 - Ito, Shinichi ; et al.	2004-09-02
Photomask designing method, pattern predicting method and computer program product App 20040133872 - Fukuhara, Kazuya ; et al.	2004-07-08
Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device App 20040088071 - Kouno, Takuya ; et al.	2004-05-06
Manufacturing system in electronic devices Grant 6,730,447 - Ito , et al. May 4, 2	2004-05-04
Method for manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device App 20040033448 - Ito, Shinichi ; et al.	2004-02-19
Exposing method App 20030117599 - Takakuwa, Manabu ; et al.	2003-06-26
Exposure method and apparatus App 20030090640 - Fujisawa, Tadahito ; et al.	2003-05-15
Exposure method and method of manufacturing semiconductor device App 20030016341 - Komine, Nobuhiro ; et al.	2003-01-23
Manufacturing system in electronic devices App 20020136971 - Ito, Shinichi ; et al.	2002-09-26
Optical exposure apparatus of scanning exposure system and its exposing method App 20010028446 - Higashiki, Tatsuhiko	2001-10-11
Method of electrical measurement of misregistration of patterns Grant 6,288,556 - Sato , et al. September 11, 2	2001-09-11
Exposure tool and method capable of correcting high (N-TH) order light exposure errors depending upon an interfield coordinate Grant 6,008,880 - Higashiki , et al. December 28, 1	1999-12-28

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