Higashikawa; Iwao
Patent Applications and Registrations
Patent applications and USPTO patent grants for Higashikawa; Iwao.The latest application filed is for "method for manufacturing semiconductor device".
- Higashikawa; Iwao - Tokyo JP
| Patent | Date |
|---|---|
| Method For Manufacturing Semiconductor Device App 20100081091 - HASHIMOTO; Koji ; et al. | 2010-04-01 |
| Optical Element And Optical Apparatus App 20090141378 - TAWARAYAMA; Kazuo ; et al. | 2009-06-04 |
| Pattern forming method and pattern forming apparatus Grant 6,806,941 - Inoue , et al. October 19, 2 | 2004-10-19 |
| Pattern forming method and light exposure apparatus Grant 6,765,673 - Higashikawa July 20, 2 | 2004-07-20 |
| Heat treating method and heat treating apparatus Grant 6,680,462 - Sakurai , et al. January 20, 2 | 2004-01-20 |
| Method of producing exposure mask Grant 6,635,549 - Kyoh , et al. October 21, 2 | 2003-10-21 |
| Heat treating method and heat treating apparatus App 20030052119 - Sakurai, Hideaki ; et al. | 2003-03-20 |
| Heat treating method and heat treating apparatus App 20020063123 - Sakurai, Hideaki ; et al. | 2002-05-30 |
| Pattern forming method and pattern forming apparatus App 20020045132 - Inoue, Soichi ; et al. | 2002-04-18 |
| Method of producing exposure mask App 20020037625 - Kyoh, Suigen ; et al. | 2002-03-28 |
| Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master mask Grant 6,340,542 - Inoue , et al. January 22, 2 | 2002-01-22 |
| Exposure method utilizing partial exposure stitch area Grant 6,333,138 - Higashikawa , et al. December 25, 2 | 2001-12-25 |
| Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface App 20010027971 - Sakurai, Hideaki ; et al. | 2001-10-11 |
| Measurement system and measurement method Grant 5,851,842 - Katsumata , et al. December 22, 1 | 1998-12-22 |
| Alignment mark for use in making semiconductor devices Grant 5,847,468 - Nomura , et al. December 8, 1 | 1998-12-08 |
| Electron-beam lithography system and method for drawing nanometer-order pattern Grant 5,767,521 - Takeno , et al. June 16, 1 | 1998-06-16 |
| Exposure mask and method and apparatus for manufacturing the same Grant 5,629,115 - Kawano , et al. May 13, 1 | 1997-05-13 |
| Resist patterns and method of forming resist patterns Grant 5,374,502 - Tanaka , et al. December 20, 1 | 1994-12-20 |
| Resist patterns and method of forming resist patterns Grant 5,326,672 - Tanaka , et al. July 5, 1 | 1994-07-05 |
| Pattern forming method Grant 5,262,282 - Hieda , et al. November 16, 1 | 1993-11-16 |
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