Higashihara; Go

Patent Applications and Registrations

Patent applications and USPTO patent grants for Higashihara; Go.The latest application filed is for "material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method".

Company Profile

2.14.18

Higashihara; Go - Okayama JP
Higashihara; Go - Kurashiki N/A JP
Higashihara; Go - Kanagawa JP
Higashihara; Go - Kurashiki-shi JP
Higashihara; Go - Hiratsuka N/A JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method Grant 10,359,701 - Okada , et al. July 23, 2	2019-07-23
Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method Grant 10,338,471 - Okada , et al.	2019-07-02
Cyanate ester compound, curable resin composition containing said compound, and cured product of said composition Grant 10,160,824 - Katagiri , et al. Dec	2018-12-25
Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography And Pattern Forming Method App 20180101096 - OKADA; Kana ; et al.	2018-04-12
Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography And Pattern Forming Method App 20180101097 - OKADA; Kana ; et al.	2018-04-12
Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, Resist Pattern Forming Method, And Circuit Pattern Forming Method App 20180052392 - OKADA; Kana ; et al.	2018-02-22
Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography And Pattern Forming Method App 20170227849 - OKADA; Kana ; et al.	2017-08-10
Aromatic hydrocarbon formaldehyde resin, modified aromatic hydrocarbon formaldehyde resin and epoxy resin, and method for producing these Grant 9,725,551 - Higashihara , et al. August 8, 2	2017-08-08
Aromatic hydrocarbon formaldehyde resin, modified aromatic hydrocarbon formaldehyde resin and epoxy resin, and methods for producing these Grant 9,562,130 - Higashihara , et al. February 7, 2	2017-02-07
Aromatic Hydrocarbon Formaldehyde Resin, Modified Aromatic Hydrocarbon Formaldehyde Resin And Epoxy Resin, And Methods For Producing These App 20160130384 - HIGASHIHARA; Go ; et al.	2016-05-12
Aromatic Hydrocarbon Formaldehyde Resin, Modified Aromatic Hydrocarbon Formaldehyde Resin, And Epoxy Resin, And Method For Producing These App 20160130383 - HIGASHIHARA; Go ; et al.	2016-05-12
Cyanate Ester Compound, Curable Resin Composition Containing Said Compound, And Cured Product Of Said Composition App 20160115271 - KATAGIRI; Masayuki ; et al.	2016-04-28
Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method Grant 9,316,913 - Echigo , et al. April 19, 2	2016-04-19
Naphthalene formaldehyde resin, deacetalized naphthalene formaldehyde resin, and modified naphthalene formaldehyde resin Grant 9,200,105 - Uchiyama , et al. December 1, 2	2015-12-01
Phenolic resin and material for forming underlayer film for lithography Grant 9,110,373 - Uchiyama , et al. August 18, 2	2015-08-18
Material For Forming Underlayer Film Lithography, Underlayer Film For Lithography And Pattern Forming Method App 20150090691 - Echigo; Masatoshi ; et al.	2015-04-02
Acidic Treatment-subjected Monoalkylnaphthalene Formaldehyde Resin App 20150037736 - Uchiyama; Naoya ; et al.	2015-02-05
Naphthalene Formaldehyde Resin, Deacetalized Naphthalene Formaldehyde Resin, And Modified Naphthalene Formaldehyde Resin App 20150018499 - Uchiyama; Naoya ; et al.	2015-01-15
Resin Having Fluorene Structure And Material For Forming Underlayer Film For Lithography App 20140246400 - Higashihara; Go ; et al.	2014-09-04
Phenolic Resin And Material For Forming Underlayer Film For Lithography App 20140186776 - Uchiyama; Naoya ; et al.	2014-07-03
Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist pattern Grant 8,741,553 - Higashihara , et al. June 3, 2	2014-06-03
Composition for forming base film for lithography and method for forming multilayer resist pattern Grant 8,592,134 - Oguro , et al. November 26, 2	2013-11-26
Aromatic Hydrocarbon Resin, Underlayer Film Forming Composition For Lithography, And Method For Forming Multilayer Resist Pattern App 20130280655 - Higashihara; Go ; et al.	2013-10-24
Composition For Forming Base Film For Lithography And Method For Forming Multilayer Resist Pattern App 20100316950 - Oguro; Dai ; et al.	2010-12-16

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