Hidaka; Motohiko

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hidaka; Motohiko.The latest application filed is for "highly soluble tris- (2, 3-epoxypropyl)- isocyanurate and method for producing same".

Company Profile

4.9.12

Hidaka; Motohiko - Tokyo JP
Hidaka; Motohiko - Funabashi JP
HIDAKA; Motohiko - Funabashi-shi JP
Hidaka; Motohiko - Chiba JP
Hidaka; Motohiko - Tokyoi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Highly soluble modified epoxy resin composition Grant 10,899,872 - Endo , et al. January 26, 2	2021-01-26
Highly Soluble Tris- (2, 3-epoxypropyl)- Isocyanurate And Method For Producing Same App 20190256657 - HIDAKA; Motohiko ; et al.	2019-08-22
Highly Soluble Modified Epoxy Resin Composition App 20190062491 - ENDO; Yuki ; et al.	2019-02-28
Highly soluble modified epoxy resin composition Grant 10,174,153 - Endo , et al. J	2019-01-08
Highly Soluble Modified Epoxy Resin Composition App 20160340469 - ENDO; Yuki ; et al.	2016-11-24
Highly Soluble Tris- (2, 3-epoxypropyl)- Isocyanurate And Method For Producing Same App 20150353684 - HIDAKA; Motohiko ; et al.	2015-12-10
Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating Grant 9,134,610 - Takei , et al. September 15, 2	2015-09-15
Resist Underlayer Coating Forming Composition For Forming Photo-crosslinking Cured Resist Underlayer Coating App 20130189850 - TAKEI; Satoshi ; et al.	2013-07-25
Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating Grant 8,426,111 - Takei , et al. April 23, 2	2013-04-23
Photosensitive Composition Containing Organic-zirconia Composite Fine Particles App 20090246643 - Tomita; Yasuo ; et al.	2009-10-01
Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating App 20090130594 - Takei; Satoshi ; et al.	2009-05-21
Photosensitive Composition Containing Organic Fine Particles App 20080176146 - Tomita; Yasuo ; et al.	2008-07-24
Method for reducing an organic solvent remaining in .beta.-form tris- (2,3,-epoxypropyl)--isocyanurate crystals Grant 6,903,212 - Ikeda , et al. June 7, 2	2005-06-07
Optically active isocyanurate and optical resolver comprising derivative of the same Grant 6,641,784 - Okamoto , et al. November 4, 2	2003-11-04
Method for reducing organic solvents remaining in tris-(2,3-epoxypropyl)-isocyanurate crystals Grant 6,605,718 - Ikeda , et al. August 12, 2	2003-08-12
Optically active epoxy compound Grant 6,605,717 - Ikeda , et al. August 12, 2	2003-08-12
Isocyanurate compound and method for producing the same App 20020161223 - Takeyama, Toshiaki ; et al.	2002-10-31
Optically active epoxy compound App 20020111485 - Ikeda, Hisao ; et al.	2002-08-15
Method for reducing an organic solvent remaining in beta-form tris- (2,3,-epoxypropyl) - isocyanurate crystals App 20020045752 - Ikeda, Hisao ; et al.	2002-04-18
Method for reducing organic solvents remaining in tris-(2,3-epoxypropyl)-i- socyanurate crystals App 20010018517 - Ikeda, Hisao ; et al.	2001-08-30

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