| Patent | Date |
|---|
Systems and methods for implementing and manufacturing reticles for use in photolithography tools
Grant 8,555,208 - Hickman October 8, 2 | 2013-10-08 |
Semiconductor wafer alignment markers, and associated systems and methods
Grant 8,400,634 - Zhou , et al. March 19, 2 | 2013-03-19 |
Systems And Methods For Implementing And Manufacturing Reticles For Use In Photolithography Tools
App 20120227013 - Hickman; Craig A. | 2012-09-06 |
Systems and methods for implementing and manufacturing reticles for use in photolithography tools
Grant 8,029,947 - Hickman October 4, 2 | 2011-10-04 |
Semiconductor Wafer Alignment Markers, And Associated Systems And Methods
App 20110194112 - Zhou; Jianming ; et al. | 2011-08-11 |
Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines
Grant 7,370,659 - Hickman , et al. May 13, 2 | 2008-05-13 |
Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines
Grant 7,361,234 - Hickman , et al. April 22, 2 | 2008-04-22 |
Method and apparatus for irradiating a microlithographic substrate
Grant 7,298,453 - Boettiger , et al. November 20, 2 | 2007-11-20 |
Systems and methods for implementing and manufacturing reticles for use in photolithography tools
App 20070048627 - Hickman; Craig A. | 2007-03-01 |
Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines
App 20060201540 - Hickman; Craig A. ; et al. | 2006-09-14 |
Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines
App 20060201535 - Hickman; Craig A. ; et al. | 2006-09-14 |
Method and apparatus for irradiating a microlithographic substrate
App 20060158631 - Boettiger; Ulrich C. ; et al. | 2006-07-20 |
Method and apparatus for irradiating a microlithographic substrate
Grant 7,038,762 - Boettiger , et al. May 2, 2 | 2006-05-02 |
Device and method of correcting exposure defects in photolithography
Grant 6,967,707 - Hickman November 22, 2 | 2005-11-22 |
Wafer alignment system
Grant 6,909,984 - Laursen , et al. June 21, 2 | 2005-06-21 |
Device and method of correcting exposure defects in photolithography
App 20050068513 - Hickman, Craig A. | 2005-03-31 |
Method and apparatus for irradiating a microlithographic substrate
App 20050041228 - Boettiger, Ulrich C. ; et al. | 2005-02-24 |
Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines
App 20050028314 - Hickman, Craig A. ; et al. | 2005-02-10 |
System for processing semiconductor products
Grant 6,844,933 - Hickman January 18, 2 | 2005-01-18 |
Device and method of correcting exposure defects in photolithography
Grant 6,812,999 - Hickman November 2, 2 | 2004-11-02 |
Method and apparatus for irradiating a microlithographic substrate
Grant 6,784,975 - Boettiger , et al. August 31, 2 | 2004-08-31 |
wafer alignment system
App 20040158423 - Laursen, James W. ; et al. | 2004-08-12 |
Device and method of correcting exposure defects in photolithography
Grant 6,727,975 - Hickman April 27, 2 | 2004-04-27 |
Wafer alignment system
Grant 6,708,131 - Laursen , et al. March 16, 2 | 2004-03-16 |
Device and method of correcting exposure defects in photolithography
App 20030234915 - Hickman, Craig A. | 2003-12-25 |
System for processing semiconductor products
App 20030133114 - Hickman, Craig A. | 2003-07-17 |
Method and apparatus for irradiating a microlithographic substrate
App 20030044693 - Boettiger, Ulrich C. ; et al. | 2003-03-06 |
System for processing semiconductor products
Grant 6,519,036 - Hickman February 11, 2 | 2003-02-11 |
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