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Patent applications and USPTO patent grants for Heuver; Jeroen Aaldert.The latest application filed is for "method for controlling stress in a substrate during laser deposition".
Patent | Date |
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Method for Controlling Stress in a Substrate During Laser Deposition App 20210370435 - Vergeer; Kurt Hein ;   et al. | 2021-12-02 |
Method for pulsed laser deposition Grant 11,177,117 - Janssens , et al. November 16, 2 | 2021-11-16 |
Filter for a Plasma Plume App 20210252441 - Dekkers; Jan Matthijn ;   et al. | 2021-08-19 |
Device for Pulsed Laser Deposition and a Substrate with a Substrate Surface for Reduction of Particles on the Substrate App 20200002805 - Janssens; Jan Arnaud ;   et al. | 2020-01-02 |
Method for Pulsed Laser Deposition App 20190279847 - Janssens; Jan Arnaud ;   et al. | 2019-09-12 |
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