Her; Yie-Shein

Patent Applications and Registrations

Patent applications and USPTO patent grants for Her; Yie-Shein.The latest application filed is for "low k dielectric compositions for high frequency applications".

Company Profile

2.16.12

Her; Yie-Shein - Canandaiuga NY
Her; Yie Shein - Canandaigua NY
Her; Yie-Shein - Postdam NY
Her; Yie-Shein - Westford MA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Low K dielectric compositions for high frequency applications Grant 10,562,809 - Gleason , et al. Feb	2020-02-18
Slurry composition and method of use Grant 10,544,332 - Megherhi , et al. Ja	2020-01-28
Low K Dielectric Compositions For High Frequency Applications App 20190135683 - Gleason; Cody J. ; et al.	2019-05-09
Mid-K LTCC compositions and devices Grant 9,892,853 - Symes, Jr. , et al. February 13, 2	2018-02-13
Slurry Composition And Method Of Use App 20170204293 - MEGHERHI; Mohammed H. ; et al.	2017-07-20
Mid-K LTCC Compositions And Devices App 20170110246 - Symes, JR.; Walter J. ; et al.	2017-04-20
Substantially spherical composite ceria/titania particles Grant 7,687,401 - Feng , et al. March 30, 2	2010-03-30
Hydrothermal synthesis of cerium-titanium oxide for use in CMP Grant 7,666,239 - Feng , et al. February 23, 2	2010-02-23
Substantially Spherical Composite Ceria/titania Particles App 20070254484 - Feng; Xiangdong ; et al.	2007-11-01
Chemical-mechanical polishing slurry and method Grant 7,101,800 - Her , et al. September 5, 2	2006-09-05
Slurry for chemical mechanical polishing silicon dioxide Grant 7,091,164 - Srinivasan , et al. August 15, 2	2006-08-15
Hydrothermal synthesis of cerium-titanium oxide for use in CMP App 20060112649 - Feng; Xiangdong ; et al.	2006-06-01
Methods Of Controlling The Properties Of Abrasive Particles For Use In Chemical-mechanical Polishing Slurries App 20060032836 - Feng; Xiangdong ; et al.	2006-02-16
Synthesis of chemically reactive ceria composite nanoparticles and CMP applications thereof App 20050003744 - Feng, Xiangdong ; et al.	2005-01-06
Process for producing abrasive particles and abrasive particles produced by the process Grant 6,818,030 - Feng , et al. November 16, 2	2004-11-16
Chemical-mechanical polishing slurry and method App 20040157454 - Her, Yie-Shein ; et al.	2004-08-12
Slurry for chemical mechanical polishing silicon dioxide App 20040051077 - Srinivasan, Ramanathan ; et al.	2004-03-18
Chemical-mechanical polishing slurry and method Grant 6,702,954 - Her , et al. March 9, 2	2004-03-09
Slurry for chemical mechanical polishing silicon dioxide Grant 6,627,107 - Srinivasan , et al. September 30, 2	2003-09-30
High selectivity CMP slurry Grant 6,616,514 - Edelbach , et al. September 9, 2	2003-09-09
Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process Grant 6,596,042 - Feng , et al. July 22, 2	2003-07-22
Process for producing abrasive particles and abrasive particles produced by the process App 20030093957 - Feng, Xiangdong ; et al.	2003-05-22
Slurry for chemical mechanical polishing silicon dioxide Grant 6,544,892 - Srinivasan , et al. April 8, 2	2003-04-08
Slurry for chemical mechanical polishing silicon dioxide App 20030006397 - Srinivasan, Ramanathan ; et al.	2003-01-09
Slurry for chemical mechanical polishing silicon dioxide App 20020195421 - Srinivasan, Ramanathan ; et al.	2002-12-26
Slurry for chemical mechanical polishing silicon dioxide Grant 6,491,843 - Srinivasan , et al. December 10, 2	2002-12-10
Process for the synthesis of crystalline powders of perovskite compounds Grant 5,900,223 - Matijevic , et al. May 4, 1	1999-05-04
Dye incorporated pigments and products made from same Grant 5,871,872 - Matijevic , et al. February 16, 1	1999-02-16

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