loadpatents
name:-0.021292924880981
name:-0.01512598991394
name:-0.0018620491027832
Heo; Yoon Hee Patent Filings

Heo; Yoon Hee

Patent Applications and Registrations

Patent applications and USPTO patent grants for Heo; Yoon Hee.The latest application filed is for "photoactive compound and photosensitive resin composition comprising the same".

Company Profile
1.20.20
  • Heo; Yoon Hee - Daejeon KR
  • Heo; Yoon-Hee - Seoul KR
  • Heo; Yoon Hee - Yuseong-gu KR
  • Heo; Yoon-Hee - Daejeon Metropolitan City KR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Alkali-soluble resin and negative-type photosensitive resin composition comprising the same
Grant 8,951,713 - Kim , et al. February 10, 2
2015-02-10
Photoactive compound and photosensitive resin composition comprising the same
Grant 8,871,430 - Cho , et al. October 28, 2
2014-10-28
Polymer and photosensitive resin composition comprising the same
Grant 8,829,068 - Kim , et al. September 9, 2
2014-09-09
Colored dispersion, photoresist composition and black matrix
Grant 8,822,132 - Choi , et al. September 2, 2
2014-09-02
Photoactive Compound And Photosensitive Resin Composition Comprising The Same
App 20140220491 - Cho; Changho ;   et al.
2014-08-07
Fluorene-based resin polymer and photo-sensitive resin composition comprising the same
Grant 8,791,169 - Heo , et al. July 29, 2
2014-07-29
Silane-based compounds and photosensitive resin composition comprising the same
Grant 8,691,492 - Cho , et al. April 8, 2
2014-04-08
Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same
Grant 8,535,874 - Kim , et al. September 17, 2
2013-09-17
Alkali-soluble Resin And Negative-type Photosensitive Resin Composition Comprising The Same
App 20130130176 - Kim; Han Soo ;   et al.
2013-05-23
Silane-based Compounds And Photosensitive Resin Composition Comprising The Same
App 20130034814 - CHO; Changho ;   et al.
2013-02-07
Polymer And Photosensitive Resin Composition Comprising The Same
App 20130030077 - Kim; Sunhwa ;   et al.
2013-01-31
Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin
Grant 8,357,483 - Kim , et al. January 22, 2
2013-01-22
Fluorene-based resin polymer and method for preparing thereof
Grant 8,338,559 - Heo , et al. December 25, 2
2012-12-25
Composition for manufacturing indurative resin, indurative resin manufactured by the composition and ink composition comprising the resin
Grant 8,323,533 - Lim , et al. December 4, 2
2012-12-04
Alkali-developable resins, method for preparing the same and photosensitive composition comprising the alkali-developable resins
Grant 8,304,169 - Lim , et al. November 6, 2
2012-11-06
Photosensitive resin, method for preparing the resin, photosensitive resin composition and cured product of the resin composition
Grant 8,252,879 - Kim , et al. August 28, 2
2012-08-28
Fluorene-based Resin Polymer And Photo-sensitive Resin Composition Comprising The Same
App 20120196949 - HEO; Yoon Hee ;   et al.
2012-08-02
Multifunction urethane monomer, method of manufacturing the monomer and photosensitive resin composition including the monomer
Grant 8,153,751 - Heo , et al. April 10, 2
2012-04-10
Alkali Soluble Resin Polymer And Negative-type Photosensitive Resin Composition Including The Same
App 20120004341 - KIM; Han Soo ;   et al.
2012-01-05
Multifunction Urethane Monomer, Method Of Manufacturing The Monomer And Photosensitive Resin Composition Including The Monomer
App 20100331439 - Heo; Yoon Hee ;   et al.
2010-12-30
Alkali-developable Resins, Method For Preparing The Same And Photosensitive Composition Comprising The Alkali-developable Resins
App 20100323295 - Lim; Min-Young ;   et al.
2010-12-23
Fluorene-based Polymer Containing Urethane Groups, Preparation Method Thereof And Negative-type Photosensitive Resin Composition Comprising The Same
App 20100201925 - Kim; Han Soo ;   et al.
2010-08-12
Alkali-soluble Resin And Negative-type Photosensitive Resin Composition Comprising The Same
App 20100196824 - Kim; Han Soo ;   et al.
2010-08-05
Photosensitive Resin, Method For Preparing The Resin, Photosensitive Resin Composition And Cured Product Of The Resin Composition
App 20100168266 - Lim; Min Young ;   et al.
2010-07-01
Colored Dispersion, Photoresist Composition And Black Matrix
App 20100104981 - Choi; Dong Chang ;   et al.
2010-04-29
Photo-sensitive Resin Composition For Black Matrix, Black Matrix Produced By The Composition And Liquid Crystal Display Including The Black Matrix
App 20100085518 - Choi; Kyung-Soo ;   et al.
2010-04-08
Photosensitive Resin Composition Comprising A Polymer Prepared By Using Macromonomer As Alkali Soluble Resin
App 20100081089 - Kim; Han-Soo ;   et al.
2010-04-01
Composition For Manufacturing Indurative Resin, Indurative Resin Manufactured By The Composition And Ink Composition Comprising The Resin
App 20100051883 - Lim; Min-Young ;   et al.
2010-03-04
Fluorene-based Resin Polymer And Method For Preparing Thereof
App 20100029892 - Heo; Yoon-Hee ;   et al.
2010-02-04
Method for patterning coatings
App 20070178237 - Shin; Dong Myung ;   et al.
2007-08-02

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