Henry; Richard O.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Henry; Richard O..The latest application filed is for "partial solution replacement in recyclable persulfuric acid cleaning systems".

Company Profile

0.10.10

Henry; Richard O. - Newburgh NY
Henry; Richard O. - Hopewell Junction NY
Henry; Richard O. - Wappingers Falls NY
Henry; Richard O. - Poughkeepsie NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Partial solution replacement in recyclable persulfuric acid cleaning systems Grant 9,165,801 - Henry , et al. October 20, 2	2015-10-20
Partial solution replacement in recyclable persulfuric acid cleaning systems Grant 8,992,691 - Henry , et al. March 31, 2	2015-03-31
Partial Solution Replacement In Recyclable Persulfuric Acid Cleaning Systems App 20140060596 - Henry; Richard O. ; et al.	2014-03-06
Cleaning exhaust screens in a manufacturing process Grant 8,337,627 - Fitzsimmons , et al. December 25, 2	2012-12-25
Partial Solution Replacement In Recyclable Persulfuric Acid Cleaning Systems App 20120255577 - Henry; Richard O. ; et al.	2012-10-11
Bottle-shaped trench capacitor with enhanced capacitance Grant 8,021,945 - Li , et al. September 20, 2	2011-09-20
Semiconductor fabrication process including an SiGe rework method Grant 7,955,936 - Tan , et al. June 7, 2	2011-06-07
Cleaning Exhaust Screens In A Manufacturing Process App 20110079255 - Fitzsimmons; John A. ; et al.	2011-04-07
Method of forming field effect transistors using diluted hydrofluoric acid to remove sacrificial nitride spacers Grant 7,902,082 - Park , et al. March 8, 2	2011-03-08
Bottle-shaped Trench Capacitor With Enhanced Capacitance App 20100258904 - Li; Xi ; et al.	2010-10-14
Semiconductor Fabrication Process Including An SiGe Rework Method App 20100009502 - Tan; Yong Siang ; et al.	2010-01-14
Method for etching single-crystal semiconductor selective to amorphous/polycrystalline semiconductor and structure formed by same Grant 7,563,670 - Cheng , et al. July 21, 2	2009-07-21
Method of Forming Field Effect Transistors Using Diluted Hydrofluoric Acid to Remove Sacrificial Nitride Spacers App 20090081840 - Park; Sang-jine ; et al.	2009-03-26
Manufacturable CoWP metal cap process for copper interconnects Grant 7,407,605 - Restaino , et al. August 5, 2	2008-08-05
Method For Etching Single-crystal Semiconductor Selective To Amorphous/polycrystalline Semiconductor And Structure Formed By Same App 20080111175 - Cheng; Kangguo ; et al.	2008-05-15
MANUFACTURABLE CoWP METAL CAP PROCESS FOR COPPER INTERCONNECTS App 20070215842 - Restaino; Darryl D. ; et al.	2007-09-20
Manufacturable CoWP metal cap process for copper interconnects Grant 7,253,106 - Restaino , et al. August 7, 2	2007-08-07
MANUFACTURABLE CoWP METAL CAP PROCESS FOR COPPER INTERCONNECTS App 20060134911 - Restaino; Darryl D. ; et al.	2006-06-22
Method of forming planar Cu interconnects without chemical mechanical polishing App 20040094511 - Seo, Soon-Cheon ; et al.	2004-05-20

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