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Additively manufactured gas distribution manifold Grant 10,794,519 - Burkhart , et al. October 6, 2 | 2020-10-06 |
Additively Manufactured Gas Distribution Manifold App 20190211955 - Burkhart; Christopher William ;   et al. | 2019-07-11 |
Additively manufactured gas distribution manifold Grant 10,215,317 - Burkhart , et al. Feb | 2019-02-26 |
Social network service for semiconductor manufacturing equipment and users Grant 9,871,759 - Huang , et al. January 16, 2 | 2018-01-16 |
Additively Manufactured Gas Distribution Manifold App 20170203511 - Burkhart; Christopher William ;   et al. | 2017-07-20 |
Social Network Service for Semiconductor Manufacturing Equipment and Users App 20170078238 - Huang; Chung Ho ;   et al. | 2017-03-16 |
Isotropic atomic layer etch for silicon and germanium oxides Grant 9,431,268 - Lill , et al. August 30, 2 | 2016-08-30 |
Isotropic Atomic Layer Etch For Silicon And Germanium Oxides App 20160196984 - Lill; Thorsten ;   et al. | 2016-07-07 |
Substrate Processing System with Multiple Processing Devices Deployed in Shared Ambient Environment and Associated Methods App 20150079795 - Hemker; David J. ;   et al. | 2015-03-19 |
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Materials and gas chemistries for processing systems App 20060011583 - Bailey; Andrew D. III ;   et al. | 2006-01-19 |
Apparatus methods for controlling wafer temperature in chemical mechanical polishing Grant 6,984,162 - Bright , et al. January 10, 2 | 2006-01-10 |
Apparatus and methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control Grant 6,937,915 - Kistler , et al. August 30, 2 | 2005-08-30 |
Methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control Grant 6,925,348 - Kistler , et al. August 2, 2 | 2005-08-02 |
Methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control App 20050054268 - Kistler, Rodney ;   et al. | 2005-03-10 |
Apparatus methods for controlling wafer temperature in chemical mechanical polishing App 20040242124 - Bright, Nicolas ;   et al. | 2004-12-02 |
Apparatus methods for controlling wafer temperature in chemical mechanical polishing App 20040108065 - Bright, Nicolas ;   et al. | 2004-06-10 |
Apparatus and methods for controlling wafer temperature in chemical mechanical polishing Grant 6,736,720 - Bright , et al. May 18, 2 | 2004-05-18 |
Materials and gas chemistries for processing systems App 20040011467 - Hemker, David J. ;   et al. | 2004-01-22 |
Plasma Processing System With Dynamic Gas Distribution Control App 20030155079 - BAILEY, ANDREW D. III ;   et al. | 2003-08-21 |
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Method and apparatus for varying a magnetic field to control a volume of a plasma App 20030010454 - Bailey, Andrew D. III ;   et al. | 2003-01-16 |
Low pressure anisotropic etch process for tantalum silicide or titanium silicide layer formed over polysilicon layer deposited on silicon oxide layer on semiconductor wafer Grant 5,160,407 - Latchford , et al. November 3, 1 | 1992-11-03 |