Hembacher; Stefan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hembacher; Stefan.The latest application filed is for "compensation of creep effects in an imaging device".

Company Profile

13.32.34

Hembacher; Stefan - Bobingen DE
Hembacher; Stefan - Bobinger DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Projection exposure apparatus for semiconductor lithography Grant 11,281,114 - Kugler , et al. March 22, 2	2022-03-22
Compensation Of Creep Effects In An Imaging Device App 20210405543 - Nefzi; Marwene ; et al.	2021-12-30
Method for positioning a component of an optical system Grant 11,169,359 - Marsollek , et al. November 9, 2	2021-11-09
Method for producing a mirror as an optical component for an optical system of a projection exposure apparatus for projection lithography Grant 11,092,897 - Hembacher August 17, 2	2021-08-17
Optical element for the beam guidance of imaging light in projection lithography Grant 10,989,897 - Hembacher , et al. April 27, 2	2021-04-27
Projection Exposure Apparatus For Semiconductor Lithography App 20210080841 - Kugler; Jens ; et al.	2021-03-18
Optical imaging arrangement with actively adjustable metrology support units Grant 10,890,850 - Hembacher , et al. January 12, 2	2021-01-12
Optical Elment For The Beam Guidance Of Imaging Light In Projection Lithography App 20200333557 - Hembacher; Stefan ; et al.	2020-10-22
Method For Producing A Mirror As An Optical Component For An Optical System Of A Projection Exposure Apparatus For Projection Li App 20200206855 - Hembacher; Stefan	2020-07-02
EUV exposure apparatus with reflective elements having reduced influence of temperature variation Grant 10,684,551 - Baer , et al.	2020-06-16
Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatus Grant 10,599,051 - Hembacher , et al.	2020-03-24
Euv Exposure Apparatus With Reflective Elements Having Reduced Influence Of Temperature Variation App 20190310555 - Baer; Norman ; et al.	2019-10-10
Method For Positioning A Component Of An Optical System App 20190302402 - Marsollek; Pascal ; et al.	2019-10-03
Optical imaging arrangement with a piezoelectric device Grant 10,416,570 - Kugler , et al. Sept	2019-09-17
Projection Exposure Apparatus, And Method For Reducing Deformations, Resulting From Dynamic Accelerations, Of Components Of The App 20190219926 - Hembacher; Stefan ; et al.	2019-07-18
EUV exposure apparatus with reflective elements having reduced influence of temperature variation Grant 10,317,802 - Baer , et al.	2019-06-11
Optical Imaging Arrangement With A Piezoelectric Device App 20190094705 - Kugler; Jens ; et al.	2019-03-28
Euv Exposure Apparatus With Reflective Elements Having Reduced Influence Of Temperature Variation App 20180299784 - Baer; Norman ; et al.	2018-10-18
Optical Imaging Arrangement With Actively Adjustable Metrology Support Units App 20180275527 - Hembacher; Stefan ; et al.	2018-09-27
EUV exposure apparatus with reflective elements having reduced influence of temperature variation Grant 10,031,423 - Baer , et al. July 24, 2	2018-07-24
Optical Imaging Device With Thermal Attenuation App 20180181007 - Gellrich; Bernhard ; et al.	2018-06-28
EUV imaging apparatus Grant 9,904,175 - Kugler , et al. February 27, 2	2018-02-27
Optical imaging device and method for reducing dynamic fluctuations in pressure difference Grant 9,817,322 - Hembacher , et al. November 14, 2	2017-11-14
Optical imaging device with thermal attenuation Grant 9,810,996 - Gellrich , et al. November 7, 2	2017-11-07
Euv Exposure Apparatus With Reflective Elements Having Reduced Influence Of Temperature Variation App 20170315449 - Baer; Norman ; et al.	2017-11-02
Actuators and microlithography projection exposure systems and methods using the same Grant 9,766,550 - Weber , et al. September 19, 2	2017-09-19
EUV exposure apparatus with reflective elements having reduced influence of temperature variation Grant 9,746,778 - Baer , et al. August 29, 2	2017-08-29
Position manipulator for an optical component Grant 9,696,518 - Hembacher July 4, 2	2017-07-04
Euv Exposure Apparatus With Reflective Elements Having Reduced Influence Of Temperature Variation App 20160195818 - Baer; Norman ; et al.	2016-07-07
Optical Imaging Device App 20160147159 - Hembacher; Stefan ; et al.	2016-05-26
EUV exposure apparatus with reflective elements having reduced influence of temperature variation Grant 9,316,929 - Baer , et al. April 19, 2	2016-04-19
Euv Imaging Apparatus App 20160077441 - Kugler; Jens ; et al.	2016-03-17
Optical arrangement in a microlithographic projection exposure apparatus Grant 9,250,417 - Schaffer , et al. February 2, 2	2016-02-02
Actuators And Microlithography Projection Exposure Systems And Methods Using The Same App 20150370176 - Weber; Ulrich ; et al.	2015-12-24
Optical module with a measuring device Grant 9,175,948 - Schoeppach , et al. November 3, 2	2015-11-03
Cleaning module, EUV lithography device and method for the cleaning thereof Grant 9,046,794 - Hembacher , et al. June 2, 2	2015-06-02
Optical Imaging Device With Thermal Attenuation App 20150109591 - Gellrich; Bernhard ; et al.	2015-04-23
Optical imaging device with thermal attenuation Grant 8,902,401 - Gellrich , et al. December 2, 2	2014-12-02
Optical Module With A Measuring Device App 20140125995 - Schoeppach; Armin ; et al.	2014-05-08
Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations Grant 8,659,745 - Limbach , et al. February 25, 2	2014-02-25
Optical System With An Exchangeable, Manipulable Correction Arrangement For Reducing Image Aberrations App 20130278911 - Limbach; Guido ; et al.	2013-10-24
Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations Grant 8,542,346 - Limbach , et al. September 24, 2	2013-09-24
Position Manipulator For An Optical Component App 20130242282 - Hembacher; Stefan	2013-09-19
EUV Exposure Apparatus App 20130141707 - Baer; Norman ; et al.	2013-06-06
Optical Imaging Device With Thermal Attenuation App 20130114057 - Gellrich; Bernhard ; et al.	2013-05-09
Optical imaging device with thermal attenuation Grant 8,363,206 - Gellrich , et al. January 29, 2	2013-01-29
Optical Arrangement In A Microlithographic Projection Exposure Apparatus App 20120300183 - Schaffer; Dirk ; et al.	2012-11-29
Actuators And Microlithography Projection Exposure Systems And Methods Using The Same App 20120147344 - Weber; Ulrich ; et al.	2012-06-14
Optical apparatus and method for modifying the imaging behavior of such apparatus Grant 8,169,595 - Schriever , et al. May 1, 2	2012-05-01
Optical Imaging Device And Method For Reducing Dynamic Fluctuations In Pressure Difference App 20120026479 - Hembacher; Stefan ; et al.	2012-02-02
Optical imaging device and method for reducing dynamic fluctuations in pressure difference Grant 8,027,023 - Hembacher , et al. September 27, 2	2011-09-27
Actuators And Microlithography Projection Exposure Systems And Methods Using The Same App 20110128521 - Weber; Ulrich ; et al.	2011-06-02
Cleaning Module, Euv Lithography Device And Method For The Cleaning Thereof App 20110043774 - HEMBACHER; Stefan ; et al.	2011-02-24
Holding device for optical element Grant 7,869,147 - Schwertner , et al. January 11, 2	2011-01-11
Optical System With An Exchangeable, Manipulable Correction Arrangement For Reducing Image Aberrations App 20090244509 - Limbach; Guido ; et al.	2009-10-01
Optical Apparatus And Method For Modifying The Imaging Behavior Of Such Apparatus App 20090174876 - Schriever; Martin ; et al.	2009-07-09
Optical Imaging Device With Thermal Attenuation App 20090135385 - Gellrich; Bernhard ; et al.	2009-05-28
Optical imaging device App 20080186467 - Hembacher; Stefan ; et al.	2008-08-07
Optical imaging device App 20080013063 - Hembacher; Stefan ; et al.	2008-01-17
Holding device for optical element App 20070285645 - Schwertner; Tilman ; et al.	2007-12-13

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