Heinz; Tony F.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Heinz; Tony F..The latest application filed is for "real time measurement of etch rate during a chemical etching process".

Company Profile

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Heinz; Tony F. - Chappaqua NY
Heinz; Tony F. - Chappaque NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Real time measurement of etch rate during a chemical etching process Grant 5,582,746 - Barbee , et al. December 10, 1	1996-12-10
In-situ monitoring of the change in thickness of films Grant 5,559,428 - Li , et al. September 24, 1	1996-09-24
Contactless real-time in-situ monitoring of a chemical etching Grant 5,516,399 - Balconi-Lamica , et al. May 14, 1	1996-05-14
Minimizing overetch during a chemical etching process Grant 5,501,766 - Barbee , et al. March 26, 1	1996-03-26
Real time measurement of etch rate during a chemical etching process Grant 5,500,073 - Barbee , et al. March 19, 1	1996-03-19
Method and apparatus for real-time, in-situ endpoint detection and closed loop etch process control Grant 5,392,124 - Barbee , et al. February 21, 1	1995-02-21
In situ, non-destructive CVD surface monitor Grant 5,386,121 - Barbee , et al. January 31, 1	1995-01-31
Contactless real-time in-situ monitoring of a chemical etching process Grant 5,338,390 - Barbee , et al. August 16, 1	1994-08-16
Detection of interfaces with atomic resolution during material processing by optical second harmonic generation Grant 5,294,289 - Heinz , et al. March 15, 1	1994-03-15

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