Heintze; Johannes

Patent Applications and Registrations

Patent applications and USPTO patent grants for Heintze; Johannes.The latest application filed is for "lithographic apparatus, source, source controller and control method".

Company Profile

0.4.4

Heintze; Johannes - Eindhoven NL

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Lithographic apparatus, source, source controller and control method Grant 7,868,999 - Heintze , et al. January 11, 2	2011-01-11
Lithographic apparatus, source, source controller and control method App 20080036991 - Heintze; Johannes ; et al.	2008-02-14
Lithographic apparatus, illumination system, illumination controller and control method Grant 7,297,911 - Kruijswijk , et al. November 20, 2	2007-11-20
Lithographic apparatus, illumination system, illumination controller and control method App 20070018071 - Kruijswijk; Stefan Geerte ; et al.	2007-01-25
Lithographic apparatus, device manufacturing method, performance measuring method, calibration method and computer program Grant 7,057,705 - Heintze June 6, 2	2006-06-06
Modulated lithographic beam to reduce sensitivity to fluctuating scanning speed Grant 7,016,013 - Van Der Biggelaar , et al. March 21, 2	2006-03-21
Modulated lithographic beam to reduce sensitivity to fluctuating scanning speed App 20050151946 - Van Der Biggelaar, Petrus Marinus Christianus Maria ; et al.	2005-07-14
Lithographic apparatus, device manufacturing method, performance measuring method, calibration method and computer program App 20040021840 - Heintze, Johannes	2004-02-05

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