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name:-0.013198137283325
name:-0.0024969577789307
name:-0.0023348331451416
Heindel; Josef Patent Filings

Heindel; Josef

Patent Applications and Registrations

Patent applications and USPTO patent grants for Heindel; Josef.The latest application filed is for "process for preparing a tubular article".

Company Profile
1.3.9
  • Heindel; Josef - Hainburg DE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Process For Preparing A Tubular Article
App 20210071293 - Simons; Christoph ;   et al.
2021-03-11
Process For Preparing A Tubular Article
App 20180105925 - Simons; Christoph ;   et al.
2018-04-19
Tube-shaped sputtering target
Grant 9,334,564 - Simons , et al. May 10, 2
2016-05-10
Tube-shaped Sputtering Target
App 20120213917 - SIMONS; Christoph ;   et al.
2012-08-23
Magnetic shunts in tubular targets
Grant 8,137,518 - Pavel , et al. March 20, 2
2012-03-20
Magnetic Shunts In Tubular Targets
App 20090139861 - PAVEL; Hans-Joachim ;   et al.
2009-06-04
Processes for producing a sputtering target from a silicon-based alloy, a sputtering target
App 20060207740 - Weigert; Martin ;   et al.
2006-09-21
Processes for producing a sputtering target from a silicon-based alloy, a sputtering target
App 20050092455 - Weigert, Martin ;   et al.
2005-05-05
Processes for producing a sputtering target from a silicon-based alloy, a sputtering target
App 20040094283 - Weigert, Martin ;   et al.
2004-05-20
Metal or metal alloy based sputter target and method for the production thereof
App 20030168333 - Schlott, Martin ;   et al.
2003-09-11
Sputter target made of a silicon alloy and process for producing a sputter target
App 20030103857 - Heindel, Josef ;   et al.
2003-06-05

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