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Patent applications and USPTO patent grants for HE; Nailong.The latest application filed is for "lateral double-diffused metal oxide semiconductor device and manufacturing method thereof, and electronic apparatus".
Patent | Date |
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Lateral Double-diffused Metal Oxide Semiconductor Device And Manufacturing Method Thereof, And Electronic Apparatus App 20220302305 - HE; Nailong | 2022-09-22 |
Method of manufacturing an LDMOS device having a well region below a groove Grant 11,309,406 - He , et al. April 19, 2 | 2022-04-19 |
Lateral double-diffused metal oxide semiconductor component and manufacturing method therefor Grant 11,227,948 - He , et al. January 18, 2 | 2022-01-18 |
Ldmos Device And Manufacturing Method Thereof App 20210175347 - HE; Nailong ;   et al. | 2021-06-10 |
Lateral Double-diffused Metal Oxide Semiconductor Component And Manufacturing Method Therefor App 20210036150 - HE; Nailong ;   et al. | 2021-02-04 |
Integrated circuit structure with refractory metal alignment marker and methods of forming same Grant 9,806,032 - Lin , et al. October 31, 2 | 2017-10-31 |
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