Haywood; Edward L.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Haywood; Edward L..The latest application filed is for "modulating film properties by optimizing plasma coupling materials".
- Haywood; Edward L. - Santa Clara CA
- Haywood; Edward L - San Jose CA
- Haywood; Edward L. - San Jose CA
| Patent | Date |
|---|---|
| Modulating film properties by optimizing plasma coupling materials Grant 11,270,905 - Venkatasubramanian , et al. March 8, 2 | 2022-03-08 |
| Modulating Film Properties By Optimizing Plasma Coupling Materials App 20210005500 - VENKATASUBRAMANIAN; Eswaranand ; et al. | 2021-01-07 |
| Atomic layer deposition of HfAlC as a metal gate workfunction material in MOS devices Grant 9,607,904 - Lee , et al. March 28, 2 | 2017-03-28 |
| Atomic Layer Deposition of HfAlC as a Metal Gate Workfunction Material in MOS Devices App 20160035631 - Lee; Albert Sanghyup ; et al. | 2016-02-04 |
| High temperature ALD process of metal oxide for DRAM applications Grant 8,835,273 - Chen , et al. September 16, 2 | 2014-09-16 |
| Substrate Carrier App 20140166840 - French; Wayne R. ; et al. | 2014-06-19 |
| Titanium based high-K dielectric films Grant 8,737,036 - Chen , et al. May 27, 2 | 2014-05-27 |
| High Temperature ALD Process of Metal Oxide for DRAM Applications App 20140080284 - Chen; Hanhong ; et al. | 2014-03-20 |
| Integration of non-noble DRAM electrode Grant 8,652,927 - Malhotra , et al. February 18, 2 | 2014-02-18 |
| Enhanced non-noble electrode layers for DRAM capacitor cell Grant 8,647,943 - Chen , et al. February 11, 2 | 2014-02-11 |
| Enhanced Non-noble Electrode Layers For Dram Capacitor Cell App 20130330902 - Chen; Hanhong ; et al. | 2013-12-12 |
| Integration of Non-Noble DRAM Electrode App 20130320495 - Malhotra; Sandra G. ; et al. | 2013-12-05 |
| Enhanced non-noble electrode layers for DRAM capacitor cell Grant 8,581,318 - Chen , et al. November 12, 2 | 2013-11-12 |
| Methods for depositing high-K dielectrics Grant 8,541,828 - Hashim , et al. September 24, 2 | 2013-09-24 |
| Integration of non-noble DRAM electrode Grant 8,530,348 - Malhotra , et al. September 10, 2 | 2013-09-10 |
| Methods For Depositing High-K Dielectrics App 20130056852 - Hashim; Imran ; et al. | 2013-03-07 |
| Titanium-Based High-K Dielectric Films App 20130044404 - Chen; Hanhong ; et al. | 2013-02-21 |
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