Hayashida; Koichiro
Patent Applications and Registrations
Patent applications and USPTO patent grants for Hayashida; Koichiro.The latest application filed is for "method of manufacturing epitaxial silicon wafer and apparatus therefor".
- Hayashida; Koichiro - Nagasaki JP
- Hayashida; Koichiro - Kanagawa JP
| Patent | Date |
|---|---|
| Method of manufacturing epitaxial silicon wafer and apparatus therefor Grant 8,888,913 - Narahara , et al. November 18, 2 | 2014-11-18 |
| Method Of Manufacturing Epitaxial Silicon Wafer And Apparatus Therefor App 20120015454 - Narahara; Kazuhiro ; et al. | 2012-01-19 |
| Method of manufacturing epitaxial silicon wafer and apparatus therefor Grant 8,021,484 - Narahara , et al. September 20, 2 | 2011-09-20 |
| Method of manufacturing epitaxial silicon wafer Grant 7,993,452 - Hayashida , et al. August 9, 2 | 2011-08-09 |
| Method of manufacturing epitaxial silicon wafer and apparatus thereof App 20070227441 - Narahara; Kazuhiro ; et al. | 2007-10-04 |
| Method of manufacturing epitaxial silicon wafer App 20070228524 - Hayashida; Koichiro ; et al. | 2007-10-04 |
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