Hayashida; Ichiro
Patent Applications and Registrations
Patent applications and USPTO patent grants for Hayashida; Ichiro.The latest application filed is for "etching agent, etching method and liquid for preparing etching agent".
- Hayashida; Ichiro - Saitama N/A JP
- Hayashida; Ichiro - Tokyo JP
- Hayashida; Ichiro - Iruma JP
- Hayashida; Ichiro - Iruma-shi JP
- Hayashida; Ichiro - Kawagoe JP
| Patent | Date |
|---|---|
| Cleaning agent for substrate and cleaning method Grant 8,900,371 - Mizuta , et al. December 2, 2 | 2014-12-02 |
| Etching agent, etching method and liquid for preparing etching agent Grant 8,871,653 - Matsuda , et al. October 28, 2 | 2014-10-28 |
| Etching Agent, Etching Method And Liquid For Preparing Etching Agent App 20130280916 - Matsuda; Osamu ; et al. | 2013-10-24 |
| Etching agent, etching method and liquid for preparing etching agent Grant 8,513,139 - Matsuda , et al. August 20, 2 | 2013-08-20 |
| Cleaning Agent For Substrate And Cleaning Method App 20120000485 - Mizuta; Hironori ; et al. | 2012-01-05 |
| Etching Agent, Etching Method And Liquid For Preparing Etching Agent App 20110230053 - Matsuda; Osamu ; et al. | 2011-09-22 |
| Cleaning composition and method of cleaning therewith Grant 7,700,532 - Hayashida , et al. April 20, 2 | 2010-04-20 |
| Etching Solution For Substrate App 20090227115 - Kato; Takehisa ; et al. | 2009-09-10 |
| Polishing composition and rinsing composition Grant 7,481,949 - Kawase , et al. January 27, 2 | 2009-01-27 |
| Semiconductor wafer cleaning agent and cleaning method Grant 7,375,066 - Kakizawa , et al. May 20, 2 | 2008-05-20 |
| Cleaning Agent for Substrate and Cleaning Method App 20070235061 - Mizuta; Hironori ; et al. | 2007-10-11 |
| Cleaning composition and method of cleaning therewith App 20060154838 - Hayashida; Ichiro ; et al. | 2006-07-13 |
| Polishing composition and rinsing composition App 20060151854 - Kawase; Akihiro ; et al. | 2006-07-13 |
| Cleaning agent for a semi-conductor substrate App 20040077512 - Kakizawa, Masahiko ; et al. | 2004-04-22 |
| Cleaning agent for a semi-conductor substrate Grant 6,716,803 - Kakizawa , et al. April 6, 2 | 2004-04-06 |
| Semiconductor wafer cleaning agent and cleaning method App 20030083214 - Kakizawa, Masahiko ; et al. | 2003-05-01 |
| Cleaning agent for a semi-conductor substrate Grant 6,534,458 - Kakizawa , et al. March 18, 2 | 2003-03-18 |
| Cleaning agent Grant 6,514,921 - Kakizawa , et al. February 4, 2 | 2003-02-04 |
| Cleaning agent Grant 6,410,494 - Kakizawa , et al. June 25, 2 | 2002-06-25 |
| Cleaning agent for a semi-conductor substrate App 20020016272 - Kakizawa, Masahiko ; et al. | 2002-02-07 |
| Cleaning agent for a semi-conductor substrate Grant 6,310,019 - Kakizawa , et al. October 30, 2 | 2001-10-30 |
| Cleaning agent App 20010018407 - Kakizawa, Masahiko ; et al. | 2001-08-30 |
| Surface treating agents and treating process for semiconductors Grant 5,580,846 - Hayashida , et al. December 3, 1 | 1996-12-03 |
| Surface treating cleaning method Grant 5,290,361 - Hayashida , et al. March 1, 1 | 1994-03-01 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 