| Patent | Date |
|---|
Plasma Processing Apparatus And Plasma Processing Method
App 20210319986 - SATO; Yosuke ; et al. | 2021-10-14 |
Etching Method, Semiconductor Manufacturing Apparatus, And Method Of Manufacturing Semiconductor Device
App 20210020450 - ABE; Chihiro ; et al. | 2021-01-21 |
Substrate processing apparatus and substrate processing method
Grant 10,388,544 - Ui , et al. A | 2019-08-20 |
Plasma processing apparatus and plasma processing method
Grant 10,381,198 - Ui , et al. A | 2019-08-13 |
Dry etching method and method for manufacturing semiconductor device
Grant 10,332,906 - Narumiya , et al. | 2019-06-25 |
Dry Etching Method And Method For Manufacturing Semiconductor Device
App 20180145086 - NARUMIYA; Kaori ; et al. | 2018-05-24 |
Plasma Processing Apparatus And Plasma Processing Methdo
App 20170186589 - SATO; Yosuke ; et al. | 2017-06-29 |
Plasma Processing Apparatus And Plasma Processing Methdo
App 20170169996 - UI; Akio ; et al. | 2017-06-15 |
Substrate processing apparatus and substrate processing method
Grant 9,583,360 - Ui , et al. February 28, 2 | 2017-02-28 |
Plasma Processing Apparatus And Plasma Processing Method
App 20160027619 - SATO; Yosuke ; et al. | 2016-01-28 |
Pattern formation method
Grant 9,111,875 - Yamamoto , et al. August 18, 2 | 2015-08-18 |
Substrate Processing Apparatus And Substrate Processing Method
App 20150162223 - UI; Akio ; et al. | 2015-06-11 |
Pattern Formation Method
App 20150011089 - Yamamoto; Hiroshi ; et al. | 2015-01-08 |
Plasma etching unit
Grant 8,840,753 - Honda , et al. September 23, 2 | 2014-09-23 |
Substrate plasma processing apparatus and plasma processing method
Grant 8,821,684 - Ui , et al. September 2, 2 | 2014-09-02 |
Substrate processing method and substrate processing apparatus
Grant 8,821,744 - Ui , et al. September 2, 2 | 2014-09-02 |
Plasma Processing Apparatus And Plasma Processing Method
App 20140083977 - UI; Akio ; et al. | 2014-03-27 |
Pattern Formation Method
App 20130344698 - OCHIAI; Shunsuke ; et al. | 2013-12-26 |
Plasma processing apparatus and plasma processing method
Grant 8,545,670 - Kojima , et al. October 1, 2 | 2013-10-01 |
Semiconductor device manufacturing method
Grant 8,536,061 - Hayashi , et al. September 17, 2 | 2013-09-17 |
Method of fabricating semiconductor device
Grant 8,524,609 - Inada , et al. September 3, 2 | 2013-09-03 |
Substrate Processing Apparatus And Substrate Processing Method
App 20120228263 - UI; Akio ; et al. | 2012-09-13 |
Plasma processing apparatus of substrate and plasma processing method thereof
Grant 8,252,193 - Ui , et al. August 28, 2 | 2012-08-28 |
Method Of Fabricating Semiconductor Device
App 20120214308 - INADA; Satoshi ; et al. | 2012-08-23 |
Substrate Processing Method And Substrate Processing Apparatus
App 20120080408 - UI; Akio ; et al. | 2012-04-05 |
Semiconductor Device Manufacturing Method
App 20120034785 - HAYASHI; Hisataka ; et al. | 2012-02-09 |
Method of manufacturing semiconductor device
Grant 8,084,360 - Kasahara , et al. December 27, 2 | 2011-12-27 |
Method Of Manufacturing Semiconductor Device
App 20110269290 - KASAHARA; Yusuke ; et al. | 2011-11-03 |
Method For Manufacturing Semiconductor Device And Semiconductor Manufacturing Apparatus
App 20110223750 - HAYASHI; Hisataka ; et al. | 2011-09-15 |
Plasma etching method
Grant 7,749,914 - Honda , et al. July 6, 2 | 2010-07-06 |
Manufacturing method of semiconductor device and semiconductor storage device including fine contact holes
Grant 7,727,899 - Hayashi June 1, 2 | 2010-06-01 |
Substrate Processing Apparatus And Substrate Processing Method
App 20100072172 - Ui; Akio ; et al. | 2010-03-25 |
Method of processing organic film using plasma etching and method of manufacturing semiconductor device
Grant 7,658,859 - Hayashi February 9, 2 | 2010-02-09 |
Plasma Etching Unit
App 20100024983 - Honda; Masanobu ; et al. | 2010-02-04 |
Plasma etching method and plasma etching unit
Grant 7,625,494 - Honda , et al. December 1, 2 | 2009-12-01 |
Substrate Plasma Processing Apparatus And Plasma Processing Method
App 20090194508 - UI; Akio ; et al. | 2009-08-06 |
Plasma Processing Apparatus And Plasma Processing Method
App 20090078678 - Kojima; Akihiro ; et al. | 2009-03-26 |
Plasma Processing Apparatus Of Substrate And Plasma Processing Method Thereof
App 20080237185 - UI; Akio ; et al. | 2008-10-02 |
Method and device for plasma-etching organic material film
Grant 7,419,613 - Honda , et al. September 2, 2 | 2008-09-02 |
Manufacturing method of semiconductor device and semiconductor storage device including fine contact holes
App 20070254472 - Hayashi; Hisataka | 2007-11-01 |
Etching method
Grant 7,285,498 - Ogawa , et al. October 23, 2 | 2007-10-23 |
Method and device for plasma-etching organic material film
App 20060213865 - Honda; Masanobu ; et al. | 2006-09-28 |
Method of processing organic film and method of manufacturing semiconductor device
App 20060191867 - Hayashi; Hisataka | 2006-08-31 |
Etching method and plasma etching apparatus
App 20050103441 - Honda, Masanobu ; et al. | 2005-05-19 |
Plasma etching method
App 20050082256 - Honda, Masanobu ; et al. | 2005-04-21 |
Etching method
App 20050085077 - Ogawa, Kazuto ; et al. | 2005-04-21 |
Plasma etching method and plasma etching unit
App 20050039854 - Matsuyama, Shoichiro ; et al. | 2005-02-24 |
Method of manufacturing semiconductor device and method of cleaning plasma etching apparatus used therefor
App 20050009356 - Kojima, Akihiro ; et al. | 2005-01-13 |
Plasma processing apparatus with reduced parasitic capacity and loss in RF power
App 20040238126 - Hayashi, Hisataka ; et al. | 2004-12-02 |
Plasma etching method and plasma etching unit
App 20040219797 - Honda, Masanobu ; et al. | 2004-11-04 |
Process for fabricating a metal wiring and metal contact in a semicondutor device
Grant 6,794,286 - Aoyama , et al. September 21, 2 | 2004-09-21 |
Plasma processing apparatus with reduced parasitic capacity and loss in RF power
Grant 6,780,278 - Hayashi , et al. August 24, 2 | 2004-08-24 |
Method for manufacturing a semiconductor device
App 20030181031 - Kojima, Akihiro ; et al. | 2003-09-25 |
Manufacturing method of semiconductor device using mask pattern having high etching resistance
Grant 6,576,562 - Ohuchi , et al. June 10, 2 | 2003-06-10 |
Semiconductor device and process of fabricating the same
App 20020173116 - Apyama, Hisako ; et al. | 2002-11-21 |
Manufacturing method of semiconductor device using mask pattern having high etching resistance
App 20020119612 - Ohuchi, Junko ; et al. | 2002-08-29 |
Plasma processing apparatus with reduced parasitic capacity and loss in RF power
App 20020042204 - Hayashi, Hisataka ; et al. | 2002-04-11 |
Method of forming a pattern
App 20010034131 - Sato, Yasuhiko ; et al. | 2001-10-25 |
Plasma etching method
Grant 5,595,627 - Inazawa , et al. January 21, 1 | 1997-01-21 |
Semiconductor device having a wiring layer with a barrier layer
Grant 5,592,024 - Aoyama , et al. January 7, 1 | 1997-01-07 |
Method of manufacturing semiconductor device
Grant 5,445,710 - Hori , et al. * August 29, 1 | 1995-08-29 |
Dry etching method
Grant 5,310,454 - Ohiwa , et al. May 10, 1 | 1994-05-10 |
Method of manufacturing semiconductor device
Grant 5,302,240 - Hori , et al. April 12, 1 | 1994-04-12 |
Method of manufacturing semiconductor device
Grant 5,240,554 - Hori , et al. August 31, 1 | 1993-08-31 |
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