| Patent | Date |
|---|
Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
Grant 8,071,157 - Ito , et al. December 6, 2 | 2011-12-06 |
Semiconductor Device Manufacturing Method To Form Resist Pattern, And Substrate Processing Apparatus
App 20110229826 - KAWAMURA; Daisuke ; et al. | 2011-09-22 |
Film Forming Method, Film Forming Apparatus, Pattern Forming Method, And Manufacturing Method Of Semiconductor Apparatus
App 20110212255 - Ito; Shinichi ; et al. | 2011-09-01 |
Pattern forming method and a semiconductor device manufacturing method
Grant 7,972,765 - Kawano , et al. July 5, 2 | 2011-07-05 |
Semiconductor device manufacturing method to form resist pattern
Grant 7,968,272 - Kawamura , et al. June 28, 2 | 2011-06-28 |
Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus
Grant 7,903,264 - Hayasaki , et al. March 8, 2 | 2011-03-08 |
Film Forming Method, Film Forming Apparatus, Pattern Forming Method, And Manufacturing Method Of Semiconductor Apparatus
App 20110008545 - ITO; Shinichi ; et al. | 2011-01-13 |
Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device
Grant 7,794,923 - Shiobara , et al. September 14, 2 | 2010-09-14 |
Substrate Treating Method, Substrate-processing Apparatus, Developing Method, Method Of Manufacturing A Semiconductor Device, And Method Of Cleaning A Developing Solution Nozzle
App 20100104988 - HAYASAKI; Kei ; et al. | 2010-04-29 |
Substrate processing method and manufacturing method of semiconductor device
Grant 7,683,291 - Hayasaki , et al. March 23, 2 | 2010-03-23 |
Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle
Grant 7,669,608 - Hayasaki , et al. March 2, 2 | 2010-03-02 |
Apparatus for processing substrate and method of processing the same
Grant 7,662,546 - Kawano , et al. February 16, 2 | 2010-02-16 |
Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
Grant 7,604,832 - Ito , et al. October 20, 2 | 2009-10-20 |
Pattern forming method and a semiconductor device manufacturing method
App 20090246710 - Kawano; Kenji ; et al. | 2009-10-01 |
Pattern forming method and a semiconductor device manufacturing method
Grant 7,563,561 - Kawano , et al. July 21, 2 | 2009-07-21 |
Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus
Grant 7,510,341 - Hayasaki , et al. March 31, 2 | 2009-03-31 |
Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus
Grant 7,483,155 - Hayasaki , et al. January 27, 2 | 2009-01-27 |
Structure Inspection Method, Pattern Formation Method, Process Condition Determination Method And Resist Pattern Evaluation Apparatus
App 20090002722 - HAYASAKI; KEI ; et al. | 2009-01-01 |
Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
Grant 7,399,578 - Takahashi , et al. July 15, 2 | 2008-07-15 |
Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method of semiconductor device
Grant 7,368,209 - Shiobara , et al. May 6, 2 | 2008-05-06 |
Method for forming a pattern and substrate-processing apparatus
Grant 7,364,839 - Hayasaki , et al. April 29, 2 | 2008-04-29 |
Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
App 20080090001 - Ito; Shinichi ; et al. | 2008-04-17 |
Method for evaluating a local flare, correction method for a mask pattern, manufacturing method for a semiconductor device and a computer program product
Grant 7,327,436 - Fukuhara , et al. February 5, 2 | 2008-02-05 |
Substrate processing method and semiconductor device manufacturing method carried out in a lithographic process
App 20080003837 - Hayasaki; Kei ; et al. | 2008-01-03 |
Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
Grant 7,312,018 - Ito , et al. December 25, 2 | 2007-12-25 |
Substrate treatment method, substrate treatment apparatus, and semiconductor device manufacturing method
App 20070199579 - Hayasaki; Kei ; et al. | 2007-08-30 |
Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device
App 20070190462 - Shiobara; Eishi ; et al. | 2007-08-16 |
Semiconductor device manufacturing method to form resist pattern, and substrate processing apparatus
App 20070128554 - Kawamura; Daisuke ; et al. | 2007-06-07 |
Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
App 20070037099 - Takahashi; Riichiro ; et al. | 2007-02-15 |
Substrate processing method and manufacturing method of semiconductor device
App 20060289431 - Hayasaki; Kei ; et al. | 2006-12-28 |
Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
Grant 7,097,960 - Takahashi , et al. August 29, 2 | 2006-08-29 |
Pattern forming method and a semiconductor device manufacturing method
App 20060110687 - Kawano; Kenji ; et al. | 2006-05-25 |
Apparatus for processing substrate and method of processing the same
App 20060102614 - Kawano; Kenji ; et al. | 2006-05-18 |
Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle
Grant 7,018,481 - Hayasaki , et al. March 28, 2 | 2006-03-28 |
Apparatus for processing substrate and method of processing the same
Grant 7,005,238 - Kawano , et al. February 28, 2 | 2006-02-28 |
Apparatus for processing substrate and method of processing the same
Grant 7,005,249 - Kawano , et al. February 28, 2 | 2006-02-28 |
Method for evaluating a local flare, correction method for a mask pattern, manufacturing method for a semiconductor device and a computer program product
App 20050275820 - Fukuhara, Kazuya ; et al. | 2005-12-15 |
Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus
App 20050168758 - Hayasaki, Kei ; et al. | 2005-08-04 |
Apparatus for processing substrate and method of processing the same
App 20050158670 - Kawano, Kenji ; et al. | 2005-07-21 |
Apparatus for processing substrate and method of processing the same
App 20050118536 - Kawano, Kenji ; et al. | 2005-06-02 |
Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle
App 20050087217 - Hayasaki, Kei ; et al. | 2005-04-28 |
Apparatus for processing substrate and method of processing the same
Grant 6,881,058 - Kawano , et al. April 19, 2 | 2005-04-19 |
Alkaline solution and manufacturing method, and alkaline solution applied to patern forming method, resist film removing method, solution application method, substrate treatment method, solotion supply method, and semiconductor device manufacturing method
App 20050058944 - Takahashi, Riichiro ; et al. | 2005-03-17 |
Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
App 20050022732 - Ito, Shinichi ; et al. | 2005-02-03 |
Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
App 20050026456 - Ito, Shinichi ; et al. | 2005-02-03 |
Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus
App 20050008979 - Hayasaki, Kei ; et al. | 2005-01-13 |
Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method semiconductor device
App 20040265713 - Shiobara, Eishi ; et al. | 2004-12-30 |
Heating device, method for evaluating heating device and pattern forming method
Grant 6,831,258 - Hayasaki , et al. December 14, 2 | 2004-12-14 |
Method of forming a pattern
Grant 6,818,387 - Takahashi , et al. November 16, 2 | 2004-11-16 |
Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
Grant 6,800,569 - Ito , et al. October 5, 2 | 2004-10-05 |
Method for forming a pattern and substrate-processing apparatus
App 20040131980 - Hayasaki, Kei ; et al. | 2004-07-08 |
Alkaline Solution And Manufacturing Method, And Alkaline Solution Applied To Pattern Forming Method, Resist Film Removing Method, Solution Application Method, Substrate Treatment Method, Solution Supply Method, And Semiconductor Device Manufacturing Method
Grant 6,742,944 - Takahashi , et al. June 1, 2 | 2004-06-01 |
Heating device, method for evaluating heating device and pattern forming method
App 20040089651 - Hayasaki, Kei ; et al. | 2004-05-13 |
Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle
App 20040029026 - Hayasaki, Kei ; et al. | 2004-02-12 |
Pattern forming method using photolithography
Grant 6,686,130 - Hayasaki , et al. February 3, 2 | 2004-02-03 |
Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
App 20030211756 - Ito, Shinichi ; et al. | 2003-11-13 |
Heating device, method for evaluating heating device and pattern forming method
Grant 6,603,101 - Hayasaki , et al. August 5, 2 | 2003-08-05 |
Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
App 20030068579 - Takahashi, Riichiro ; et al. | 2003-04-10 |
Heating device, method for evaluating heating device and pattern forming method
App 20020170907 - Hayasaki, Kei ; et al. | 2002-11-21 |
Method for forming a pattern
App 20020155391 - Takahashi, Riichiro ; et al. | 2002-10-24 |
Apparatus for processing substrate and method of processing the same
App 20020123011 - Kawano, Kenji ; et al. | 2002-09-05 |
Pattern size evaluation apparatus
Grant 6,423,977 - Hayasaki , et al. July 23, 2 | 2002-07-23 |
Pattern forming method using photolithography
App 20020015904 - Hayasaki, Kei ; et al. | 2002-02-07 |
Heating device, method for evaluating heating device and pattern forming method
App 20010001463 - Hayasaki, Kei ; et al. | 2001-05-24 |
Heating device, method for evaluating heating device and pattern forming method
Grant 6,191,397 - Hayasaki , et al. February 20, 2 | 2001-02-20 |
| 