Hayamizu; Hidetaka
Patent Applications and Registrations
Patent applications and USPTO patent grants for Hayamizu; Hidetaka.The latest application filed is for "process for producing photoresist polymeric compounds".
- Hayamizu; Hidetaka - Himeji JP
- Hayamizu; Hidetaka - Himeji-shi JP
| Patent | Date |
|---|---|
| Process for producing photoresist polymeric compounds Grant 7,816,471 - Watanabe , et al. October 19, 2 | 2010-10-19 |
| Process For Producing Photoresist Polymeric Compounds App 20100099836 - WATANABE; Hitoshi ; et al. | 2010-04-22 |
| Process for producing photoresist polymeric compounds Grant 7,662,897 - Watanabe , et al. February 16, 2 | 2010-02-16 |
| Process for producing photoresist polymeric compounds Grant 7,655,743 - Watanabe , et al. February 2, 2 | 2010-02-02 |
| Process For Producing Photoresist Polymeric Compounds App 20080268377 - WATANABE; Hitoshi ; et al. | 2008-10-30 |
| Process for producing photoresist polymeric compounds App 20060116493 - Watanabe; Hitoshi ; et al. | 2006-06-01 |
| Process for producing photoresist polymeric compounds App 20060116494 - Watanabe; Hitoshi ; et al. | 2006-06-01 |
| Process for the production of high-molecular compounds for photoresist Grant 7,015,291 - Watanabe , et al. March 21, 2 | 2006-03-21 |
| Process for the production of high-molecular compounds for photoresist App 20050100815 - Watanabe, Hitoshi ; et al. | 2005-05-12 |
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