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Plasma control apparatus
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Plasma Processing Apparatus And Method
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Plasma processing apparatus and method
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Plasma Processing Apparatus And Method
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Plasma processing apparatus and method
Grant 10,546,727 - Koshiishi , et al. Ja | 2020-01-28 |
Plasma processing apparatus and method
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Plasma Control Apparatus
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Plasma Processing Apparatus And Method
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Plasma Processing Apparatus And Method
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Plasma Processing Apparatus and Coil Used Therein
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Plasma processing apparatus and method
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Heating Device and Plasma Processing Apparatus Provided Therewith
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Plasma Processing Apparatus and Opening and Closing Mechanism used therein
App 20160118225 - Hayami; Toshihiro | 2016-04-28 |
Metal filling apparatus
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Plasma processor
Grant 8,852,388 - Hayami October 7, 2 | 2014-10-07 |
Metal Filling Apparatus
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Plasma processing apparatus
Grant 8,771,461 - Hayami , et al. July 8, 2 | 2014-07-08 |
Plasma Processing Apparatus And Method
App 20140124139 - KOSHIISHI; Akira ; et al. | 2014-05-08 |
Plasma processing unit and high-frequency electric power supplying unit
Grant 8,628,640 - Hayami , et al. January 14, 2 | 2014-01-14 |
Plasma processing apparatus and method
Grant 8,603,293 - Koshiishi , et al. December 10, 2 | 2013-12-10 |
High frequency power source and its control method, and plasma processing apparatus
Grant 8,286,581 - Hayami , et al. October 16, 2 | 2012-10-16 |
Plasma processing chamber, potential controlling apparatus, potential controlling method, program for implementing the method, and storage medium storing the program
Grant 8,157,952 - Honda , et al. April 17, 2 | 2012-04-17 |
Electrical Joint Member For Reducing An Electrical Resistance Between Conductive Members In A Plasma Processing Apparatus
App 20120009829 - MAEBASHI; Satoshi ; et al. | 2012-01-12 |
Plasma Processing Apparatus And Method
App 20110272097 - Koshiishi; Akira ; et al. | 2011-11-10 |
Plasma processing apparatus
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Plasma Processing Apparatus And Method
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Plasma processing apparatus and method
Grant 7,988,816 - Koshiishi , et al. August 2, 2 | 2011-08-02 |
Plasma processing apparatus and method
Grant 7,951,262 - Koshiishi , et al. May 31, 2 | 2011-05-31 |
Structure for plasma processing chamber, plasma processing chamber, plasma processing apparatus, and plasma processing chamber component
Grant 7,895,970 - Honda , et al. March 1, 2 | 2011-03-01 |
Temperature control system and substrate processing apparatus
Grant 7,870,751 - Kaneko , et al. January 18, 2 | 2011-01-18 |
Plasma Processing Apparatus
App 20110005684 - Hayami; Toshihiro ; et al. | 2011-01-13 |
Substrate mounting table, substrate processing apparatus and substrate processing method
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Capacitive coupling plasma processing apparatus
Grant 7,767,055 - Himori , et al. August 3, 2 | 2010-08-03 |
Substrate supporting member and substrate processing apparatus
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Plasma Processor
App 20100043973 - Hayami; Toshihiro | 2010-02-25 |
Plasma Processing Appratus And Method And Apparatus For Measuring Dc Potential
App 20090277585 - MAEBASHI; Satoshi ; et al. | 2009-11-12 |
Plasma processing apparatus
Grant 7,368,876 - Hayami , et al. May 6, 2 | 2008-05-06 |
Structure for plasma processing chamber, plasma processing chamber, plasma processing apparatus, and plasma processing chamber component
App 20070068798 - Honda; Masanobu ; et al. | 2007-03-29 |
Plasma processing chamber, potential controlling apparatus, potential controlling method, program for implementing the method, and storage medium storing the program
App 20060273733 - Honda; Masanobu ; et al. | 2006-12-07 |
Substrate supporting member and substrate processing apparatus
App 20060207507 - Oohashi; Kaoru ; et al. | 2006-09-21 |
Substrate mounting table, substrate processing apparatus and substrate processing method
App 20060207725 - Oohashi; Kaoru ; et al. | 2006-09-21 |
Temperature control system and substrate processing apparatus
App 20060201172 - Kaneko; Kengo ; et al. | 2006-09-14 |
Capacitive coupling plasma processing apparatus
App 20060118044 - Himori; Shinji ; et al. | 2006-06-08 |
Plasma processing apparatus and method
App 20060066247 - Koshiishi; Akira ; et al. | 2006-03-30 |
Electrical joint forming member and plasma processing apparatus
Grant 7,008,275 - Hayami , et al. March 7, 2 | 2006-03-07 |
Plasma processing apparatus and method
App 20060037703 - Koshiishi; Akira ; et al. | 2006-02-23 |
Plasma processing apparatus and method and apparatus for measuring DC potential
App 20050095732 - Maebashi, Satoshi ; et al. | 2005-05-05 |
Electrical joint forming member and plasma processing apparatus
App 20050070174 - Hayami, Toshihiro ; et al. | 2005-03-31 |
Plasma processing apparatus
App 20050011452 - Hayami, Toshihiro ; et al. | 2005-01-20 |
High frequency power source and its control method, and plasma processing apparatus
App 20040222184 - Hayami, Toshihiro ; et al. | 2004-11-11 |
Plasma processing unit and high-frequency electric power supplying unit
App 20040154540 - Hayami, Toshihiro ; et al. | 2004-08-12 |
Temperature measuring method and plasma processing apparatus
App 20040108066 - Hayami, Toshihiro ; et al. | 2004-06-10 |
Method for detecting etching endpoint, and etching apparatus and etching system using the method thereof
Grant 6,669,810 - Miyazaki , et al. December 30, 2 | 2003-12-30 |
Plasma processing apparatus and plasma processing method
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Method for detecting etching endpoint, and etching apparatus and etching system using the method thereof
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