Hayama; Ryuichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hayama; Ryuichi.The latest application filed is for "discharge apparatus and discharge method".

Company Profile

0.4.5

Hayama; Ryuichi - Kyoto JP
Hayama; Ryuichi - Urawa-shi Saitama 338-0805 JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Discharge apparatus and discharge method Grant 9,238,244 - Hayama January 19, 2	2016-01-19
Discharge Apparatus And Discharge Method App 20150028055 - HAYAMA; Ryuichi	2015-01-29
Plating Apparatus, Plating Cup And Cathode Ring App 20070080057 - MIZOHATA; Yasuhiro ; et al.	2007-04-12
Plating Apparatus, Plating Cup And Cathode Ring App 20070023277 - Mizohata; Yasuhiro ; et al.	2007-02-01
Plating apparatus, plating cup and cathode ring Grant 7,169,269 - Mizohata , et al. January 30, 2	2007-01-30
Plating apparatus, plating cup and cathode ring App 20040140199 - Mizohata, Yasuhiro ; et al.	2004-07-22
Substrate transfer apparatus and substrate transfer method Grant 6,712,579 - Fujii , et al. March 30, 2	2004-03-30
Devices and methods for the transcutaneous delivery of ions and the electrical stimulation of tissue and cells at targeted areas in the eye Grant 6,549,808 - Gisel , et al. April 15, 2	2003-04-15
Substrate transfer apparatus and substrate transfer method App 20020150459 - Fujii, Kenji ; et al.	2002-10-17

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