Hawthorne; Richard C.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hawthorne; Richard C..The latest application filed is for "system for wafer cleaning".

Company Profile

0.9.0

Hawthorne; Richard C. - late of Nampa ID
Hawthorne; Richard C. - Nampa ID

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Trademarks

Patent Activity

Patent	Date
System for wafer cleaning Grant 6,235,145 - Li , et al. May 22, 2	2001-05-22
Method for forming a dielectric Grant 6,207,587 - Li , et al. March 27, 2	2001-03-27
Method for in situ removal of particulate residues resulting from cleaning treatments Grant 6,029,680 - Hawthorne , et al. February 29, 2	2000-02-29
Method for removing silicon nitride in the fabrication of semiconductor devices Grant 6,010,949 - Li , et al. January 4, 2	2000-01-04
Selective etching of oxides Grant 5,990,019 - Torek , et al. November 23, 1	1999-11-23
Method for in situ removal of particulate residues resulting from hydrofluoric acid cleaning treatments Grant 5,770,263 - Hawthorne , et al. June 23, 1	1998-06-23
Process for dry cleaning wafer surfaces using a surface diffusion layer Grant 5,749,975 - Li , et al. May 12, 1	1998-05-12
Methods and etchants for etching oxides of silicon with low selectivity Grant 5,716,535 - Lee , et al. February 10, 1	1998-02-10
Method for enhancing nitridation and oxidation growth by introducing pulsed NF.sub.3 Grant 5,264,396 - Thakur , et al. November 23, 1	1993-11-23

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