loadpatents
Patent applications and USPTO patent grants for HAWRYLCHAK; Lara.The latest application filed is for "process system with variable flow valve".
Patent | Date |
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Process System With Variable Flow Valve App 20220223383 - SHONO; Eric Kihara ;   et al. | 2022-07-14 |
Methods For Calibrating An Optical Emission Spectrometer App 20220178747 - LO; Kin Pong ;   et al. | 2022-06-09 |
Plasma-enhanced anneal chamber for wafer outgassing Grant 11,348,769 - Hawrylchak , et al. May 31, 2 | 2022-05-31 |
Novel And Effective Homogenize Flow Mixing Design App 20220165547 - PANDEY; Vishwas Kumar ;   et al. | 2022-05-26 |
Apparatus And System For Delivering Gas To A Process Chamber App 20220154338 - OLSEN; Christopher S. ;   et al. | 2022-05-19 |
Gas injection apparatus with heating channels Grant 11,268,193 - Hawrylchak , et al. March 8, 2 | 2022-03-08 |
Integrated Epitaxy And Preclean System App 20220059342 - HAWRYLCHAK; Lara ;   et al. | 2022-02-24 |
Integrated epitaxy and preclean system Grant 11,164,737 - Hawrylchak , et al. November 2, 2 | 2021-11-02 |
Gas Injector With Baffle App 20210322934 - PANDEY; Vishwas Kumar ;   et al. | 2021-10-21 |
Non-disappearing anode for use with dielectric deposition Grant 11,114,289 - Cox , et al. September 7, 2 | 2021-09-07 |
Argon addition to remote plasma oxidation Grant 11,081,340 - Lo , et al. August 3, 2 | 2021-08-03 |
Gas injector with baffle Grant 11,077,410 - Pandey , et al. August 3, 2 | 2021-08-03 |
Method And Apparatus For Selective Nitridation Process App 20210202702 - ROGERS; Matthew Scott ;   et al. | 2021-07-01 |
Epitaxy system integrated with high selectivity oxide removal and high temperature contaminant removal Grant 11,049,719 - Hawrylchak , et al. June 29, 2 | 2021-06-29 |
Finned rotor cover Grant 11,004,704 - Hawrylchak , et al. May 11, 2 | 2021-05-11 |
Thin film treatment process Grant 10,971,357 - Liu , et al. April 6, 2 | 2021-04-06 |
Thermal processing chamber with low temperature control Grant 10,948,353 - Hawrylchak , et al. March 16, 2 | 2021-03-16 |
Method and apparatus for selective nitridation process Grant 10,950,698 - Rogers , et al. March 16, 2 | 2021-03-16 |
Gas Injection Apparatus With Heating Channels App 20210040612 - HAWRYLCHAK; Lara ;   et al. | 2021-02-11 |
Method And Apparatus For Precleaning A Substrate Surface Prior To Epitaxial Growth App 20210010160 - OLSEN; Christopher S. ;   et al. | 2021-01-14 |
Plasma-enhanced Anneal Chamber For Wafer Outgassing App 20200402780 - HAWRYLCHAK; Lara ;   et al. | 2020-12-24 |
Method and apparatus for precleaning a substrate surface prior to epitaxial growth Grant 10,837,122 - Olsen , et al. November 17, 2 | 2020-11-17 |
High Pressure Rf-dc Sputtering And Methods To Improve Film Uniformity And Step-coverage Of This Process App 20200357616 - ALLEN; Adolph Miller ;   et al. | 2020-11-12 |
Plasma-enhanced anneal chamber for wafer outgassing Grant 10,770,272 - Hawrylchak , et al. Sep | 2020-09-08 |
Non-contact temperature calibration tool for a substrate support and method of using the same Grant 10,763,141 - Merchant , et al. Sep | 2020-09-01 |
High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process Grant 10,763,090 - Allen , et al. Sep | 2020-09-01 |
Semiconductor processing chamber Grant 10,741,428 - Hunter , et al. A | 2020-08-11 |
Argon Addition To Remote Plasma Oxidation App 20200251331 - Kind Code | 2020-08-06 |
Asymmetric Injection For Better Wafer Uniformity App 20200240014 - Shono; Eric Kihara ;   et al. | 2020-07-30 |
Gas injection apparatus with heating channels Grant 10,689,757 - Hawrylchak , et al. | 2020-06-23 |
Thermal Processing Chamber With Low Temperature Control App 20200149968 - HAWRYLCHAK; Lara ;   et al. | 2020-05-14 |
Argon addition to remote plasma oxidation Grant 10,636,650 - Lo , et al. | 2020-04-28 |
Showerhead design Grant 10,626,500 - Shah , et al. | 2020-04-21 |
Thin Film Treatment Process App 20200111659 - LIU; Wei ;   et al. | 2020-04-09 |
Thermal cooling member with low temperature control Grant 10,571,337 - Hawrylchak , et al. Feb | 2020-02-25 |
Apparatus and methods for backside passivation Grant 10,535,513 - Hawrylchak , et al. Ja | 2020-01-14 |
Process Chamber Process Kit With Protective Coating App 20190385825 - WU; Jian ;   et al. | 2019-12-19 |
Method And Apparatus For Precleaning A Substrate Surface Prior To Epitaxial Growth App 20190382917 - OLSEN; Christopher S. ;   et al. | 2019-12-19 |
Method and apparatus for precleaning a substrate surface prior to epitaxial growth Grant 10,428,441 - Olsen , et al. October 1, 2 | 2019-10-01 |
Fast Response Pedestal Assembly For Selective Preclean App 20190272982 - HAWRYLCHAK; Lara ;   et al. | 2019-09-05 |
Argon Addition To Remote Plasma Oxidation App 20190221427 - LO; Hansel ;   et al. | 2019-07-18 |
Showerhead Design App 20190194810 - SHAH; Kartik ;   et al. | 2019-06-27 |
Plasma treating a process chamber Grant 10,290,504 - Liu , et al. | 2019-05-14 |
Gas Injector With Baffle App 20190105614 - PANDEY; Vishwas Kumar ;   et al. | 2019-04-11 |
Method And Apparatus For Selective Nitridation Process App 20190088485 - ROGERS; Matthew Scott ;   et al. | 2019-03-21 |
Showerhead design Grant 10,221,483 - Shah , et al. | 2019-03-05 |
Epitaxy System Integrated With High Selectivity Oxide Removal And High Temperature Contaminant Removal App 20190067006 - HAWRYLCHAK; Lara ;   et al. | 2019-02-28 |
Integrated Epitaxy And Preclean System App 20190066998 - HAWRYLCHAK; Lara ;   et al. | 2019-02-28 |
Integrated Epitaxy System High Temperature Contaminant Removal App 20190062904 - HAWRYLCHAK; Lara ;   et al. | 2019-02-28 |
Substrate support ring for more uniform layer thickness Grant 10,211,046 - Pan , et al. Feb | 2019-02-19 |
Remote Plasma Oxidation Chamber App 20180347045 - OLSEN; Christopher S. ;   et al. | 2018-12-06 |
Thermal Processing Chamber With Low Temperature Control App 20180340832 - HAWRYLCHAK; Lara ;   et al. | 2018-11-29 |
Apparatus And Methods For Backside Passivation App 20180294153 - Hawrylchak; Lara ;   et al. | 2018-10-11 |
Finned Rotor Cover App 20180269083 - HAWRYLCHAK; Lara ;   et al. | 2018-09-20 |
Non-contact Temperature Calibration Tool For A Substrate Support And Method Of Using The Same App 20180269089 - MERCHANT; Niraj ;   et al. | 2018-09-20 |
Rotor Cover App 20180254206 - Hawrylchak; Lara ;   et al. | 2018-09-06 |
Method and apparatus for selective nitridation process Grant 10,049,881 - Rogers , et al. August 14, 2 | 2018-08-14 |
Apparatus and methods for backside passivation Grant 10,020,187 - Hawrylchak , et al. July 10, 2 | 2018-07-10 |
Gas Injection Apparatus With Heating Channels App 20180187305 - HAWRYLCHAK; Lara ;   et al. | 2018-07-05 |
Adjustable process spacing, centering, and improved gas conductance Grant 9,978,569 - Hawrylchak , et al. May 22, 2 | 2018-05-22 |
Plasma Treating A Process Chamber App 20180082847 - LIU; Wei ;   et al. | 2018-03-22 |
Method And Apparatus For Precleaning A Substrate Surface Prior To Epitaxial Growth App 20180016705 - OLSEN; Christopher S. ;   et al. | 2018-01-18 |
H.sub.2/O.sub.2 side inject to improve process uniformity for low temperature oxidation process Grant 9,869,017 - Tjandra , et al. January 16, 2 | 2018-01-16 |
Plasma treating a process chamber Grant 9,831,091 - Liu , et al. November 28, 2 | 2017-11-28 |
Non-disappearing Anode For Use With Dielectric Deposition App 20170316924 - COX; Michael S. ;   et al. | 2017-11-02 |
Plasma-enhanced Anneal Chamber For Wafer Outgassing App 20170294292 - HAWRYLCHAK; Lara ;   et al. | 2017-10-12 |
Semiconductor Processing Chamber App 20170294325 - HUNTER; Aaron Muir ;   et al. | 2017-10-12 |
In-situ removable electrostatic chuck Grant 9,773,692 - Cox , et al. September 26, 2 | 2017-09-26 |
Showerhead for a semiconductor processing chamber Grant D790,039 - Hawrylchak , et al. June 20, 2 | 2017-06-20 |
Method and apparatus for precleaning a substrate surface prior to epitaxial growth Grant 9,683,308 - Olsen , et al. June 20, 2 | 2017-06-20 |
In-situ Removable Electrostatic Chuck App 20170062260 - COX; Michael S. ;   et al. | 2017-03-02 |
High Pressure Rf-dc Sputtering And Methods To Improve Film Uniformity And Step-coverage Of This Process App 20170029941 - ALLEN; Adolph Miller ;   et al. | 2017-02-02 |
Adjustable Process Spacing, Centering, And Improved Gas Conductance App 20170018413 - HAWRYLCHAK; Lara ;   et al. | 2017-01-19 |
Process Chamber App 20160358781 - LIU; Wei ;   et al. | 2016-12-08 |
Methods and apparatus for selective oxidation of a substrate Grant 9,514,968 - Tjandra , et al. December 6, 2 | 2016-12-06 |
In-situ removable electrostatic chuck Grant 9,508,584 - Cox , et al. November 29, 2 | 2016-11-29 |
Adjustable process spacing, centering, and improved gas conductance Grant 9,464,349 - Hawrylchak , et al. October 11, 2 | 2016-10-11 |
H2/o2 Side Inject To Improve Process Uniformity For Low Temperature Oxidation Process App 20160010206 - TJANDRA; Agus Sofian ;   et al. | 2016-01-14 |
Showerhead Design App 20150329966 - SHAH; Kartik ;   et al. | 2015-11-19 |
Methods And Apparatus For Processing Substrates Using An Ion Shield App 20150332941 - TOBIN; JEFFREY ;   et al. | 2015-11-19 |
Process kit for RF physical vapor deposition Grant 9,123,511 - Young , et al. September 1, 2 | 2015-09-01 |
Adjustable process spacing, centering, and improved gas conductance Grant 9,096,926 - Hawrylchak , et al. August 4, 2 | 2015-08-04 |
Methods And Apparatus For Selective Oxidation Of A Substrate App 20150206777 - TJANDRA; AGUS ;   et al. | 2015-07-23 |
Extended Life Deposition Ring App 20150190835 - HAWRYLCHAK; Lara | 2015-07-09 |
Methods and apparatus for processing substrates using an ion shield Grant 9,048,190 - Tobin , et al. June 2, 2 | 2015-06-02 |
Methods and apparatus for selective oxidation of a substrate Grant 8,993,458 - Tjandra , et al. March 31, 2 | 2015-03-31 |
Method And Apparatus For Precleaning A Substrate Surface Prior To Epitaxial Growth App 20150040822 - OLSEN; Christopher S. ;   et al. | 2015-02-12 |
In-situ Removable Electrostatic Chuck App 20150036259 - COX; Michael S. ;   et al. | 2015-02-05 |
Substrate Support Ring For More Uniform Layer Thickness App 20150020736 - Pan; Heng ;   et al. | 2015-01-22 |
Apparatus for physical vapor deposition having centrally fed RF energy Grant 8,795,488 - Rasheed , et al. August 5, 2 | 2014-08-05 |
Adjustable Process Spacing, Centering, And Improved Gas Conductance App 20140166480 - HAWRYLCHAK; Lara ;   et al. | 2014-06-19 |
Apparatus And Methods For Backside Passivation App 20140147990 - Hawrylchak; Lara ;   et al. | 2014-05-29 |
Methods And Apparatus For Processing Substrates Using An Ion Shield App 20140099795 - TOBIN; JEFFREY ;   et al. | 2014-04-10 |
Process kit for RF physical vapor deposition Grant 8,668,815 - Young , et al. March 11, 2 | 2014-03-11 |
Adjustable Process Spacing, Centering, And Improved Gas Conductance App 20140061040 - HAWRYLCHAK; Lara ;   et al. | 2014-03-06 |
Adjustable process spacing, centering, and improved gas conductance Grant 8,580,092 - Hawrylchak , et al. November 12, 2 | 2013-11-12 |
Methods And Apparatus For Selective Oxidation Of A Substrate App 20130210240 - TJANDRA; AGUS ;   et al. | 2013-08-15 |
Encapsulated sputtering target Grant 8,435,392 - Hawrylchak , et al. May 7, 2 | 2013-05-07 |
Process Kit For Rf Physical Vapor Deposition App 20130087452 - Hawrylchak; Lara ;   et al. | 2013-04-11 |
Method And Apparatus For Selective Nitridation Process App 20130040444 - ROGERS; MATTHEW S. ;   et al. | 2013-02-14 |
Methods And Apparatus For Controlling Power Distribution In Substrate Processing Systems App 20130014894 - LAI; CANFENG ;   et al. | 2013-01-17 |
Methods And Apparatus For Controlling Power Distribution In Substrate Processing Systems App 20130017315 - LAI; CANFENG ;   et al. | 2013-01-17 |
Process Kit For Rf Physical Vapor Deposition App 20120205241 - Young; Donny ;   et al. | 2012-08-16 |
Encapsulated Sputtering Target App 20120138457 - HAWRYLCHAK; LARA ;   et al. | 2012-06-07 |
Encapsulated sputtering target Grant 8,133,368 - Hawrylchak , et al. March 13, 2 | 2012-03-13 |
Extended Life Deposition Ring App 20120042825 - Hawrylchak; Lara | 2012-02-23 |
Physical vapor deposition reactor with circularly symmetric RF feed and DC feed to the sputter target Grant 8,070,925 - Hoffman , et al. December 6, 2 | 2011-12-06 |
Apparatus For Physical Vapor Deposition Having Centrally Fed Rf Energy App 20110240464 - RASHEED; MUHAMMAD ;   et al. | 2011-10-06 |
Physical Vapor Deposition With A Variable Capacitive Tuner and Feedback Circuit App 20110209995 - Rasheed; Muhammad M. ;   et al. | 2011-09-01 |
Adjustable Process Spacing, Centering, And Improved Gas Conductance App 20110186426 - HAWRYLCHAK; LARA ;   et al. | 2011-08-04 |
Process Kit For Rf Physical Vapor Deposition App 20110036709 - Hawrylchak; Lara ;   et al. | 2011-02-17 |
High Pressure Rf-dc Sputtering And Methods To Improve Film Uniformity And Step-coverage Of This Process App 20100252417 - Allen; Adolph Miller ;   et al. | 2010-10-07 |
Encapsulated Sputtering Target App 20100108500 - HAWRYLCHAK; LARA ;   et al. | 2010-05-06 |
Physical Vapor Deposition Reactor With Circularly Symmetric Rf Feed And Dc Feed To The Sputter Target App 20100096261 - HOFFMAN; DANIEL J. ;   et al. | 2010-04-22 |
Process Kit For Rf Physical Vapor Deposition App 20090272647 - Young; Donny ;   et al. | 2009-11-05 |
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