Hawley; Dan W.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Hawley; Dan W..The latest application filed is for "ionic removal process using filter modification by selective inorganic ion exchanger embedment".
- Hawley; Dan W. - St. James MO
| Patent | Date |
|---|---|
| Ionic Removal Process Using Filter Modification By Selective Inorganic Ion Exchanger Embedment App 20120043280 - Wang; Heping ; et al. | 2012-02-23 |
| Positive working polyamic acid/imide photoresist compositions and their use as dielectrics Grant 5,138,424 - Moss , et al. August 11, 1 | 1992-08-11 |
| Positive working polyamic acid/imide and diazoquinone photoresist with high temperature pre-bake Grant 5,024,922 - Moss , et al. June 18, 1 | 1991-06-18 |
| Light filters for microelectronics Grant 4,876,165 - Brewer , et al. October 24, 1 | 1989-10-24 |
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