loadpatents
name:-0.014750003814697
name:-0.0076360702514648
name:-0.0041418075561523
HAVERTY; Michael G. Patent Filings

HAVERTY; Michael G.

Patent Applications and Registrations

Patent applications and USPTO patent grants for HAVERTY; Michael G..The latest application filed is for "nanowire structures having wrap-around contacts".

Company Profile
5.10.14
  • HAVERTY; Michael G. - Mountain View CA
  • - Mountain View CA US
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Nanowire Structures Having Wrap-around Contacts
App 20210036137 - CEA; Stephen M. ;   et al.
2021-02-04
Nanowire structures having wrap-around contacts
Grant 10,840,366 - Cea , et al. November 17, 2
2020-11-17
Nanowire Structures Having Wrap-around Contacts
App 20200035818A1 -
2020-01-30
Nanowire structures having wrap-around contacts
Grant 10,483,385 - Cea , et al. Nov
2019-11-19
Semiconductor Device Contacts
App 20170162661 - HAVERTY; MICHAEL G. ;   et al.
2017-06-08
Semiconductor device contacts
Grant 9,577,057 - Haverty , et al. February 21, 2
2017-02-21
Semiconductor Device Contacts
App 20160043191 - HAVERTY; MICHAEL G. ;   et al.
2016-02-11
Semiconductor device contacts
Grant 9,166,004 - Haverty , et al. October 20, 2
2015-10-20
Nanowire Structures Having Wrap-around Contacts
App 20140209855 - Cea; Stephen M. ;   et al.
2014-07-31
Liner layers for metal interconnects
Grant 8,779,589 - Simka , et al. July 15, 2
2014-07-15
Transistor channel mobility using alternate gate dielectric materials
Grant 8,633,534 - Haverty , et al. January 21, 2
2014-01-21
Transistor Channel Mobility Using Alternate Gate Dielectric Materials
App 20120161251 - Haverty; Michael G. ;   et al.
2012-06-28
Semiconductor Device Contacts
App 20120161321 - Haverty; Michael G. ;   et al.
2012-06-28
Liner Layers For Metal Interconnects
App 20120153478 - Simka; Harsono S. ;   et al.
2012-06-21
Bond termination of pores in a porous diamond dielectric material
App 20070269646 - Haverty; Michael G. ;   et al.
2007-11-22
Dielectric material having carborane derivatives
App 20070224834 - Haverty; Michael G. ;   et al.
2007-09-27
Methods of internal stress reduction in dielectric films with chemical incorporation and structures formed thereby
App 20070123059 - Haverty; Michael G. ;   et al.
2007-05-31
Dielectric material having carborane derivatives
App 20060071300 - Haverty; Michael G. ;   et al.
2006-04-06
Electronic devices with molecular sieve layers
App 20060068190 - Goodner; Michael D. ;   et al.
2006-03-30
Porous ceramic materials as low-k films in semiconductor devices
App 20050287787 - Kloster, Grant M. ;   et al.
2005-12-29

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