loadpatents
name:-0.034163951873779
name:-0.027570009231567
name:-0.0080509185791016
Hausmann; Dennis Patent Filings

Hausmann; Dennis

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hausmann; Dennis.The latest application filed is for "method for selective deposition using a base-catalyzed inhibitor".

Company Profile
6.28.32
  • Hausmann; Dennis - Lake Oswego OR
  • Hausmann; Dennis - Los Gatos CA
  • Hausmann, Dennis - Escobar CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method for selective deposition using a base-catalyzed inhibitor
Grant 10,662,526 - Hausmann , et al.
2020-05-26
Pre-treatment method to improve selectivity in a selective deposition process
Grant 10,643,889 - Hausmann , et al.
2020-05-05
Method For Selective Deposition Using A Base-catalyzed Inhibitor
App 20200102650 - Hausmann; Dennis ;   et al.
2020-04-02
Method To Increase Deposition Rate Of Ald Process
App 20200040454 - HAUSMANN; Dennis ;   et al.
2020-02-06
Pre-treatment Method To Improve Selectivity In A Selective Deposition Process
App 20200043776 - HAUSMANN; Dennis ;   et al.
2020-02-06
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method
Grant 10,361,076 - Kang , et al.
2019-07-23
Plasma activated conformal dielectric film deposition
Grant 10,043,655 - Swaminathan , et al. August 7, 2
2018-08-07
Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide
Grant 9,905,414 - Gordon , et al. February 27, 2
2018-02-27
Gapfill Of Variable Aspect Ratio Features With A Composite Peald And Pecvd Method
App 20170323786 - Kang; Hu ;   et al.
2017-11-09
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method
Grant 9,793,110 - Kang , et al. October 17, 2
2017-10-17
Method for depositing a chlorine-free conformal SiN film
Grant 9,670,579 - Hausmann , et al. June 6, 2
2017-06-06
Plasma Activated Conformal Dielectric Film Deposition
App 20170148628 - Swaminathan; Shankar ;   et al.
2017-05-25
Plasma activated conformal dielectric film deposition
Grant 9,570,274 - Swaminathan , et al. February 14, 2
2017-02-14
Vapor Deposition Of Metal Oxides, Silicates And Phosphates, And Silicon Dioxide
App 20160268121 - GORDON; Roy Gerald ;   et al.
2016-09-15
Gapfill Of Variable Aspect Ratio Features With A Composite Peald And Pecvd Method
App 20160118246 - Kang; Hu ;   et al.
2016-04-28
Vapor Deposition Of Metal Oxides, Silicates And Phosphates, And Silicon Dioxide
App 20160111276 - GORDON; Roy Gerald ;   et al.
2016-04-21
Vapor Deposition Of Metal Oxides, Silicates And Phosphates, And Silicon Dioxide
App 20160087066 - GORDON; Roy Gerald ;   et al.
2016-03-24
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method
Grant 9,257,274 - Kang , et al. February 9, 2
2016-02-09
Method For Depositing A Chlorine-free Conformal Sin Film
App 20150259791 - Hausmann; Dennis ;   et al.
2015-09-17
Plasma Activated Conformal Dielectric Film Deposition
App 20150206719 - Swaminathan; Shankar ;   et al.
2015-07-23
Method for depositing a chlorine-free conformal sin film
Grant 9,070,555 - Hausmann , et al. June 30, 2
2015-06-30
Vapor Deposition of Metal Oxides, Silicates and Phosphates, and Silicon Dioxide
App 20150118395 - GORDON; Roy Gerald ;   et al.
2015-04-30
Multi-station sequential curing of dielectric films
Grant 8,980,769 - Haverkamp , et al. March 17, 2
2015-03-17
Method For Depositing A Chlorine-free Conformal Sin Film
App 20140141626 - Hausmann; Dennis ;   et al.
2014-05-22
Gapfill Of Variable Aspect Ratio Features With A Composite Peald And Pecvd Method
App 20140106574 - Kang; Hu ;   et al.
2014-04-17
Enhancing Adhesion Of Cap Layer Films
App 20140094038 - Haverkamp; Jason Dirk ;   et al.
2014-04-03
Methods For Uv-assisted Conformal Film Deposition
App 20140051262 - Lavoie; Adrien ;   et al.
2014-02-20
Methods for UV-assisted conformal film deposition
Grant 8,647,993 - LaVoie , et al. February 11, 2
2014-02-11
Method for depositing a chlorine-free conformal sin film
Grant 8,592,328 - Hausmann , et al. November 26, 2
2013-11-26
Methods for forming conductive carbon films by PECVD
Grant 8,563,414 - Fox , et al. October 22, 2
2013-10-22
Vapor deposition of silicon dioxide nanolaminates
Grant 8,536,070 - Gordon , et al. September 17, 2
2013-09-17
Methods For Uv-assisted Conformal Film Deposition
App 20130196516 - Lavoie; Adrien ;   et al.
2013-08-01
Method For Depositing A Chlorine-free Conformal Sin Film
App 20130189854 - Hausmann; Dennis ;   et al.
2013-07-25
Vapor Deposition Of Metal Oxides, Silicates And Phosphates, And Silicon Dioxide
App 20130122328 - GORDON; Roy Gerald ;   et al.
2013-05-16
Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide
Grant 8,334,016 - Gordon , et al. December 18, 2
2012-12-18
Vapor Deposition Of Metal Oxides, Silicates And Phosphates, And Silicon Dioxide
App 20120028478 - Gordon; Roy G. ;   et al.
2012-02-02
Vapor Deposition Of Silicon Dioxide Nanolaminates
App 20110281417 - GORDON; Roy G. ;   et al.
2011-11-17
Gas And Liquid Injection Methods And Apparatus
App 20110256724 - Chandrasekharan; Ramesh ;   et al.
2011-10-20
Vapor deposition of silicon dioxide nanolaminates
Grant 8,008,743 - Gordon , et al. August 30, 2
2011-08-30
Method And Apparatus For Modulation Of Precursor Exposure During A Pulsed Deposition Process
App 20100173074 - Juarez; Francisco ;   et al.
2010-07-08
Method for improving process control and film conformality of PECVD film
Grant 7,745,346 - Hausmann , et al. June 29, 2
2010-06-29
Method For Improving Process Control And Film Conformality Of Pecvd Film
App 20100099271 - Hausmann; Dennis ;   et al.
2010-04-22
Method and apparatus for modulation of precursor exposure during a pulsed deposition process
Grant 7,700,155 - Juarez , et al. April 20, 2
2010-04-20
Adhesion of tungsten nitride films to a silicon surface
Grant 7,550,851 - Nguyen , et al. June 23, 2
2009-06-23
Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide
Grant 7,507,848 - Gordon , et al. March 24, 2
2009-03-24
Adhesion of tungsten nitride films to a silicon surface
Grant 7,160,802 - Nguyen , et al. January 9, 2
2007-01-09
Adhesion of tungsten nitride films to a silicon surface
App 20060273466 - Nguyen; Huong T. ;   et al.
2006-12-07
Adhesion of tungsten nitride films to a silicon surface
App 20060276033 - Nguyen; Huong T. ;   et al.
2006-12-07
Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide
App 20050277780 - Gordon, Roy G. ;   et al.
2005-12-15
Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide
Grant 6,969,539 - Gordon , et al. November 29, 2
2005-11-29
Vapor deposition of silicon dioxide nanolaminates
App 20050112282 - Gordon, Roy G. ;   et al.
2005-05-26
Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide
App 20040043149 - Gordon, Roy G. ;   et al.
2004-03-04

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