loadpatents
Patent applications and USPTO patent grants for Hatzakis; Michael.The latest application filed is for "radiation control system".
Patent | Date |
---|---|
Radiation control system Grant 6,097,019 - Lewis , et al. August 1, 2 | 2000-08-01 |
Nanometer scale probe for an atomic force microscope, and method for making same Grant 5,171,992 - Clabes , et al. December 15, 1 | 1992-12-15 |
Dielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stability Grant 5,141,817 - Babich , et al. August 25, 1 | 1992-08-25 |
Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions Grant 5,059,512 - Babich , et al. October 22, 1 | 1991-10-22 |
Plasma-resistant polymeric material, preparation thereof, and use thereof Grant 4,782,008 - Babich , et al. November 1, 1 | 1988-11-01 |
Mixed excitation plasma etching system Grant 4,581,100 - Hatzakis , et al. April 8, 1 | 1986-04-08 |
Self-aligned photoresist process Grant 4,379,833 - Canavello , et al. April 12, 1 | 1983-04-12 |
Image hardening process Grant 4,259,369 - Canavello , et al. March 31, 1 | 1981-03-31 |
Method of modifying the development profile of photoresists Grant 4,212,935 - Canavello , et al. July 15, 1 | 1980-07-15 |
Electron sensitive resist and a method preparing the same Grant 4,156,745 - Hatzakis , et al. May 29, 1 | 1979-05-29 |
Resist development control system Grant 4,142,107 - Hatzakis , et al. February 27, 1 | 1979-02-27 |
Novel resist spinning head Grant 4,086,870 - Canavello , et al. May 2, 1 | 1978-05-02 |
X-ray lithography mask Grant 4,035,522 - Hatzakis July 12, 1 | 1977-07-12 |
High sensitivity resist system for lift-off metallization Grant 4,024,293 - Hatzakis May 17, 1 | 1977-05-17 |
Method for preparing positive resist image Grant 3,984,582 - Feder , et al. October 5, 1 | 1976-10-05 |
Method for making multilayer devices using only a single critical masking step Grant 3,957,552 - Ahn , et al. May 18, 1 | 1976-05-18 |
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