HATASE; Masako

Patent Applications and Registrations

Patent applications and USPTO patent grants for HATASE; Masako.The latest application filed is for "raw material for forming thin film by atomic layer deposition method, method of producing thin film, and alkoxide compound".

Company Profile

5.8.14

HATASE; Masako - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Raw Material For Forming Thin Film By Atomic Layer Deposition Method, Method Of Producing Thin Film, And Alkoxide Compound App 20220024953 - SAKURAI; Atsushi ; et al.	2022-01-27
Ruthenium Compound, Raw Material For Forming Thin Film, And Method For Producing Thin Film App 20200262854 - YOSHINO; Tomoharu ; et al.	2020-08-20
Metal Alkoxide Compound, Thin-film-forming Raw Material And Method Of Producing Thin Film App 20200148706 - SAKURAI; Atsushi ; et al.	2020-05-14
Metal Alkoxide Compound, Thin Film Forming Raw Material, And Thin Film Production Method App 20200140463 - OKADA; Nana ; et al.	2020-05-07
Method for producing a thin film Grant 10,364,495 - Yoshino , et al.	2019-07-30
Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound Grant 10,351,584 - Sakurai , et al. July 16, 2	2019-07-16
Ruthenium compound, material for thin film formation, and process for thin film formation Grant 10,167,304 - Hatase , et al. J	2019-01-01
Alcohol compound Grant 10,155,784 - Sakurai , et al. Dec	2018-12-18
Alkoxide Compound, Thin Film-forming Starting Material, Thin Film Formation Method, And Alcohol Compound App 20180282358 - SAKURAI; Atsushi ; et al.	2018-10-04
Alkoxide compound, thin film-forming starting material, and thin film formation method Grant 10,011,623 - Sakurai , et al. July 3, 2	2018-07-03
Alcohol Compound App 20180134739 - SAKURAI; Atsushi ; et al.	2018-05-17
Metal alkoxide compound, thin-film-forming material, method for producing thin film, and alcohol compound Grant 9,896,468 - Sakurai , et al. February 20, 2	2018-02-20
Method For Producing A Thin Film App 20170211184 - YOSHINO; Tomoharu ; et al.	2017-07-27
Aluminum compound, thin-film forming raw material, and method for producing thin film Grant 9,663,538 - Yoshino , et al. May 30, 2	2017-05-30
Alkoxide Compound, Thin Film-forming Starting Material, Thin Film Formation Method, And Alcohol Compound App 20170129912 - SAKURAI; Atsushi ; et al.	2017-05-11
Alkoxide Compound, Raw Material For Forming Thin Film, Method For Manufacturing Thin Film, And Alcohol Compound App 20170121358 - SAKURAI; Atsushi ; et al.	2017-05-04
Cobalt Compound, Thin Film-forming Raw Material, And Method For Producing Thin Film App 20170050998 - YOSHINO; Tomoharu ; et al.	2017-02-23
Aluminum precursor, method of forming a thin film and method of forming a capacitor using the same Grant 9,472,345 - Youn , et al. October 18, 2	2016-10-18
Ruthenium Compound, Material For Thin Film Formation, And Process For Thin Film Formation App 20160272664 - HATASE; Masako ; et al.	2016-09-22
Aluminum Compound, Thin-firm Forming Raw Material, And Method For Producing Thin Film App 20150266904 - Yoshino; Tomoharu ; et al.	2015-09-24
Metal Alkoxide Compound, Thin-film-forming Material, Method For Producing Thin Film, And Alcohol Compound App 20150175642 - Sakurai; Atsushi ; et al.	2015-06-25
Aluminum Precursor, Method Of Forming A Thin Film And Method Of Forming A Capacitor Using The Same App 20140242263 - YOUN; Sang-Chul ; et al.	2014-08-28

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