Hassmann; Jens
Patent Applications and Registrations
Patent applications and USPTO patent grants for Hassmann; Jens.The latest application filed is for "metal line layout based on line shifting".
- Hassmann; Jens - Dresden DE
- Hassmann; Jens - Pirna DE
| Patent | Date |
|---|---|
| Metal line layout based on line shifting Grant 9,898,572 - Melde , et al. February 20, 2 | 2018-02-20 |
| Metal Line Layout Based On Line Shifting App 20170235867 - Melde; Thomas ; et al. | 2017-08-17 |
| Method for producing a mask adapted to an exposure apparatus App 20050106476 - Hassmann, Jens ; et al. | 2005-05-19 |
| Method for adjusting the overlay of two mask planes in a photolithographic process for the production of an integrated circuit Grant 6,858,445 - Hassmann February 22, 2 | 2005-02-22 |
| Method for adjusting the overlay of two mask planes in a photolithographic process for the production of an integrated circuit App 20040101769 - Hassmann, Jens | 2004-05-27 |
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