| Patent | Date |
|---|
Stretchable film and method for forming the same
Grant 11,453,741 - Hatakeyama , et al. September 27, 2 | 2022-09-27 |
Liquid crystal display device
Grant 11,435,638 - Okumoto , et al. September 6, 2 | 2022-09-06 |
Positive Resist Composition And Pattern Forming Process
App 20220244643 - Hatakeyama; Jun ; et al. | 2022-08-04 |
Polyurethane, Polyurethane Production Method, Conductive Paste Composition, Conductive Wire, And Method For Producing Conductive Wire
App 20220157484 - NONAKA; Shiori ; et al. | 2022-05-19 |
Bio-electrode Composition, Bio-electrode, And Method For Manufacturing Bio-electrode
App 20220133201 - HATAKEYAMA; Jun ; et al. | 2022-05-05 |
Positive Resist Composition And Patterning Process
App 20220128904 - Hatakeyama; Jun ; et al. | 2022-04-28 |
Bio-electrode Composition, Bio-electrode, And Method For Manufacturing Bio-electrode
App 20220110569 - HATAKEYAMA; Jun ; et al. | 2022-04-14 |
Polymerizable monomer, polymer compound for conductive polymer, and method for producing the polymer compound
Grant 11,286,320 - Hatakeyama , et al. March 29, 2 | 2022-03-29 |
Stretchable film and method for forming stretchable film
Grant 11,261,285 - Hatakeyama , et al. March 1, 2 | 2022-03-01 |
Liquid Crystal Display Device
App 20220057663 - OKUMOTO; YOSHITAKA ; et al. | 2022-02-24 |
Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode
Grant 11,234,606 - Hatakeyama , et al. February 1, 2 | 2022-02-01 |
Sulfonium compound, resist composition, and patterning process
Grant 11,215,926 - Fujiwara , et al. January 4, 2 | 2022-01-04 |
Polymer compound for conductive polymer and method for producing same
Grant 11,208,509 - Hatakeyama , et al. December 28, 2 | 2021-12-28 |
Bio-electrode Composition, Bio-electrode, And Method For Manufacturing Bio-electrode
App 20210371663 - HATAKEYAMA; Jun ; et al. | 2021-12-02 |
Bio-electrode
App 20210353197 - HATAKEYAMA; Jun ; et al. | 2021-11-18 |
Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode
Grant 11,160,480 - Hatakeyama , et al. November 2, 2 | 2021-11-02 |
Silicon-containing compound, urethane resin, stretchable film and method for forming the same
Grant 11,142,640 - Hatakeyama , et al. October 12, 2 | 2021-10-12 |
Bio-electrode, Method For Manufacturing Bio-electrode, And Method For Measuring Biological Signal
App 20210307665 - HATAKEYAMA; Jun ; et al. | 2021-10-07 |
Liquid crystal display apparatus
Grant 11,081,073 - Hasegawa , et al. August 3, 2 | 2021-08-03 |
Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode
Grant 11,071,485 - Hatakeyama , et al. July 27, 2 | 2021-07-27 |
Moving Vehicle
App 20210197917 - Hasegawa; Koji | 2021-07-01 |
Measurement device
Grant 11,015,974 - Hasegawa , et al. May 25, 2 | 2021-05-25 |
Monomer, polymer, resist composition, and patterning process
Grant 11,009,793 - Fukushima , et al. May 18, 2 | 2021-05-18 |
Resist composition and patterning process
Grant 10,948,822 - Hatakeyama , et al. March 16, 2 | 2021-03-16 |
Adhesive film, method for forming an adhesive film, and urethane polymer
Grant 10,934,463 - Hatakeyama , et al. March 2, 2 | 2021-03-02 |
Monomer, polymer, resist composition, and patterning process
Grant 10,915,021 - Fukushima , et al. February 9, 2 | 2021-02-09 |
Conductive Wiring Material Composition, Conductive Wiring Substrate And Method For Producing Conductive Wiring Substrate
App 20210007218 - HATAKEYAMA; Jun ; et al. | 2021-01-07 |
Polymer compound for conductive polymer and method for producing same
Grant 10,851,188 - Hatakeyama , et al. December 1, 2 | 2020-12-01 |
Liquid Crystal Display Apparatus
App 20200342826 - HASEGAWA; KOJI ; et al. | 2020-10-29 |
Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film
Grant 10,816,900 - Urano , et al. October 27, 2 | 2020-10-27 |
Stretchable film composition, stretchable film, and method for forming the same
Grant 10,800,916 - Hatakeyama , et al. October 13, 2 | 2020-10-13 |
Polymer Compound For Conductive Polymer And Method For Producing Same
App 20200291145 - HATAKEYAMA; Jun ; et al. | 2020-09-17 |
Polymerizable Monomer, Polymer Compound For Conductive Polymer, And Method For Producing The Polymer Compound
App 20200247926 - Kind Code | 2020-08-06 |
Continuous particle manufacturing device
Grant 10,661,238 - Hisazumi , et al. | 2020-05-26 |
Bio-electrode Composition, Bio-electrode, And Method For Manufacturing A Bio-electrode
App 20200113464 - HATAKEYAMA; Jun ; et al. | 2020-04-16 |
Stretchable Film And Method For Forming Stretchable Film
App 20200102417 - HATAKEYAMA; Jun ; et al. | 2020-04-02 |
Monomer, polymer, resist composition, and patterning process
Grant 10,591,819 - Fukushima , et al. | 2020-03-17 |
Conductive polymer composite and substrate
Grant 10,559,397 - Hatakeyama , et al. Feb | 2020-02-11 |
Stretchable Film And Method For Forming The Same
App 20200040125 - HATAKEYAMA; Jun ; et al. | 2020-02-06 |
Bio-electrode Composition, Bio-electrode, And Method For Manufacturing A Bio-electrode
App 20200008695 - HATAKEYAMA; Jun ; et al. | 2020-01-09 |
Monomer, polymer, resist composition, and patterning process
Grant 10,527,939 - Fukushima , et al. J | 2020-01-07 |
Bio-electrode Composition, Bio-electrode, And Method For Manufacturing A Bio-electrode
App 20190388594 - HATAKEYAMA; Jun ; et al. | 2019-12-26 |
Bio-electrode Composition, Bio-electrode, And Method For Manufacturing A Bio-electrode
App 20190387990 - HATAKEYAMA; Jun ; et al. | 2019-12-26 |
Polymer compound for conductive polymer and method for producing same
Grant 10508162 - | 2019-12-17 |
Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, positive photosensitive resin composition, patterning process, and method for forming cured film
Grant 10,457,779 - Takemura , et al. Oc | 2019-10-29 |
Adhesive Film, Method For Forming An Adhesive Film, And Urethane Polymer
App 20190322903 - HATAKEYAMA; Jun ; et al. | 2019-10-24 |
Bio-electrode Composition, Bio-electrode, And Method For Manufacturing A Bio-electrode
App 20190298891 - HATAKEYAMA; Jun ; et al. | 2019-10-03 |
Laser light source module and method of specifying failure laser diode
Grant 10,424,896 - Hasegawa Sept | 2019-09-24 |
Silicon-containing Compound, Urethane Resin, Stretchable Film And Method For Forming The Same
App 20190264028 - HATAKEYAMA; Jun ; et al. | 2019-08-29 |
Bio-electrode Composition, Bio-electrode, And Method For Manufacturing Bio-electrode
App 20190254548 - HATAKEYAMA; Jun ; et al. | 2019-08-22 |
Stretchable Film Composition, Stretchable Film, And Method For Forming The Same
App 20190241709 - HATAKEYAMA; Jun ; et al. | 2019-08-08 |
Monomer, Polymer, Resist Composition, And Patterning Process
App 20190235381 - Fukushima; Masahiro ; et al. | 2019-08-01 |
Polymer compound for conductive polymer and method for producing the same
Grant 10,363,555 - Hatakeyama , et al. | 2019-07-30 |
Material for organic light-emitting device and organic light-emitting device including the same
Grant 10,308,735 - Tsuji , et al. | 2019-06-04 |
Resist composition, pattern forming process, polymer, and monomer
Grant 10,310,376 - Adachi , et al. | 2019-06-04 |
Resist composition and patterning process
Grant 10,303,056 - Hatakeyama , et al. | 2019-05-28 |
Spindle condition detection device for machine tool
Grant 10,286,514 - Hasegawa , et al. | 2019-05-14 |
Monomer, Polymer, Resist Composition, And Patterning Process
App 20190079399 - Fukushima; Masahiro ; et al. | 2019-03-14 |
Monomer, Polymer, Resist Composition, And Patterning Process
App 20190064664 - Fukushima; Masahiro ; et al. | 2019-02-28 |
Sulfonium Compound, Resist Composition, And Patterning Process
App 20190064665 - Fujiwara; Takayuki ; et al. | 2019-02-28 |
Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, patterning process, and method for forming cured film
Grant 10,216,085 - Takemura , et al. Feb | 2019-02-26 |
Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film
Grant 10,203,601 - Urano , et al. Feb | 2019-02-12 |
Measurement Device
App 20190041262 - HASEGAWA; Koji ; et al. | 2019-02-07 |
Laser Light Source Module And Method Of Specifying Failure Laser Diode
App 20190020173 - HASEGAWA; Koji | 2019-01-17 |
Tetracarboxylic Acid Diester Compound, Polymer Of Polyimide Precursor And Method For Producing Same, Negative Photosensitive Resin Composition, Patterning Process, And Method For Forming Cured Film
App 20190018320 - URANO; Hiroyuki ; et al. | 2019-01-17 |
Resist Composition And Patterning Process
App 20180373148 - Hatakeyama; Jun ; et al. | 2018-12-27 |
Resist composition and patterning process
Grant 10,131,730 - Fujiwara , et al. November 20, 2 | 2018-11-20 |
Resist composition and patterning process using the same
Grant 10,126,649 - Hatakeyama , et al. November 13, 2 | 2018-11-13 |
Polymer compound for a conductive polymer and method for producing same
Grant 10,125,202 - Hatakeyama , et al. November 13, 2 | 2018-11-13 |
Semiconductor Device And Method Of Manufacturing The Same
App 20180315673 - TOYOKAWA; Shigeya ; et al. | 2018-11-01 |
Silicone skeleton-containing polymer compound and method for producing same, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, and substrate
Grant 10,114,287 - Urano , et al. October 30, 2 | 2018-10-30 |
Polymer Compound For Conductive Polymer And Method For Producing Same
App 20180237561 - HATAKEYAMA; Jun ; et al. | 2018-08-23 |
Conductive Polymer Composite And Substrate
App 20180240564 - HATAKEYAMA; Jun ; et al. | 2018-08-23 |
Monomer, polymer, resist composition, and patterning process
Grant 10,023,674 - Sagehashi , et al. July 17, 2 | 2018-07-17 |
Sulfonium compound, resist composition, and patterning process
Grant 10,025,180 - Mitsui , et al. July 17, 2 | 2018-07-17 |
Conductive polymer composite and substrate
Grant 10,020,089 - Hatakeyama , et al. July 10, 2 | 2018-07-10 |
Resist composition and pattern forming process
Grant 10,012,903 - Hatakeyama , et al. July 3, 2 | 2018-07-03 |
Resist composition and patterning process using the same
Grant 10,005,868 - Hatakeyama , et al. June 26, 2 | 2018-06-26 |
Bio-electrode Composition, Bio-electrode, And Method For Manufacturing Bio-electrode
App 20180168470 - HATAKEYAMA; Jun ; et al. | 2018-06-21 |
Continuous Particle Manufacturing Device
App 20180154323 - HISAZUMI; Koji ; et al. | 2018-06-07 |
Conductive polymer composite and substrate
Grant 9,991,019 - Hatakeyama , et al. June 5, 2 | 2018-06-05 |
Polymer compound, negative resist composition, laminate, patterning process, and compound
Grant 9,969,829 - Domon , et al. May 15, 2 | 2018-05-15 |
Tetracarboxylic Acid Diester Compound, Polymer Of Polyimide Precursor And Method For Producing Same, Negative Photosensitive Resin Composition, Patterning Process, And Method For Forming Cured Film
App 20180120702 - URANO; Hiroyuki ; et al. | 2018-05-03 |
Sulfonium Compound, Resist Composition, And Patterning Process
App 20180059543 - Mitsui; Ryo ; et al. | 2018-03-01 |
Shrink material and pattern forming process
Grant 9,904,172 - Kumaki , et al. February 27, 2 | 2018-02-27 |
Resist Composition And Patterning Process Using The Same
App 20180024435 - HATAKEYAMA; Jun ; et al. | 2018-01-25 |
Tetracarboxylic Acid Diester Compound, Polyimide Precursor Polymer And Method For Producing The Same, Negative Photosensitive Resin Composition, Patterning Process, And Method For Forming Cured Film
App 20180024434 - TAKEMURA; Katsuya ; et al. | 2018-01-25 |
Resist Composition And Patterning Process
App 20180004087 - Hatakeyama; Jun ; et al. | 2018-01-04 |
Monomer, polymer, positive resist composition, and patterning process
Grant 9,829,792 - Hasegawa , et al. November 28, 2 | 2017-11-28 |
Programmable controller
Grant D803,911 - Suzuki , et al. November 28, 2 | 2017-11-28 |
Programmable controller
Grant D803,281 - Suzuki , et al. November 21, 2 | 2017-11-21 |
Programmable controller
Grant D803,280 - Suzuki , et al. November 21, 2 | 2017-11-21 |
Polymer, chemically amplified positive resist composition and patterning process
Grant 9,810,983 - Hatakeyama , et al. November 7, 2 | 2017-11-07 |
Tetracarboxylic Acid Diester Compound, Polyimide Precursor Polymer And Method For Producing The Same, Negative Photosensitive Resin Composition, Positive Photosensitive Resin Composition, Patterning Process, And Method For Forming Cured Film
App 20170298186 - TAKEMURA; Katsuya ; et al. | 2017-10-19 |
Polymer, monomer, resist composition, and patterning process
Grant 9,790,166 - Sagehashi , et al. October 17, 2 | 2017-10-17 |
Controller unit
Grant 9,793,653 - Sugita , et al. October 17, 2 | 2017-10-17 |
Polymer compound for a conductive polymer and method for producing same
Grant 9,777,093 - Hatakeyama , et al. October 3, 2 | 2017-10-03 |
Resist Composition And Pattern Forming Process
App 20170277037 - Hatakeyama; Jun ; et al. | 2017-09-28 |
Monomer, polymer, resist composition, and patterning process
Grant 9,758,609 - Sagehashi , et al. September 12, 2 | 2017-09-12 |
Conductive polymer composite and substrate
Grant 9,752,045 - Hatakeyama , et al. September 5, 2 | 2017-09-05 |
Hemiacetal compound, polymer, resist composition, and patterning process
Grant 9,740,100 - Hasegawa , et al. August 22, 2 | 2017-08-22 |
Monomer, Polymer, Resist Composition, And Patterning Process
App 20170226252 - Sagehashi; Masayoshi ; et al. | 2017-08-10 |
Resist composition and pattern forming process
Grant 9,720,324 - Hatakeyama , et al. August 1, 2 | 2017-08-01 |
Polymer Compound, Negative Resist Composition, Laminate, Patterning Process, And Compound
App 20170210836 - DOMON; Daisuke ; et al. | 2017-07-27 |
Resist composition and patterning process
Grant 9,709,890 - Hatakeyama , et al. July 18, 2 | 2017-07-18 |
Resist Composition, Pattern Forming Process, Polymer, And Monomer
App 20170184967 - Adachi; Teppei ; et al. | 2017-06-29 |
Polymer compound for a conductive polymer and method for producing same
Grant 9,663,593 - Hatakeyama , et al. May 30, 2 | 2017-05-30 |
Polymer compound for a conductive polymer and method for manufacturing same
Grant 9,657,115 - Hatakeyama , et al. May 23, 2 | 2017-05-23 |
Monomer, Polymer, Resist Composition, And Patterning Process
App 20170131635 - Fukushima; Masahiro ; et al. | 2017-05-11 |
Pattern forming process and shrink agent
Grant 9,632,415 - Hatakeyama , et al. April 25, 2 | 2017-04-25 |
Pattern forming process and shrink agent
Grant 9,618,850 - Hatakeyama , et al. April 11, 2 | 2017-04-11 |
Conductive polymer composite comprising a sulfo group-containing dopant polymer
Grant 9,601,229 - Hatakeyama , et al. March 21, 2 | 2017-03-21 |
Conductive polymer composition comprising a sulfo group-containing dopant polymer
Grant 9,595,362 - Hatakeyama , et al. March 14, 2 | 2017-03-14 |
Conductive polymer composite comprising a sulfo group-containing dopant polymer and substrate
Grant 9,587,137 - Nagasawa , et al. March 7, 2 | 2017-03-07 |
Conductive Polymer Composite And Substrate
App 20170062089 - HATAKEYAMA; Jun ; et al. | 2017-03-02 |
Controller Unit
App 20170062988 - SUGITA; Kazuhiro ; et al. | 2017-03-02 |
Polymer Compound For A Conductive Polymer And Method For Producing Same
App 20170058066 - HATAKEYAMA; Jun ; et al. | 2017-03-02 |
Conductive Polymer Composite And Substrate
App 20170058144 - HATAKEYAMA; Jun ; et al. | 2017-03-02 |
Polymer Compound For A Conductive Polymer And Method For Producing Same
App 20170058059 - HATAKEYAMA; Jun ; et al. | 2017-03-02 |
Resist Composition And Pattern Forming Process
App 20170031243 - Hatakeyama; Jun ; et al. | 2017-02-02 |
Resist Composition And Patterning Process Using The Same
App 20170029547 - HATAKEYAMA; Jun ; et al. | 2017-02-02 |
Patterning process and resist composition
Grant 9,551,932 - Funatsu , et al. January 24, 2 | 2017-01-24 |
Monomer, Polymer, Positive Resist Composition, And Patterning Process
App 20170008982 - Hasegawa; Koji ; et al. | 2017-01-12 |
Onium salt, chemically amplified positive resist composition, and patterning process
Grant 9,535,325 - Domon , et al. January 3, 2 | 2017-01-03 |
Polymer compound for a conductive polymer and method for producing same
Grant 9,527,937 - Hatakeyama , et al. December 27, 2 | 2016-12-27 |
Polymer, Chemically Amplified Positive Resist Composition And Patterning Process
App 20160370702 - Hatakeyama; Jun ; et al. | 2016-12-22 |
Polymer, Monomer, Resist Composition, And Patterning Process
App 20160342086 - Sagehashi; Masayoshi ; et al. | 2016-11-24 |
Polymer compound having a specific super strongly acidic sulfo group
Grant 9,493,597 - Hatakeyama , et al. November 15, 2 | 2016-11-15 |
Positive resist composition and patterning process
Grant 9,482,949 - Hatakeyama , et al. November 1, 2 | 2016-11-01 |
Monomer, polymer, resist composition, and patterning process
Grant 9,458,144 - Fujiwara , et al. October 4, 2 | 2016-10-04 |
Positive resist composition and patterning process
Grant 9,442,376 - Hatakeyama , et al. September 13, 2 | 2016-09-13 |
Hemiacetal Compound, Polymer, Resist Composition, And Patterning Process
App 20160238930 - Hasegawa; Koji ; et al. | 2016-08-18 |
Photo acid generator, chemically amplified resist composition, and patterning process
Grant 9,411,225 - Ohashi , et al. August 9, 2 | 2016-08-09 |
Silicone structure-bearing polymer, negative resist composition, photo-curable dry film, patterning process, and electric/electronic part-protecting film
Grant 9,377,689 - Takemura , et al. June 28, 2 | 2016-06-28 |
Material For Organic Light-emitting Device And Organic Light-emitting Device Including The Same
App 20160181535 - TSUJI; Masashi ; et al. | 2016-06-23 |
Monomer, Polymer, Resist Composition, And Patterning Process
App 20160179002 - Sagehashi; Masayoshi ; et al. | 2016-06-23 |
Shrink Material And Pattern Forming Process
App 20160161850 - Kumaki; Kentaro ; et al. | 2016-06-09 |
Resist Composition And Patterning Process
App 20160152755 - Fujiwara; Takayuki ; et al. | 2016-06-02 |
Pattern Forming Process And Shrink Agent
App 20160139512 - Hatakeyama; Jun ; et al. | 2016-05-19 |
Positive resist composition and patterning process
Grant 9,335,632 - Hatakeyama , et al. May 10, 2 | 2016-05-10 |
Positive resist composition and patterning process
Grant 9,335,633 - Hatakeyama , et al. May 10, 2 | 2016-05-10 |
Pattern Forming Process And Shrink Agent
App 20160124313 - Hatakeyama; Jun ; et al. | 2016-05-05 |
Monomer, polymer, positive resist composition and patterning process
Grant 9,310,683 - Hatakeyama , et al. April 12, 2 | 2016-04-12 |
Silicone Skeleton-containing Polymer Compound And Method For Producing Same, Chemically Amplified Negative Resist Composition, Photo-curable Dry Film And Method For Producing Same, Patterning Process, Layered Product, And Substrate
App 20160097973 - URANO; Hiroyuki ; et al. | 2016-04-07 |
Resist Composition And Patterning Process
App 20160085149 - Hatakeyama; Jun ; et al. | 2016-03-24 |
Polymer Compound For Conductive Polymer And Method For Producing The Same
App 20160067702 - HATAKEYAMA; Jun ; et al. | 2016-03-10 |
Conductive Polymer Composite And Substrate
App 20160071626 - HATAKEYAMA; Jun ; et al. | 2016-03-10 |
Conductive Polymer Composite And Substrate
App 20160064112 - HATAKEYAMA; Jun ; et al. | 2016-03-03 |
Conductive Polymer Composite And Substrate
App 20160064113 - HATAKEYAMA; Jun ; et al. | 2016-03-03 |
Coating device
Grant 9,266,142 - Hasegawa , et al. February 23, 2 | 2016-02-23 |
Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid
Grant 9,261,783 - Kinsho , et al. February 16, 2 | 2016-02-16 |
Monomer, polymer, resist composition, and patterning process
Grant 9,256,127 - Sagehashi , et al. February 9, 2 | 2016-02-09 |
Silicone Structure-bearing Polymer, Negative Resist Composition, Photo-curable Dry Film, Patterning Process, And Electric/electronic Part-protecting Film
App 20160033865 - Takemura; Katsuya ; et al. | 2016-02-04 |
Polymer, positive resist composition and patterning process
Grant 9,250,517 - Sagehashi , et al. February 2, 2 | 2016-02-02 |
Positive resist composition and patterning process
Grant 9,250,522 - Hatakeyama , et al. February 2, 2 | 2016-02-02 |
Polymer Compound For A Conductive Polymer And Method For Producing Same
App 20160017066 - HATAKEYAMA; Jun ; et al. | 2016-01-21 |
Polymer Compound For A Conductive Polymer And Method For Producing Same
App 20160017068 - HATAKEYAMA; Jun ; et al. | 2016-01-21 |
Monomer, polymer, resist composition, and patterning process
Grant 9,235,122 - Sagehashi , et al. January 12, 2 | 2016-01-12 |
Photo Acid Generator, Chemically Amplified Resist Composition, And Patterning Process
App 20160004155 - OHASHI; Masaki ; et al. | 2016-01-07 |
Patterning process, resist composition, polymer, and monomer
Grant 9,213,235 - Hasegawa , et al. December 15, 2 | 2015-12-15 |
Resist Composition And Patterning Process
App 20150346600 - Adachi; Teppei ; et al. | 2015-12-03 |
Conductive Polymer Composite And Substrate
App 20150340118 - NAGASAWA; Takayuki ; et al. | 2015-11-26 |
Monomer, Polymer, Resist Composition, And Patterning Process
App 20150322027 - Fujiwara; Takayuki ; et al. | 2015-11-12 |
Monomer, Polymer, Resist Composition, And Patterning Process
App 20150323865 - Sagehashi; Masayoshi ; et al. | 2015-11-12 |
Patterning process, resist composition, polymer, and monomer
Grant 9,182,668 - Hasegawa , et al. November 10, 2 | 2015-11-10 |
Three-phase alternating-current power supply switching circuit
Grant 9,178,426 - Hasegawa November 3, 2 | 2015-11-03 |
Positive resist composition, monomer, polymer, and patterning process
Grant 9,140,988 - Hatakeyama , et al. September 22, 2 | 2015-09-22 |
Positive Resist Composition And Patterning Process
App 20150253666 - Hatakeyama; Jun ; et al. | 2015-09-10 |
Positive Resist Composition And Patterning Process
App 20150253665 - Hatakeyama; Jun ; et al. | 2015-09-10 |
Fluorinated monomer, polymer, resist composition, and patterning process
Grant 9,115,074 - Sagehashi , et al. August 25, 2 | 2015-08-25 |
Three-phase Alternating-current Power Supply Switching Circuit
App 20150236591 - HASEGAWA; Koji | 2015-08-20 |
Patterning process and resist composition
Grant 9,104,105 - Hatakeyama , et al. August 11, 2 | 2015-08-11 |
Positive Resist Composition And Patterning Process
App 20150212417 - Hatakeyama; Jun ; et al. | 2015-07-30 |
Positive Resist Composition And Patterning Process
App 20150212416 - Hatakeyama; Jun ; et al. | 2015-07-30 |
Positive Resist Composition And Patterning Process
App 20150212415 - Hatakeyama; Jun ; et al. | 2015-07-30 |
Resist protective film-forming composition and patterning process
Grant 9,086,628 - Suka , et al. July 21, 2 | 2015-07-21 |
Onium Salt, Chemically Amplified Positive Resist Composition, And Patterning Process
App 20150198876 - DOMON; Daisuke ; et al. | 2015-07-16 |
Patterning process and resist composition
Grant 9,081,290 - Hatakeyama , et al. July 14, 2 | 2015-07-14 |
Positive resist composition and patterning process
Grant 9,075,308 - Hatakeyama , et al. July 7, 2 | 2015-07-07 |
Polymer Compound
App 20150175730 - HATAKEYAMA; Jun ; et al. | 2015-06-25 |
Polymer Compound For A Conductive Polymer And Method For Manufacturing Same
App 20150175722 - HATAKEYAMA; Jun ; et al. | 2015-06-25 |
Monomer, polymer, resist composition, and patterning process
Grant 9,046,772 - Sagehashi , et al. June 2, 2 | 2015-06-02 |
Polymerizable tertiary ester compound, polymer, resist composition, and patterning process
Grant 9,040,222 - Suka , et al. May 26, 2 | 2015-05-26 |
Resist composition, patterning process and polymer
Grant 9,040,223 - Hatakeyama , et al. May 26, 2 | 2015-05-26 |
Nozzle and a substrate processing apparatus including the same
Grant 9,027,577 - Osada , et al. May 12, 2 | 2015-05-12 |
Negative resist composition and patterning process
Grant 9,023,587 - Hatakeyama , et al. May 5, 2 | 2015-05-05 |
Monomer, polymer, chemically amplified positive resist composition, and patterning process
Grant 9,017,918 - Hatakeyama , et al. April 28, 2 | 2015-04-28 |
Patterning process and resist composition
Grant 9,017,931 - Hasegawa , et al. April 28, 2 | 2015-04-28 |
Patterning process and resist composition
Grant 8,999,630 - Hatakeyama , et al. April 7, 2 | 2015-04-07 |
Positive Resist Composition And Patterning Process
App 20150064626 - Hatakeyama; Jun ; et al. | 2015-03-05 |
Fluorinated monomer, fluorinated polymer, resist composition, and patterning process
Grant 8,945,809 - Hasegawa , et al. February 3, 2 | 2015-02-03 |
Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process
Grant 8,933,251 - Watanabe , et al. January 13, 2 | 2015-01-13 |
Positive resist compositions and patterning process
Grant 8,921,025 - Kaneko , et al. December 30, 2 | 2014-12-30 |
Power consumption display unit for machine tool
Grant 8,924,172 - Hasegawa , et al. December 30, 2 | 2014-12-30 |
Power consumption display unit for machine tool
Grant 08924172 - | 2014-12-30 |
Resist composition and patterning process
Grant 8,916,331 - Hasegawa , et al. December 23, 2 | 2014-12-23 |
Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition
Grant 8,900,793 - Sagehashi , et al. December 2, 2 | 2014-12-02 |
Monomer, polymer, resist composition, and patterning process
Grant 8,877,424 - Sagehashi , et al. November 4, 2 | 2014-11-04 |
Patterning process and resist composition
Grant 8,865,390 - Hatakeyama , et al. October 21, 2 | 2014-10-21 |
Patterning Process, Resist Composition, Polymer, And Monomer
App 20140308614 - Hasegawa; Koji ; et al. | 2014-10-16 |
Positive resist composition and patterning process
Grant 8,841,061 - Hatakeyama , et al. September 23, 2 | 2014-09-23 |
Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process
Grant 8,835,094 - Hasegawa , et al. September 16, 2 | 2014-09-16 |
Patterning Process And Resist Composition
App 20140242518 - Hatakeyama; Jun ; et al. | 2014-08-28 |
Monomer, Polymer, Resist Composition, And Patterning Process
App 20140242519 - Sagehashi; Masayoshi ; et al. | 2014-08-28 |
Positive resist composition and patterning process
Grant 8,808,966 - Hatakeyama , et al. August 19, 2 | 2014-08-19 |
Polymerizable ester compound, polymer, resist composition, and patterning process
Grant 8,795,946 - Hasegawa , et al. August 5, 2 | 2014-08-05 |
Patterning Process And Resist Composition
App 20140212808 - Funatsu; Kenji ; et al. | 2014-07-31 |
Negative Resist Composition And Patterning Process
App 20140212810 - Hatakeyama; Jun ; et al. | 2014-07-31 |
Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process
Grant 8,791,288 - Kinsho , et al. July 29, 2 | 2014-07-29 |
Acetal compound, polymer, resist composition, and patterning process
Grant 8,791,290 - Hasegawa , et al. July 29, 2 | 2014-07-29 |
Monomer, Polymer, Resist Composition, And Patterning Process
App 20140199631 - Sagehashi; Masayoshi ; et al. | 2014-07-17 |
Patterning Process, Resist Composition, Polymer, And Monomer
App 20140199632 - Hasegawa; Koji ; et al. | 2014-07-17 |
Resist Composition, Patterning Process And Polymer
App 20140178820 - Hatakeyama; Jun ; et al. | 2014-06-26 |
Patterning process and resist composition
Grant 8,753,805 - Hatakeyama , et al. June 17, 2 | 2014-06-17 |
Positive Resist Composition, Monomer, Polymer, And Patterning Process
App 20140162188 - Hatakeyama; Jun ; et al. | 2014-06-12 |
Positive resist composition and patterning process
Grant 8,735,046 - Hatakeyama , et al. May 27, 2 | 2014-05-27 |
Coating Device
App 20140137797 - Hasegawa; Koji ; et al. | 2014-05-22 |
Fluorinated Monomer, Polymer, Resist Composition, And Patterning Process
App 20140114080 - SAGEHASHI; Masayoshi ; et al. | 2014-04-24 |
Patterning process
Grant 8,703,408 - Hatakeyama , et al. April 22, 2 | 2014-04-22 |
Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid
Grant 8,697,903 - Kinsho , et al. April 15, 2 | 2014-04-15 |
Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom
Grant 8,686,166 - Sagehashi , et al. April 1, 2 | 2014-04-01 |
Coating apparatus
Grant 8,671,877 - Hasegawa , et al. March 18, 2 | 2014-03-18 |
Fluorinated Ester Monomer, Making Method, Fluorinated Ester Polymer, And Difluorohydroxycarboxylic Acid
App 20140051024 - KINSHO; Takeshi ; et al. | 2014-02-20 |
Patterning Process And Resist Composition
App 20140051026 - Hasegawa; Koji ; et al. | 2014-02-20 |
Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
Grant 8,652,750 - Ogihara , et al. February 18, 2 | 2014-02-18 |
Monomer, Polymer, Resist Composition, And Patterning Process
App 20140045123 - Sagehashi; Masayoshi ; et al. | 2014-02-13 |
Positive Resist Composition And Patterning Process
App 20140045122 - Hatakeyama; Jun ; et al. | 2014-02-13 |
Fluorinated monomer, polymer, resist composition, and patterning process
Grant 8,647,808 - Sagehashi , et al. February 11, 2 | 2014-02-11 |
Polymer, Positive Resist Composition And Patterning Process
App 20130344442 - Sagehashi; Masayoshi ; et al. | 2013-12-26 |
Patterning Process And Resist Composition
App 20130337383 - Hatakeyama; Jun ; et al. | 2013-12-19 |
Sulfonium salt, resist composition, and patterning process
Grant 8,597,869 - Sagehashi , et al. December 3, 2 | 2013-12-03 |
Positive resist composition and patterning process
Grant 8,574,817 - Hatakeyama , et al. November 5, 2 | 2013-11-05 |
Monomer, Polymer, Positive Resist Composition And Patterning Process
App 20130288180 - Hatakeyama; Jun ; et al. | 2013-10-31 |
Fluorinated Monomer Of Cyclic Acetal Structure, Polymer, Resist Protective Coating Composition, Resist Composition, And Patterning Process
App 20130231491 - WATANABE; Takeru ; et al. | 2013-09-05 |
Monomer, Polymer, Resist Composition, And Patterning Process
App 20130209935 - Sagehashi; Masayoshi ; et al. | 2013-08-15 |
Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process
Grant 8,501,386 - Ogihara , et al. August 6, 2 | 2013-08-06 |
Polymerizable Tertiary Ester Compound, Polymer, Resist Composition, And Patterning Process
App 20130189620 - SUKA; Yuki ; et al. | 2013-07-25 |
Patterning process
Grant 8,492,078 - Hatakeyama , et al. July 23, 2 | 2013-07-23 |
Positive resist composition and patterning process
Grant 8,450,042 - Hatakeyama , et al. May 28, 2 | 2013-05-28 |
Negative Pattern Forming Process And Negative Resist Composition
App 20130130177 - Kobayashi; Tomohiro ; et al. | 2013-05-23 |
Patterning process, resist composition, and acetal compound
Grant 8,440,386 - Hatakeyama , et al. May 14, 2 | 2013-05-14 |
Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process
Grant 8,431,323 - Watanabe , et al. April 30, 2 | 2013-04-30 |
Polymer, resist composition, and patterning process
Grant 8,420,292 - Harada , et al. April 16, 2 | 2013-04-16 |
Acetal compounds and their preparation, polymers, resist compositions and patterning process
Grant 8,420,290 - Hasegawa , et al. April 16, 2 | 2013-04-16 |
Resist Protective Film-forming Composition And Patterning Process
App 20130084517 - Suka; Yuuki ; et al. | 2013-04-04 |
Positive Resist Composition And Patterning Process
App 20130084529 - Hatakeyama; Jun ; et al. | 2013-04-04 |
Positive Resist Composition And Patterning Process
App 20130084528 - Hatakeyama; Jun ; et al. | 2013-04-04 |
Positive Resist Composition And Patterning Process
App 20130084527 - HATAKEYAMA; Jun ; et al. | 2013-04-04 |
Game Machine
App 20130069303 - HASEGAWA; Koji ; et al. | 2013-03-21 |
Patterning Process And Resist Composition
App 20130071788 - Hatakeyama; Jun ; et al. | 2013-03-21 |
Patterning Process And Resist Composition
App 20130065183 - Kobayashi; Tomohiro ; et al. | 2013-03-14 |
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS
App 20130034813 - Ohsawa; Youichi ; et al. | 2013-02-07 |
Positive Resist Composition And Pattterning Process
App 20130029269 - Hatakeyama; Jun ; et al. | 2013-01-31 |
Resist protective coating composition and patterning process
Grant 8,361,703 - Harada , et al. January 29, 2 | 2013-01-29 |
Polymerizable Ester Compound, Polymer, Resist Composition, And Patterning Process
App 20130017484 - HASEGAWA; Koji ; et al. | 2013-01-17 |
Patterning Process And Resist Composition
App 20130017492 - Hatakeyama; Jun ; et al. | 2013-01-17 |
Coating Device And Coating Method
App 20130011548 - Umemoto; Kenji ; et al. | 2013-01-10 |
Preparation Of 2,2-bis (fluoroalkyl) Oxirane And Preparation Of Photoacid Generator Therefrom
App 20130005997 - SAGEHASHI; Masayoshi ; et al. | 2013-01-03 |
Patterning Process And Resist Composition
App 20120328987 - Hatakeyama; Jun ; et al. | 2012-12-27 |
Patterning Process And Resist Composition
App 20120315581 - HATAKEYAMA; Jun ; et al. | 2012-12-13 |
Polymer, Chemically Amplified Resist Composition, And Patterning Process Using Said Chemically Amplified Resist Composition
App 20120308932 - SAGEHASHI; Masayoshi ; et al. | 2012-12-06 |
Resist composition and patterning process
Grant 8,313,886 - Harada , et al. November 20, 2 | 2012-11-20 |
Resist Composition And Patterning Process
App 20120288796 - KATAYAMA; Kazuhiro ; et al. | 2012-11-15 |
Coating Apparatus
App 20120234239 - Hasegawa; Koji ; et al. | 2012-09-20 |
Resist composition and patterning process
Grant 8,268,528 - Harada , et al. September 18, 2 | 2012-09-18 |
Positive resist composition and patterning process
Grant 8,211,618 - Hatakeyama , et al. July 3, 2 | 2012-07-03 |
Resist Composition And Patterning Process
App 20120148945 - Hasegawa; Koji ; et al. | 2012-06-14 |
Positive Resist Composition And Patterning Process
App 20120135349 - Hatakeyama; Jun ; et al. | 2012-05-31 |
Spindle Condition Detection Device For Machine Tool
App 20120109539 - Hasegawa; Koji ; et al. | 2012-05-03 |
Power Consumption Display Unit For Machine Tool
App 20120109551 - HASEGAWA; Koji ; et al. | 2012-05-03 |
Sulfonium Salt, Resist Composition, And Patterning Process
App 20120100486 - Sagehashi; Masayoshi ; et al. | 2012-04-26 |
Resist protective coating composition and patterning process
Grant 8,158,330 - Harada , et al. April 17, 2 | 2012-04-17 |
Fluorinated Ester Monomer, Making Method, Fluorinated Ester Polymer, And Difluorohydroxycarboxylic Acid
App 20120083580 - KINSHO; Takeshi ; et al. | 2012-04-05 |
Fluoroalcohol, Fluorinated Monomer, Polymer, Resist Composition And Patterning Process
App 20120077121 - HASEGAWA; Koji ; et al. | 2012-03-29 |
Silicon-containing Film-forming Composition, Silicon-containing Film-formed Substrate, And Patterning Process
App 20120052685 - OGIHARA; Tsutomu ; et al. | 2012-03-01 |
Photoacid generator, resist composition, and patterning process
Grant 8,114,570 - Ohsawa , et al. February 14, 2 | 2012-02-14 |
Resist composition and patterning process
Grant 8,101,335 - Harada , et al. January 24, 2 | 2012-01-24 |
Patterning Process
App 20120009527 - Hatakeyama; Jun ; et al. | 2012-01-12 |
Monomer, Polymer, Chemically Amplified Positive Resist Composition, And Patterning Process
App 20110294070 - Hatakeyama; Jun ; et al. | 2011-12-01 |
Carboxyl-containing lactone compound, polymer, resist composition, and patterning process
Grant 8,062,831 - Shinachi , et al. November 22, 2 | 2011-11-22 |
Hydroxyl-containing monomer, polymer, resist composition, and patterning process
Grant 8,053,165 - Kinsho , et al. November 8, 2 | 2011-11-08 |
Fluorinated Monomer, Polymer, Resist Composition, And Patterning Process
App 20110250539 - SAGEHASHI; Masayoshi ; et al. | 2011-10-13 |
Acetal Compound, Polymer, Resist Composition, And Patterning Process
App 20110236831 - HASEGAWA; Koji ; et al. | 2011-09-29 |
Patterning Process, Resist Composition, And Acetal Compound
App 20110236826 - Hatakeyama; Jun ; et al. | 2011-09-29 |
Positive resist composition and patterning process
Grant 7,985,528 - Nishi , et al. July 26, 2 | 2011-07-26 |
Patterning Process
App 20110177462 - Hatakeyama; Jun ; et al. | 2011-07-21 |
Polymer, Resist Composition, And Patterning Process
App 20110177455 - HARADA; Yuji ; et al. | 2011-07-21 |
Fluorinated monomer, fluorinated polymer, resist composition and patterning process
Grant 7,981,589 - Hasegawa , et al. July 19, 2 | 2011-07-19 |
Fluorinated Monomer, Fluorinated Polymer, Resist Composition, And Patterning Process
App 20110151381 - HASEGAWA; Koji ; et al. | 2011-06-23 |
p300 transgenic animal
Grant 7,906,701 - Hasegawa , et al. March 15, 2 | 2011-03-15 |
Silicone-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
Grant 7,875,417 - Ogihara , et al. January 25, 2 | 2011-01-25 |
Lactone-containing compound, polymer, resist composition, and patterning process
Grant 7,871,752 - Hasegawa , et al. January 18, 2 | 2011-01-18 |
Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process
Grant 7,868,199 - Hasegawa , et al. January 11, 2 | 2011-01-11 |
Positive Resist Compositions And Patterning Process
App 20100310986 - KANEKO; Tatsushi ; et al. | 2010-12-09 |
Acid-labile Ester Monomer Having Spirocyclic Structure, Polymer, Resist Composition, And Patterning Process
App 20100304295 - Kinsho; Takeshi ; et al. | 2010-12-02 |
Coating apparatus
Grant 7,836,842 - Hasegawa , et al. November 23, 2 | 2010-11-23 |
Lactone-containing compound, polymer, resist composition, and patterning process
Grant 7,833,694 - Hasegawa , et al. November 16, 2 | 2010-11-16 |
Resist Composition And Patterning Process
App 20100266957 - HARADA; Yuji ; et al. | 2010-10-21 |
Positive Resist Composition And Patterning Process
App 20100227274 - Hatakeyama; Jun ; et al. | 2010-09-09 |
Positive Resist Composition And Patterning Process
App 20100227273 - Hatakeyama; Jun ; et al. | 2010-09-09 |
Lactone-containing compounds, polymers, resist compositions, and patterning method
Grant RE41,580 - Hasegawa , et al. August 24, 2 | 2010-08-24 |
Wafer treating apparatus
Grant 7,758,717 - Hasegawa , et al. July 20, 2 | 2010-07-20 |
Patterning process and resist composition
Grant 7,741,015 - Hatakeyama , et al. June 22, 2 | 2010-06-22 |
Acetal Compounds And Their Preparation, Polymers, Resist Compositions And Patterning Process
App 20100136485 - HASEGAWA; Koji ; et al. | 2010-06-03 |
Resist Composition And Patterning Process
App 20100136482 - Harada; Yuji ; et al. | 2010-06-03 |
Resist Protective Coating Compositon And Patterning Process
App 20100136486 - HARADA; Yuji ; et al. | 2010-06-03 |
Polymers, resist compositions and patterning process
Grant 7,718,342 - Funatsu , et al. May 18, 2 | 2010-05-18 |
Fluorinated Monomer Of Cyclic Acetal Structure, Polymer, Resist Protective Coating Composition, Resist Composition, And Patterning Process
App 20100112482 - WATANABE; Takeru ; et al. | 2010-05-06 |
Polymerizable ester compounds, polymers, resist compositions and patterning process
Grant 7,687,222 - Watanabe , et al. March 30, 2 | 2010-03-30 |
Lactone-containing compound, polymer, resist composition, and patterning process
Grant 7,678,530 - Hasegawa , et al. March 16, 2 | 2010-03-16 |
Positive Resist Composition And Patterning Process
App 20100062366 - Nishi; Tsunehiro ; et al. | 2010-03-11 |
Polymer, resist protective coating material, and patterning process
Grant 7,670,750 - Harada , et al. March 2, 2 | 2010-03-02 |
Polymer, resist protective coating material, and patterning process
Grant 7,642,034 - Hatakeyama , et al. January 5, 2 | 2010-01-05 |
Resist composition and patterning process using the same
Grant 7,629,106 - Hatakeyama , et al. December 8, 2 | 2009-12-08 |
Resist composition and patterning process
Grant 7,622,242 - Hatakeyama , et al. November 24, 2 | 2009-11-24 |
Resist Protective Coating Composition And Patterning Process
App 20090286182 - HARADA; Yuji ; et al. | 2009-11-19 |
Resist Composition And Patterning Process
App 20090280434 - HARADA; Yuji ; et al. | 2009-11-12 |
Coating apparatus
Grant 7,614,359 - Hasegawa , et al. November 10, 2 | 2009-11-10 |
Carboxyl-containing Lactone Compound, Polymer, Resist Composition, And Patterning Process
App 20090274984 - SHINACHI; Satoshi ; et al. | 2009-11-05 |
Novel Photoacid Generator, Resist Composition, And Patterning Process
App 20090246694 - Ohsawa; Youichi ; et al. | 2009-10-01 |
Hydroxyl-containing Monomer, Polymer, Resist Composition, And Patterning Process
App 20090239179 - Kinsho; Takeshi ; et al. | 2009-09-24 |
Lactone-containing Compound, Polymer, Resist Composition, And Patterning Process
App 20090233242 - HASEGAWA; Koji ; et al. | 2009-09-17 |
Polymer, resist composition, and patterning process
Grant 7,537,880 - Harada , et al. May 26, 2 | 2009-05-26 |
Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process
Grant 7,531,289 - Kinsho , et al. May 12, 2 | 2009-05-12 |
Photoacid generators, resist compositions, and patterning process
Grant 7,527,912 - Ohsawa , et al. May 5, 2 | 2009-05-05 |
p300 transgenic animal
App 20090083863 - Hasegawa; Koji ; et al. | 2009-03-26 |
Resist Composition And Patterning Process
App 20090081588 - Hatakeyama; Jun ; et al. | 2009-03-26 |
Fluorinated Monomer, Fluorinated Polymer, Resist Composition And Patterning Process
App 20090035699 - HASEGAWA; Koji ; et al. | 2009-02-05 |
Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process
Grant 7,485,408 - Kinsho , et al. February 3, 2 | 2009-02-03 |
Silicon-containing Film-forming Composition, Silicon-containing Film, Silicon-containing Film-bearing Substrate, And Patterning Method
App 20090011372 - Ogihara; Tsutomu ; et al. | 2009-01-08 |
Silicone-containing Film-forming Composition, Silicon-containing Film, Silicon-containing Film-bearing Substrate, And Patterning Method
App 20080274432 - Ogihara; Tsutomu ; et al. | 2008-11-06 |
Coating Apparatus
App 20080271668 - Hasegawa; Koji ; et al. | 2008-11-06 |
Nozzle And A Substrate Processing Apparatus Including The Same
App 20080251107 - OSADA; Naoyuki ; et al. | 2008-10-16 |
Patterning Process And Resist Composition
App 20080199806 - HATAKEYAMA; Jun ; et al. | 2008-08-21 |
Substrate processing apparatus and method
Grant 7,392,814 - Hasegawa , et al. July 1, 2 | 2008-07-01 |
Polymer, resist composition, and patterning process
App 20080118860 - Harada; Yuji ; et al. | 2008-05-22 |
Substrate Processing Apparatus
App 20080083501 - ARAI; Kenichiro ; et al. | 2008-04-10 |
Polymer, resist protective coating material, and patterning process
App 20080085466 - Harada; Yuji ; et al. | 2008-04-10 |
Novel photoacid generators, resist compositions, and patterning process
App 20080085469 - Ohsawa; Youichi ; et al. | 2008-04-10 |
Lactone-containing compound, polymer, resist composition, and patterning process
App 20080026331 - HASEGAWA; Koji ; et al. | 2008-01-31 |
Polymerizable ester compounds, polymers, resist compositions and patterning process
App 20080008962 - Watanabe; Takeru ; et al. | 2008-01-10 |
Coating Apparatus
App 20070261634 - Hasegawa; Koji ; et al. | 2007-11-15 |
Substrate processing apparatus and method
App 20070235064 - Hasegawa; Koji ; et al. | 2007-10-11 |
Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process
App 20070218402 - Kinsho; Takeshi ; et al. | 2007-09-20 |
Polymer, resist protective coating material, and patterning process
App 20070178407 - Hatakeyama; Jun ; et al. | 2007-08-02 |
Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process
App 20070179309 - Hasegawa; Koji ; et al. | 2007-08-02 |
Lactone-containing compound, polymer, resist composition, and patterning process
App 20070160929 - Hasegawa; Koji ; et al. | 2007-07-12 |
Polymers, resist compositions and patterning process
App 20070148594 - Funatsu; Kenji ; et al. | 2007-06-28 |
Resist composition and patterning process using the same
App 20070111140 - Hatakeyama; Jun ; et al. | 2007-05-17 |
Growth regulator and process for growth regulation of plant
App 20070015663 - Matsugu; Yutaka ; et al. | 2007-01-18 |
Novel ester compounds, polymers, resist compositions and patterning process
App 20060234160 - Hasegawa; Koji ; et al. | 2006-10-19 |
Novel Tertiary Amine Compounds Having An Ester Structure And Processes For Preparing The Same
App 20060217570 - Watanabe; Takeru ; et al. | 2006-09-28 |
Wafer treating apparatus
App 20060191635 - Hasegawa; Koji ; et al. | 2006-08-31 |
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